Kojundo Chemical Laboratory Co., Ltd.

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Saitama, JP

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Patents Grantslast 30 patents

Information Patent Grant
Atomic layer deposition method for metal thin films
- Patent number 11,807,939
- Issue date Nov 7, 2023
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Fumikazu Mizutani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precursor for chemical vapor deposition, and light-blocking contain...
- Patent number 11,655,538
- Issue date May 23, 2023
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Fumikazu Mizutani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Solid vaporization/supply system of metal halide for thin film depo...
- Patent number 11,613,809
- Issue date Mar 28, 2023
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Atsushi Itsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vaporizable source material container and solid vaporization/supply...
- Patent number 11,566,326
- Issue date Jan 31, 2023
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Atsushi Itsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition method of metal-containing thin film
- Patent number 10,752,992
- Issue date Aug 25, 2020
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Fumikazu Mizutani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing bi-layered ferroelectric thin film
- Patent number 5,932,281
- Issue date Aug 3, 1999
- Matsushita Electronics Corporation
- Yukoh Hochido
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

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Patents Applicationslast 30 patents

Information Patent Application
CONTAINER FOR VOLATILE RAW MATERIALS, AND SOLID GASIFICATION AND SU...
- Publication number 20240318310
- Publication date Sep 26, 2024
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Atsushi Itsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION METHOD FOR METAL THIN FILMS
- Publication number 20240060180
- Publication date Feb 22, 2024
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Fumikazu MIZUTANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR DEPOSITION SOURCE MATERIAL USED IN PRODUCTION OF FILM CONTAIN...
- Publication number 20240003004
- Publication date Jan 4, 2024
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Nobutaka TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING CRYSTALLINE GALLIUM NITRIDE THIN FILM
- Publication number 20230160051
- Publication date May 25, 2023
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Fumikazu Mizutani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIS(ETHYLCYCLOPENTADIENYL)TIN, PRECURSOR FOR CHEMICAL VAPOR DEPOSIT...
- Publication number 20220251706
- Publication date Aug 11, 2022
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Nobutaka TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPORIZABLE SOURCE MATERIAL CONTAINER AND SOLID VAPORIZATION/SUPPLY...
- Publication number 20220090261
- Publication date Mar 24, 2022
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Atsushi ITSUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SOLID VAPORIZATION/SUPPLY SYSTEM OF METAL HALIDE FOR THIN FILM DEPO...
- Publication number 20220064786
- Publication date Mar 3, 2022
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Atsushi ITSUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIS(ALKYLTETRAMETHYLCYCLOPENTADIENYL)ZINC, PRECURSOR FOR CHEMICAL V...
- Publication number 20210163519
- Publication date Jun 3, 2021
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Nobutaka TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRECURSOR FOR CHEMICAL VAPOR DEPOSITION, AND LIGHT-BLOCKING CONTAIN...
- Publication number 20200181775
- Publication date Jun 11, 2020
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Fumikazu MIZUTANI
- C01 - INORGANIC CHEMISTRY
Information Patent Application
ATOMIC LAYER DEPOSITION METHOD FOR METAL THIN FILMS
- Publication number 20200087787
- Publication date Mar 19, 2020
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Fumikazu MIZUTANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION METHOD OF METAL-CONTAINING THIN FILM
- Publication number 20190203357
- Publication date Jul 4, 2019
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Fumikazu MIZUTANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING TARGET
- Publication number 20150194293
- Publication date Jul 9, 2015
- KOJUNDO CHEMICAL LABORATORY CO., LTD.
- Takahiro UNNO
- H01 - BASIC ELECTRIC ELEMENTS

Kojundo Chemical Laboratory Co., Ltd.

Organization

Patents Grantslast 30 patents

Atomic layer deposition method for metal thin films

Precursor for chemical vapor deposition, and light-blocking contain...

Solid vaporization/supply system of metal halide for thin film depo...

Vaporizable source material container and solid vaporization/supply...

Atomic layer deposition method of metal-containing thin film

Method of manufacturing bi-layered ferroelectric thin film

Patents Applicationslast 30 patents

CONTAINER FOR VOLATILE RAW MATERIALS, AND SOLID GASIFICATION AND SU...

ATOMIC LAYER DEPOSITION METHOD FOR METAL THIN FILMS

VAPOR DEPOSITION SOURCE MATERIAL USED IN PRODUCTION OF FILM CONTAIN...

METHOD FOR MANUFACTURING CRYSTALLINE GALLIUM NITRIDE THIN FILM

BIS(ETHYLCYCLOPENTADIENYL)TIN, PRECURSOR FOR CHEMICAL VAPOR DEPOSIT...

VAPORIZABLE SOURCE MATERIAL CONTAINER AND SOLID VAPORIZATION/SUPPLY...

SOLID VAPORIZATION/SUPPLY SYSTEM OF METAL HALIDE FOR THIN FILM DEPO...

BIS(ALKYLTETRAMETHYLCYCLOPENTADIENYL)ZINC, PRECURSOR FOR CHEMICAL V...

PRECURSOR FOR CHEMICAL VAPOR DEPOSITION, AND LIGHT-BLOCKING CONTAIN...

ATOMIC LAYER DEPOSITION METHOD FOR METAL THIN FILMS

ATOMIC LAYER DEPOSITION METHOD OF METAL-CONTAINING THIN FILM

SPUTTERING TARGET