FUJI CHEMICAL INDUSTRIAL CO., LTD

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TOYAMA-PREF. 930-0397, JP

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Patents Grantslast 30 patents

Information Patent Grant
Water-soluble photoresist composition
- Patent number 5,948,592
- Issue date Sep 7, 1999
- Fuji Chemicals Industrial Co., Ltd.
- Hiroshi Umehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative photoresist composition comprising a photosensitizer of a...
- Patent number 5,128,231
- Issue date Jul 7, 1992
- Oki Electric Industry Co., Ltd.
- Toshio Itoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for forming photoresist pattern using contrast enhancement...
- Patent number 4,889,795
- Issue date Dec 26, 1989
- Oki Electric Industry Co., Ltd.
- Katsuaki Kaifu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming material
- Patent number 4,845,143
- Issue date Jul 4, 1989
- Oki Electric Industry Co., Ltd.
- Toshio Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive lithographic plate with diazo resin underlayer and p...
- Patent number 4,588,669
- Issue date May 13, 1986
- Fuji Chemicals Industrial Co., Ltd.
- Takateru Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of preparing a lithographic printing plate
- Patent number 4,444,858
- Issue date Apr 24, 1984
- Fuji Chemicals Industrial Co., Ltd.
- Satoshi Nishibu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist for high energy radiation
- Patent number 4,279,984
- Issue date Jul 21, 1981
- Matsushita Electric Industrial Co., Ltd.
- Shunsuke Matsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist for high energy radiation
- Patent number 4,121,936
- Issue date Oct 24, 1978
- Matsushita Electric Industrial Co., Inc.
- Shunsuke Matsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Water-soluble composition admixture of copolymer having ethylenic u...
- Patent number 4,097,283
- Issue date Jun 27, 1978
- Fuji Chemicals Industrial Company Limited
- Takateru Asano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

FUJI CHEMICAL INDUSTRIAL CO., LTD

Organization

Patents Grantslast 30 patents

Water-soluble photoresist composition

Negative photoresist composition comprising a photosensitizer of a...

Process for forming photoresist pattern using contrast enhancement...

Pattern-forming material

Photosensitive lithographic plate with diazo resin underlayer and p...

Method of preparing a lithographic printing plate

Positive resist for high energy radiation

Positive resist for high energy radiation

Water-soluble composition admixture of copolymer having ethylenic u...