NEXPLANAR CORPORATION

Organization

HILLSBORO, OR, US

Organizations

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Polishing pad having polishing surface with continuous protrusions
- Patent number 9,649,742
- Issue date May 16, 2017
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Method of fabricating a polishing
- Patent number 9,597,770
- Issue date Mar 21, 2017
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with polishing surface layer having an aperture or op...
- Patent number 9,597,769
- Issue date Mar 21, 2017
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Homogeneous polishing pad for eddy current end-point detection
- Patent number 9,597,777
- Issue date Mar 21, 2017
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with multi-modal distribution of pore diameters
- Patent number 9,555,518
- Issue date Jan 31, 2017
- NexPlanar Corporation
- Ping Huang
- B24 - GRINDING POLISHING
Information Patent Grant
Grooved CMP pads
- Patent number 9,375,823
- Issue date Jun 28, 2016
- NexPlanar Corporation
- Robert Kerprich
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with homogeneous body having discrete protrusions the...
- Patent number 9,296,085
- Issue date Mar 29, 2016
- NexPlanar Corporation
- Rajeev Bajaj
- B24 - GRINDING POLISHING
Information Patent Grant
Customized polishing pads for CMP and methods of fabrication and us...
- Patent number 9,278,424
- Issue date Mar 8, 2016
- NexPlanar Corporation
- Pradip K. Roy
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing systems
- Patent number 9,272,388
- Issue date Mar 1, 2016
- NexPlanar Corporation
- Sudhanshu Misra
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with alignment feature
- Patent number 9,249,273
- Issue date Feb 2, 2016
- NexPlanar Corporation
- Robert Kerprich
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having porogens with liquid filler
- Patent number 9,238,294
- Issue date Jan 19, 2016
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with concentric or approximately concentric polygon g...
- Patent number 9,211,628
- Issue date Dec 15, 2015
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Grooved CMP pad
- Patent number 9,180,570
- Issue date Nov 10, 2015
- NexPlanar Corporation
- Robert Kerprich
- B24 - GRINDING POLISHING
Information Patent Grant
Soft polishing pad for polishing a semiconductor substrate
- Patent number 9,156,124
- Issue date Oct 13, 2015
- NexPlanar Corporation
- William Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with foundation layer and polishing surface layer
- Patent number 9,067,297
- Issue date Jun 30, 2015
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with grooved foundation layer and polishing surface l...
- Patent number 9,067,298
- Issue date Jun 30, 2015
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for eddy current end-point detection
- Patent number 9,028,302
- Issue date May 12, 2015
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
CMP pad with local area transparency
- Patent number 9,017,140
- Issue date Apr 28, 2015
- NexPlanar Corporation
- William Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with alignment feature
- Patent number 8,968,058
- Issue date Mar 3, 2015
- NexPlanar Corporation
- Robert Kerprich
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for producing in-situ grooves in chemical mechanical planar...
- Patent number 8,932,116
- Issue date Jan 13, 2015
- NexPlanar Corporation
- Manish Deopura
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with alignment aperture
- Patent number 8,920,219
- Issue date Dec 30, 2014
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Customized polishing pads for CMP and methods of fabrication and us...
- Patent number 8,864,859
- Issue date Oct 21, 2014
- NexPlanar Corporation
- Pradip K. Roy
- B24 - GRINDING POLISHING
Information Patent Grant
Customized polishing pads for CMP and methods of fabrication and us...
- Patent number 8,715,035
- Issue date May 6, 2014
- NexPlanar Corporation
- Pradip K. Roy
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with multi-modal distribution of pore diameters
- Patent number 8,702,479
- Issue date Apr 22, 2014
- NexPlanar Corporation
- Ping Huang
- B24 - GRINDING POLISHING
Information Patent Grant
Homogeneous polishing pad for eddy current end-point detection
- Patent number 8,657,653
- Issue date Feb 25, 2014
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for eddy current end-point detection
- Patent number 8,628,384
- Issue date Jan 14, 2014
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Method of fabricating a polishing pad with an end-point detection r...
- Patent number 8,439,994
- Issue date May 14, 2013
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing systems
- Patent number 8,383,003
- Issue date Feb 26, 2013
- NexPlanar Corporation
- Sudhanshu Misra
- B24 - GRINDING POLISHING
Information Patent Grant
Customized polish pads for chemical mechanical planarization
- Patent number 8,380,339
- Issue date Feb 19, 2013
- NexPlanar Corporation
- Sudhanshu Misra
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for producing in-situ grooves in chemical mechanical planar...
- Patent number 8,287,793
- Issue date Oct 16, 2012
- NexPlanar Corporation
- Manish Deopura
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS
- Publication number 20170203409
- Publication date Jul 20, 2017
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
CUSTOMIZED POLISHING PADS FOR CMP AND METHODS OF FABRICATION AND US...
- Publication number 20160229025
- Publication date Aug 11, 2016
- NexPlanar Corporation
- Pradip K. ROY
- B24 - GRINDING POLISHING
Information Patent Application
LOW DENSITY POLISHING PAD
- Publication number 20150038066
- Publication date Feb 5, 2015
- NexPlanar Corporation
- Ping Huang
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS...
- Publication number 20140273777
- Publication date Sep 18, 2014
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS
- Publication number 20140206268
- Publication date Jul 24, 2014
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
HOMOGENEOUS POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION
- Publication number 20140123563
- Publication date May 8, 2014
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
CMP pad with local area transparency
- Publication number 20110171883
- Publication date Jul 14, 2011
- NexPlanar Corporation
- William Allison
- B24 - GRINDING POLISHING
Information Patent Application
Polishing systems
- Publication number 20090318063
- Publication date Dec 24, 2009
- NexPlanar Corporation
- Sudhanshu Misra
- B24 - GRINDING POLISHING
Information Patent Application
Grooved CMP pad
- Publication number 20090311955
- Publication date Dec 17, 2009
- NexPlanar Corporation
- Robert Kerprich
- B24 - GRINDING POLISHING

Trademarklast 30 trademarks

Information Trademark
77869721 - ELEMENT
- Serial number 77869721
- Registration number 4372801
- Filing date Nov 10, 2009
- NexPlanar Corporation
- 7 - Machines and machine tools
Information Trademark
77509846 - NEXPLANAR
- Serial number 77509846
- Registration number 3702810
- Filing date Jun 27, 2008
- Neopad Technologies Corporation
- 7 - Machines and machine tools

NEXPLANAR CORPORATION

Organization

Patents Grantslast 30 patents

Polishing pad having polishing surface with continuous protrusions

Method of fabricating a polishing

Polishing pad with polishing surface layer having an aperture or op...

Homogeneous polishing pad for eddy current end-point detection

Polishing pad with multi-modal distribution of pore diameters

Grooved CMP pads

Polishing pad with homogeneous body having discrete protrusions the...

Customized polishing pads for CMP and methods of fabrication and us...

Polishing systems

Polishing pad with alignment feature

Polishing pad having porogens with liquid filler

Polishing pad with concentric or approximately concentric polygon g...

Grooved CMP pad

Soft polishing pad for polishing a semiconductor substrate

Polishing pad with foundation layer and polishing surface layer

Polishing pad with grooved foundation layer and polishing surface l...

Polishing pad for eddy current end-point detection

CMP pad with local area transparency

Polishing pad with alignment feature

Methods for producing in-situ grooves in chemical mechanical planar...

Polishing pad with alignment aperture

Customized polishing pads for CMP and methods of fabrication and us...

Customized polishing pads for CMP and methods of fabrication and us...

Polishing pad with multi-modal distribution of pore diameters

Homogeneous polishing pad for eddy current end-point detection

Polishing pad for eddy current end-point detection

Method of fabricating a polishing pad with an end-point detection r...

Polishing systems

Customized polish pads for chemical mechanical planarization

Methods for producing in-situ grooves in chemical mechanical planar...

Patents Applicationslast 30 patents

POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS

CUSTOMIZED POLISHING PADS FOR CMP AND METHODS OF FABRICATION AND US...

LOW DENSITY POLISHING PAD

POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS...

POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS

HOMOGENEOUS POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION

CMP pad with local area transparency

Polishing systems

Grooved CMP pad

Trademarklast 30 trademarks

77869721 - ELEMENT

77509846 - NEXPLANAR