Epsilon Technology, Inc.

Organization

Tempe, AZ, US

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Patents Grantslast 30 patents

Information Patent Grant
Substrate supporting apparatus
- Patent number 5,318,634
- Issue date Jun 7, 1994
- Epsilon Technology, Inc.
- Wiebe B. deBoer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reaction chambers for CVD systems
- Patent number 5,261,960
- Issue date Nov 16, 1993
- Epsilon Technology, Inc.
- Albert E. Ozias
- C30 - CRYSTAL GROWTH
Information Patent Grant
Gas injectors for reaction chambers in CVD systems
- Patent number 5,221,556
- Issue date Jun 22, 1993
- Epsilon Technology, Inc.
- Mark R. Hawkins
- C30 - CRYSTAL GROWTH
Information Patent Grant
Rotatable substrate supporting mechanism with temperature sensing d...
- Patent number 5,198,034
- Issue date Mar 30, 1993
- Epsilon Technology, Inc.
- Wiebe B. deBoer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for loading a substrate into a GVD apparatus
- Patent number 5,156,521
- Issue date Oct 20, 1992
- Epsilon Technology, Inc.
- Richard Crabb
- C30 - CRYSTAL GROWTH
Information Patent Grant
Drive shaft apparatus for a susceptor
- Patent number 5,117,769
- Issue date Jun 2, 1992
- Epsilon Technology, Inc.
- Wiebe B. deBoer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for improving the reactant gas flow in a reaction chamber
- Patent number 5,096,534
- Issue date Mar 17, 1992
- Epsilon Technology, Inc.
- Albert E. Ozias
- C30 - CRYSTAL GROWTH
Information Patent Grant
Substrate loading apparatus for a CVD process
- Patent number 5,092,728
- Issue date Mar 3, 1992
- Epsilon Technology, Inc.
- Richard Crabb
- C30 - CRYSTAL GROWTH
Information Patent Grant
Wafer handling system with Bernoulli pick-up
- Patent number 5,080,549
- Issue date Jan 14, 1992
- Epsilon Technology, Inc.
- Dennis L. Goodwin
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Apparatus for improving the reactant gas flow in a reaction chamber
- Patent number 5,044,315
- Issue date Sep 3, 1991
- Epsilon Technology, Inc.
- Albert E. Ozias
- C30 - CRYSTAL GROWTH
Information Patent Grant
Substrate handling and transporting apparatus
- Patent number 5,020,475
- Issue date Jun 4, 1991
- Epsilon Technology, Inc.
- Richard Crabb
- C30 - CRYSTAL GROWTH
Information Patent Grant
Rotatable substrate supporting susceptor with temperature sensors
- Patent number 4,996,942
- Issue date Mar 5, 1991
- Epsilon Technology, Inc.
- Wiebe B. deBoer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Susceptor with temperature sensing device
- Patent number 4,993,355
- Issue date Feb 19, 1991
- Epsilon Technology, Inc.
- Wiebe B. deBoer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heating system for substrates
- Patent number 4,975,561
- Issue date Dec 4, 1990
- Epsilon Technology Inc.
- McDonald Robinson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reaction chambers for CVD systems
- Patent number 4,846,102
- Issue date Jul 11, 1989
- Epsilon Technology, Inc.
- Albert E. Ozias
- C30 - CRYSTAL GROWTH
Information Patent Grant
Heating system for reaction chamber of chemical vapor deposition eq...
- Patent number 4,836,138
- Issue date Jun 6, 1989
- Epsilon Technology, Inc.
- McDonald Robinson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition system
- Patent number 4,828,224
- Issue date May 9, 1989
- Epsilon Technology, Inc.
- Richard Crabb
- C30 - CRYSTAL GROWTH
Information Patent Grant
Apparatus and method for automated wafer handling
- Patent number 4,813,732
- Issue date Mar 21, 1989
- Epsilon Technology, Inc.
- David C. Klem
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS

Epsilon Technology, Inc.

Organization

Patents Grantslast 30 patents

Substrate supporting apparatus

Reaction chambers for CVD systems

Gas injectors for reaction chambers in CVD systems

Rotatable substrate supporting mechanism with temperature sensing d...

Method for loading a substrate into a GVD apparatus

Drive shaft apparatus for a susceptor

Method for improving the reactant gas flow in a reaction chamber

Substrate loading apparatus for a CVD process

Wafer handling system with Bernoulli pick-up

Apparatus for improving the reactant gas flow in a reaction chamber

Substrate handling and transporting apparatus

Rotatable substrate supporting susceptor with temperature sensors

Susceptor with temperature sensing device

Heating system for substrates

Reaction chambers for CVD systems

Heating system for reaction chamber of chemical vapor deposition eq...

Chemical vapor deposition system

Apparatus and method for automated wafer handling

Patents Applicationslast 30 patents

Trademarklast 30 trademarks