Matrix Integrated Systems, Inc.

Organization

Richmond, CA, US

Organizations

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for increased workpiece throughput
- Patent number 6,736,927
- Issue date May 18, 2004
- Matrix Integrated Systems, Inc.
- Albert Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing flat wafer chucks
- Patent number 6,660,975
- Issue date Dec 9, 2003
- Matrix Integrated Systems, Inc.
- Albert Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for increased workpiece throughput
- Patent number 6,605,226
- Issue date Aug 12, 2003
- Matrix Integrated Systems, Inc.
- Albert Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
End-effector with integrated cooling mechanism
- Patent number 6,499,777
- Issue date Dec 31, 2002
- Matrix Integrated Systems, Inc.
- Albert Wang
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Rapid heating and cooling of workpiece chucks
- Patent number 6,461,801
- Issue date Oct 8, 2002
- Matrix Integrated Systems, Inc.
- Albert Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Downstream sapphire elbow joint for remote plasma generator
- Patent number 6,412,438
- Issue date Jul 2, 2002
- Matrix Integrated Systems, Inc.
- Mohammad Kamarehi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for increased workpiece throughput
- Patent number 6,409,932
- Issue date Jun 25, 2002
- Matrix Integrated Systems, Inc.
- Albert Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Remote plasma mixer
- Patent number 6,352,050
- Issue date Mar 5, 2002
- Matrix Integrated Systems, Inc.
- Mohammad Kamarehi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for stripping ion implanted photoresist layer
- Patent number 6,352,936
- Issue date Mar 5, 2002
- Imec VZW
- Christian Jehoul
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microwave choke for remote plasma generator
- Patent number 6,263,830
- Issue date Jul 24, 2001
- Matrix Integrated Systems, Inc.
- Mohammad Kamarehi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronous multiplexed near zero overhead architecture for vacuum...
- Patent number 6,228,773
- Issue date May 8, 2001
- Matrix Integrated Systems, Inc.
- Gerald M. Cox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Parallel plate reactor and method of use
- Patent number 5,209,803
- Issue date May 11, 1993
- Matrix Integrated Systems, Inc.
- Gary B. Powell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching with parallel plate reactor having a grid
- Patent number 5,015,331
- Issue date May 14, 1991
- Matrix Integrated Systems
- Gary B. Powell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlled chuck for elevated temperature etch processing
- Patent number 4,971,653
- Issue date Nov 20, 1990
- Matrix Integrated Systems
- Gary B. Powell
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Trademarklast 30 trademarks

Information Trademark
74161927 - SWAC
- Serial number 74161927
- Filing date Apr 29, 1991
- Matrix Integrated Systems
- 9 - Scientific, nautical, surveying, photographic, cinematographic, optical, weighing, measuring, signalling, checking (supervision), life-saving and teaching apparatus and instruments

Matrix Integrated Systems, Inc.

Organization

Patents Grantslast 30 patents

Apparatus for increased workpiece throughput

Method for producing flat wafer chucks

Method for increased workpiece throughput

End-effector with integrated cooling mechanism

Rapid heating and cooling of workpiece chucks

Downstream sapphire elbow joint for remote plasma generator

Method and apparatus for increased workpiece throughput

Remote plasma mixer

Method for stripping ion implanted photoresist layer

Microwave choke for remote plasma generator

Synchronous multiplexed near zero overhead architecture for vacuum...

Parallel plate reactor and method of use

Method of plasma etching with parallel plate reactor having a grid

Temperature controlled chuck for elevated temperature etch processing

Patents Applicationslast 30 patents

Trademarklast 30 trademarks

74161927 - SWAC