Euv, L.L.C

Organization

Livermore, CA, US

Organizations

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Patents Grantslast 30 patents

Information Patent Grant
Method for the protection of extreme ultraviolet lithography optics
- Patent number 7,740,916
- Issue date Jun 22, 2010
- EUV LLC
- Philip A. Grunow
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Figure correction of multilayer coated optics
- Patent number 7,662,263
- Issue date Feb 16, 2010
- EUV LLC
- Henry N. Chapman
- G01 - MEASURING TESTING
Information Patent Grant
Adhesive particle shielding
- Patent number 7,473,301
- Issue date Jan 6, 2009
- EUV LLC
- Leonard Elliott Klebanoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum compatible, high-speed, 2-D mirror tilt stage
- Patent number 7,273,289
- Issue date Sep 25, 2007
- EUV LLC
- Paul E. Denham
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Condenser optic with sacrificial reflective surface
- Patent number 7,239,443
- Issue date Jul 3, 2007
- EUV LLC
- Daniel A. Tichenor
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Reticle stage based linear dosimeter
- Patent number 7,196,771
- Issue date Mar 27, 2007
- EUV LLC
- Kurt W. Berger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for in-situ cleaning of carbon contaminated surfaces
- Patent number 7,147,722
- Issue date Dec 12, 2006
- EUV LLC
- Leonard E. Klebanoff
- B08 - CLEANING
Information Patent Grant
Condenser optic with sacrificial reflective surface
- Patent number 7,081,992
- Issue date Jul 25, 2006
- EUV LLC
- Daniel A. Tichenor
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
EUV lithography reticles fabricated without the use of a patterned...
- Patent number 7,049,033
- Issue date May 23, 2006
- The EUV LLC
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Fluid jet electric discharge source
- Patent number 7,034,322
- Issue date Apr 25, 2006
- EUV LLC
- Howard A. Bender
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Diffractive optical element for extreme ultraviolet wavefront control
- Patent number 7,027,226
- Issue date Apr 11, 2006
- EUV LLC
- Kenneth Alan Goldberg
- G02 - OPTICS
Information Patent Grant
Extended surface parallel coating inspection method
- Patent number 7,016,030
- Issue date Mar 21, 2006
- EUV LLC
- Patrick P. Naulleau
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for debris mitigation for an electrical discha...
- Patent number 6,989,629
- Issue date Jan 24, 2006
- EUV LLC
- Leonard E. Klebanoff
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Holographic illuminator for synchrotron-based projection lithograph...
- Patent number 6,927,887
- Issue date Aug 9, 2005
- EUV LLC
- Patrick P. Naulleau
- G02 - OPTICS
Information Patent Grant
Reticle stage based linear dosimeter
- Patent number 6,906,781
- Issue date Jun 14, 2005
- EUV LLC
- Kurt W. Berger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for debris mitigation for an electrical discha...
- Patent number 6,888,297
- Issue date May 3, 2005
- EUV LLC
- Leonard E. Klebanoff
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of fabricating reflection-mode EUV diffusers
- Patent number 6,861,273
- Issue date Mar 1, 2005
- EUV LLC
- Erik Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for generating partially coherent radiation
- Patent number 6,859,263
- Issue date Feb 22, 2005
- EUV LLC
- Patrick P. Naulleau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for detecting the presence and thickness of ca...
- Patent number 6,847,463
- Issue date Jan 25, 2005
- EUV, LLC
- Michael E. Malinowski
- G01 - MEASURING TESTING
Information Patent Grant
Compliant layer chucking surface
- Patent number 6,835,415
- Issue date Dec 28, 2004
- EUV LLC
- Kenneth L. Blaedel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repair of localized defects in multilayer-coated reticle blanks for...
- Patent number 6,821,682
- Issue date Nov 23, 2004
- The EUV LLC
- Daniel G. Stearns
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Compensation of flare-induced CD changes EUVL
- Patent number 6,815,129
- Issue date Nov 9, 2004
- EUV LLC
- John E. Bjorkholm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for generating partially coherent radiation
- Patent number 6,798,494
- Issue date Sep 28, 2004
- EUV LLC
- Patrick P. Naulleau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Universal EUV in-band intensity detector
- Patent number 6,781,135
- Issue date Aug 24, 2004
- EUV, LLC
- Kurt W. Berger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optimized capping layers for EUV multilayers
- Patent number 6,780,496
- Issue date Aug 24, 2004
- EUV LLC
- Sasa Bajt
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Apparatus for in situ cleaning of carbon contaminated surfaces
- Patent number 6,772,776
- Issue date Aug 10, 2004
- EUV LLC
- Leonard E. Klebanoff
- B08 - CLEANING
Information Patent Grant
Synchrotron-based EUV lithography illuminator simulator
- Patent number 6,768,567
- Issue date Jul 27, 2004
- EUV LLC
- Patrick P. Naulleau
- G02 - OPTICS
Information Patent Grant
In-vacuum exposure shutter
- Patent number 6,744,493
- Issue date Jun 1, 2004
- EUV LLC
- Terry A. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Portable outgas detection apparatus
- Patent number 6,734,422
- Issue date May 11, 2004
- EUV LLC
- Steven Julian Haney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Discharge source with gas curtain for protecting optics from particles
- Patent number 6,714,624
- Issue date Mar 30, 2004
- EUV LLC
- Neal R. Fornaciari
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

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Patents Applicationslast 30 patents

Information Patent Application
Vacuum compatible, high-speed, 2-D mirror tilt stage
- Publication number 20060262435
- Publication date Nov 23, 2006
- EUV LLC
- Paul E. Denham
- G02 - OPTICS
Information Patent Application
Reticle stage based linear dosimeter
- Publication number 20050206870
- Publication date Sep 22, 2005
- EUV LLC
- Kurt W. Berger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for in-situ cleaning of carbon contaminated surfaces
- Publication number 20040211448
- Publication date Oct 28, 2004
- EUV LLC
- Leonard E. Klebanoff
- B08 - CLEANING

Organization

Patents Grantslast 30 patents

Method for the protection of extreme ultraviolet lithography optics

Figure correction of multilayer coated optics

Adhesive particle shielding

Vacuum compatible, high-speed, 2-D mirror tilt stage

Condenser optic with sacrificial reflective surface

Reticle stage based linear dosimeter

Method for in-situ cleaning of carbon contaminated surfaces

Condenser optic with sacrificial reflective surface

EUV lithography reticles fabricated without the use of a patterned...

Fluid jet electric discharge source

Diffractive optical element for extreme ultraviolet wavefront control

Extended surface parallel coating inspection method

Method and apparatus for debris mitigation for an electrical discha...

Holographic illuminator for synchrotron-based projection lithograph...

Reticle stage based linear dosimeter

Method and apparatus for debris mitigation for an electrical discha...

Method of fabricating reflection-mode EUV diffusers

Apparatus for generating partially coherent radiation

Method and apparatus for detecting the presence and thickness of ca...

Compliant layer chucking surface

Repair of localized defects in multilayer-coated reticle blanks for...

Compensation of flare-induced CD changes EUVL

Apparatus for generating partially coherent radiation

Universal EUV in-band intensity detector

Optimized capping layers for EUV multilayers

Apparatus for in situ cleaning of carbon contaminated surfaces

Synchrotron-based EUV lithography illuminator simulator

In-vacuum exposure shutter

Portable outgas detection apparatus

Discharge source with gas curtain for protecting optics from particles

Patents Applicationslast 30 patents

Vacuum compatible, high-speed, 2-D mirror tilt stage

Reticle stage based linear dosimeter

Apparatus for in-situ cleaning of carbon contaminated surfaces