Materials CMP Holdings, Inc.

Organization

  • Newark, DE, US

Patents Grantslast 30 patents

  • Information Patent Grant

    Polyurethane polishing pad

    • Patent number 7,414,080
    • Issue date Aug 19, 2008
    • Materials CMP Holdings, Inc.
    • Mary Jo Kulp
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...