LEEPL CORPORATION

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WATCHUNG, NJ, US

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Patents Grantslast 30 patents

Information Patent Grant
Electron beam proximity exposure apparatus and mask unit therefor
- Patent number 6,894,295
- Issue date May 17, 2005
- Leepl Corporation
- Nobuo Shimazu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam proximity exposure apparatus and method
- Patent number 6,727,507
- Issue date Apr 27, 2004
- Leepl Corporation
- Nobuo Shimazu
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mask inspecting apparatus
- Patent number 6,717,157
- Issue date Apr 6, 2004
- Leepl Corporation
- Takao Utsumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam proximity exposure apparatus
- Patent number 6,703,623
- Issue date Mar 9, 2004
- Leepl Corporation
- Nobuo Shimazu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring and calibrating inclination of electron beam in...
- Patent number 6,624,430
- Issue date Sep 23, 2003
- Leepl Corporation
- Akira Higuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of mask for electron beam proximity exposure a...
- Patent number 6,444,374
- Issue date Sep 3, 2002
- LEEPL Corporatin
- Nobuo Shimazu
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MASK INSPECTING APPARATUS
- Publication number 20040004195
- Publication date Jan 8, 2004
- LEEPL Corporation
- Takao Utsumi
- B82 - NANO-TECHNOLOGY

Trademarklast 30 trademarks

Information Trademark
78387550 - LEEPL
- Serial number 78387550
- Filing date Mar 19, 2004
- LEEPL CORPORATION
- 7 - Machines and machine tools