Electron Vision Corporation

Organization

San Diego, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Method for curing spin-on dielectric films utilizing electron beam...
- Patent number 6,607,991
- Issue date Aug 19, 2003
- Electron Vision Corporation
- William R. Livesay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam annealing of metals, alloys, nitrides and silicides
- Patent number 6,551,926
- Issue date Apr 22, 2003
- Electron Vision Corporation
- Matthew F. Ross
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing films prior to chemical vapor deposition using...
- Patent number 6,548,899
- Issue date Apr 15, 2003
- Electron Vision Corporation
- Matthew Ross
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for controlling dopant profiles and dopant activation by ele...
- Patent number 6,489,225
- Issue date Dec 3, 2002
- Electron Vision Corporation
- Matthew F. Ross
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam modification of perhydrosilazane spin-on glass
- Patent number 6,426,127
- Issue date Jul 30, 2002
- Electron Vision Corporation
- Matthew Ross
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Uniformity correction for large area electron source
- Patent number 6,407,399
- Issue date Jun 18, 2002
- Electron Vision Corporation
- William R. Livesay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhancement of photoresist plasma etch resistance via electron beam...
- Patent number 6,358,670
- Issue date Mar 19, 2002
- Electron Vision Corporation
- Selmer Wong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tailoring of linewidth through electron beam post exposure
- Patent number 6,340,556
- Issue date Jan 22, 2002
- Electron Vision Corporation
- Selmer Wong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modification of 193 nm sensitive photoresist materials by electron...
- Patent number 6,319,655
- Issue date Nov 20, 2001
- Electron Vision Corporation
- Selmer Wong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam treatment of fluorinated silicate glass
- Patent number 6,271,146
- Issue date Aug 7, 2001
- Electron Vision Corporation
- Matthew F. Ross
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of creating optimal photoresist structures used in the manuf...
- Patent number 6,255,035
- Issue date Jul 3, 2001
- Electron Vision Corporation
- Jason P. Minter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of creating controlled discontinuity between photoresist and...
- Patent number 6,218,090
- Issue date Apr 17, 2001
- Electron Vision Corporation
- Jason P. Minter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam process during dual damascene processing
- Patent number 6,207,555
- Issue date Mar 27, 2001
- Electron Vision Corporation
- Matthew F. Ross
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing films prior to chemical vapor deposition using...
- Patent number 6,204,201
- Issue date Mar 20, 2001
- Electron Vision Corporation
- Matthew Ross
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck having replaceable dielectric cover
- Patent number 6,195,246
- Issue date Feb 27, 2001
- Electron Vision Corporation
- William R. Livesay
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method for curing spin-on-glass film utilizing electron beam radiation
- Patent number 6,132,814
- Issue date Oct 17, 2000
- Electron Vision Corporation
- William R. Livesay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for three-dimensional control of solubility properties of re...
- Patent number 5,468,595
- Issue date Nov 21, 1995
- Electron Vision Corporation
- William R. Livesay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Large-area uniform electron source
- Patent number 5,003,178
- Issue date Mar 26, 1991
- Electron Vision Corporation
- William R. Livesay
- H01 - BASIC ELECTRIC ELEMENTS

Electron Vision Corporation

Organization

Patents Grantslast 30 patents

Method for curing spin-on dielectric films utilizing electron beam...

Electron beam annealing of metals, alloys, nitrides and silicides

Method of processing films prior to chemical vapor deposition using...

Method for controlling dopant profiles and dopant activation by ele...

Electron beam modification of perhydrosilazane spin-on glass

Uniformity correction for large area electron source

Enhancement of photoresist plasma etch resistance via electron beam...

Tailoring of linewidth through electron beam post exposure

Modification of 193 nm sensitive photoresist materials by electron...

Electron beam treatment of fluorinated silicate glass

Method of creating optimal photoresist structures used in the manuf...

Method of creating controlled discontinuity between photoresist and...

Electron beam process during dual damascene processing

Method of processing films prior to chemical vapor deposition using...

Electrostatic chuck having replaceable dielectric cover

Method for curing spin-on-glass film utilizing electron beam radiation

Method for three-dimensional control of solubility properties of re...

Large-area uniform electron source