DUPONT AIR PRODUCTS NANOMATERIALS, L.L.C

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ALLENTOWN, PA, US

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Patents Grantslast 30 patents

Information Patent Grant
Method and composition for chemical mechanical planarization of a m...
- Patent number 8,222,145
- Issue date Jul 17, 2012
- DuPont Air Products Nanomaterials, LLC
- Xiaobo Shi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Periodic acid compositions for polishing ruthenium/low K substrates
- Patent number 7,968,465
- Issue date Jun 28, 2011
- DuPont Air Products NanoMaterials LLC
- Robert J. Small
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for chemical mechanical planarization of chalcogenide materials
- Patent number 7,915,071
- Issue date Mar 29, 2011
- DuPont Air Products Nanomaterials, LLC
- Junaid Ahmed Siddiqui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for immobilizing ligands and organometallic compounds on sil...
- Patent number 7,691,287
- Issue date Apr 6, 2010
- DuPont Air Products NanoMaterials LLC
- Junaid Ahmed Siddiqui
- B24 - GRINDING POLISHING
Information Patent Grant
Method for chemical mechanical planarization of chalcogenide materials
- Patent number 7,678,605
- Issue date Mar 16, 2010
- DuPont Air Products NanoMaterials LLC
- James Allen Schlueter
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
CMP Slurry/Method for Polishing Ruthenium and Other Films
- Publication number 20120329279
- Publication date Dec 27, 2012
- DuPont Air Products NanoMaterials, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Planarization Composition And Method With Low C...
- Publication number 20120142191
- Publication date Jun 7, 2012
- DuPont Air Products NanoMaterials, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for Chemical Mechanical Planarization of a Tungsten-Containi...
- Publication number 20120028466
- Publication date Feb 2, 2012
- DuPont Air Products NanoMaterials, LLC
- Rachel Dianne McConnell
- B24 - GRINDING POLISHING
Information Patent Application
Method for Forming Through-Base Wafer Vias for Fabrication of Stack...
- Publication number 20110300710
- Publication date Dec 8, 2011
- DuPont Air Products NanoMaterials, LLC
- James Matthew Henry
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR EXPOSING THROUGH-BASE WAFER VIAS FOR FABRICATION OF STAC...
- Publication number 20110237079
- Publication date Sep 29, 2011
- DuPont Air Products Nanomaterials LLC
- Hyoung Sik Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method and Slurry for Tuning Low-K Versus Copper Removal Rates Duri...
- Publication number 20110165777
- Publication date Jul 7, 2011
- DuPont Air Products Nanomaterials LLC
- Junaid Ahmed Siddiqui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method and Composition for Chemical Mechanical Planarization of A M...
- Publication number 20100167545
- Publication date Jul 1, 2010
- DuPont Air Products Nanomaterials LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing Slurry for Copper Films
- Publication number 20100101448
- Publication date Apr 29, 2010
- DuPont Air Products Nanomaterials LLC
- Rebecca A. Sawayda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for Forming Through-base Wafer Vias in Fabrication of Stacke...
- Publication number 20100081279
- Publication date Apr 1, 2010
- DuPont Air Products Nanomaterials LLC
- Bentley J. Palmer
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for Chemical Mechanical Planarization of Chalcogenide Materials
- Publication number 20090057661
- Publication date Mar 5, 2009
- DuPont Air Products Nanomaterials LLC
- Junaid Ahmed Siddiqui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for Chemical Mechanical Planarization of A Metal-containing...
- Publication number 20090061630
- Publication date Mar 5, 2009
- DuPont Air Products Nanomaterials LLC
- Bentley J. Palmer
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for Chemical Mechanical Planarization of Chalcogenide Materials
- Publication number 20090057834
- Publication date Mar 5, 2009
- DuPont Air Products Nanomaterials LLC
- James Allen Schlueter
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Reverse Shallow Trench Isolation Process
- Publication number 20090047870
- Publication date Feb 19, 2009
- DuPont Air Products Nanomaterials LLC
- Junaid Ahmed Siddiqui
- B24 - GRINDING POLISHING

DUPONT AIR PRODUCTS NANOMATERIALS, L.L.C

Organization

Patents Grantslast 30 patents

Method and composition for chemical mechanical planarization of a m...

Periodic acid compositions for polishing ruthenium/low K substrates

Method for chemical mechanical planarization of chalcogenide materials

Method for immobilizing ligands and organometallic compounds on sil...

Method for chemical mechanical planarization of chalcogenide materials

Patents Applicationslast 30 patents

CMP Slurry/Method for Polishing Ruthenium and Other Films

Chemical Mechanical Planarization Composition And Method With Low C...

Method for Chemical Mechanical Planarization of a Tungsten-Containi...

Method for Forming Through-Base Wafer Vias for Fabrication of Stack...

METHOD FOR EXPOSING THROUGH-BASE WAFER VIAS FOR FABRICATION OF STAC...

Method and Slurry for Tuning Low-K Versus Copper Removal Rates Duri...

Method and Composition for Chemical Mechanical Planarization of A M...

Polishing Slurry for Copper Films

Method for Forming Through-base Wafer Vias in Fabrication of Stacke...

Method for Chemical Mechanical Planarization of Chalcogenide Materials

Method for Chemical Mechanical Planarization of A Metal-containing...

Method for Chemical Mechanical Planarization of Chalcogenide Materials

Reverse Shallow Trench Isolation Process

Trademarklast 30 trademarks