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Materials CMP Holdings, Inc.
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Newark, DE, US
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Patents Grants
last 30 patents
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Patent Grant
Polyurethane polishing pad
Patent number
7,414,080
Issue date
Aug 19, 2008
Materials CMP Holdings, Inc.
Mary Jo Kulp
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...