Planar Solutions, LLC

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Adrian, MI, US

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Patents Grantslast 30 patents

Information Patent Grant
Reduction in large particle counts in polishing slurries
- Patent number 10,167,415
- Issue date Jan 1, 2019
- Fujifilm Planar Solutions, LLC
- James McDonough
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Advanced fluid processing methods and systems
- Patent number 10,159,949
- Issue date Dec 25, 2018
- Fujifilm Planar Solutions, LLC
- Shih-Pin Chou
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing compositions and methods of use thereof
- Patent number 10,106,705
- Issue date Oct 23, 2018
- Fujifilm Planar Solutions, LLC
- Alexei P. Leonov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reduction in large particle counts in polishing slurries
- Patent number 9,914,852
- Issue date Mar 13, 2018
- Fujifilm Planar Solutions, LLC
- James McDonough
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing compositions and methods for polishing cobalt films
- Patent number 9,735,031
- Issue date Aug 15, 2017
- Fujifilm Planar Solutions, LLC
- Luling Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing compositions and methods for polishing cobalt films
- Patent number 9,735,030
- Issue date Aug 15, 2017
- Fujifilm Planar Solutions, LLC
- Luling Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing compositions and methods for selectively polishing silico...
- Patent number 9,583,359
- Issue date Feb 28, 2017
- Fujifilm Planar Solutions, LLC
- Abhudaya Mishra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing compositions and methods for selectively polishing silico...
- Patent number 9,558,959
- Issue date Jan 31, 2017
- Fujifilm Planar Solutions, LLC
- Abhudaya Mishra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Homogeneous blending
- Patent number 9,556,371
- Issue date Jan 31, 2017
- Fujifilm Planar Solutions, LLC
- Saeed H. Mohseni
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for advanced node front-and-back-end of line chemical m...
- Patent number 9,190,286
- Issue date Nov 17, 2015
- Fujifilm Planar Solutions, LLC
- Bin Hu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluid processing
- Patent number 8,974,677
- Issue date Mar 10, 2015
- Planar Solutions, LLC
- Saeed H. Mohseni
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Composition for advanced node front-and back-end of line chemical m...
- Patent number 8,961,815
- Issue date Feb 24, 2015
- Planar Solutions, LLC
- Bin Hu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Patent number 8,779,011
- Issue date Jul 15, 2014
- Fujifilm Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Highly dilutable polishing concentrates and slurries
- Patent number 8,771,540
- Issue date Jul 8, 2014
- Fujifilm Planar Solutions, LLC
- Hyungjun Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Hydrate forms of 1,2,4-triazole, processes for manufacture thereof,...
- Patent number 8,742,130
- Issue date Jun 3, 2014
- Fujifilm Planar Solutions, LLC
- Deepak Mahulikar
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Highly dilutable polishing concentrates and slurries
- Patent number 8,404,143
- Issue date Mar 26, 2013
- Fujifilm Planar Solutions, LLC
- Hyungjun Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluid processing
- Patent number 8,303,806
- Issue date Nov 6, 2012
- Planar Solutions, LLC
- Saeed H. Mohseni
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Patent number 8,211,193
- Issue date Jul 3, 2012
- Fujifilm Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Highly dilutable polishing concentrates and slurries
- Patent number 8,192,644
- Issue date Jun 5, 2012
- Fujifilm Planar Solutions, LLC
- Hyungjun Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

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Patents Applicationslast 30 patents

Information Patent Application
POLISHING COMPOSITIONS CONTAINING CHARGED ABRASIVE
- Publication number 20190106596
- Publication date Apr 11, 2019
- Fujifilm Planar Solutions, LLC
- Abhudaya Mishra
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ADVANCED FLUID PROCESSING METHODS AND SYSTEMS
- Publication number 20190105620
- Publication date Apr 11, 2019
- Fujifilm Planar Solutions, LLC
- Shih-Pin Chou
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20190055431
- Publication date Feb 21, 2019
- Fujifilm Planar Solutions, LLC
- Alexei P. Leonov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY FOR COBALT APPLICATIONS
- Publication number 20180340094
- Publication date Nov 29, 2018
- Fujifilm Planar Solutions, LLC
- Yannan Liang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20180282580
- Publication date Oct 4, 2018
- Fujifilm Planar Solutions, LLC
- Alexei P. Leonov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITIONS
- Publication number 20180187047
- Publication date Jul 5, 2018
- Fujifilm Planar Solutions, LLC
- James McDonough
- B24 - GRINDING POLISHING
Information Patent Application
REDUCTION IN LARGE PARTICLE COUNTS IN POLISHING SLURRIES
- Publication number 20180187048
- Publication date Jul 5, 2018
- Fujifilm Planar Solutions, LLC
- James McDonough
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELEVATED TEMPERATURE CMP COMPOSITIONS AND METHODS FOR USE THEREOF
- Publication number 20180100086
- Publication date Apr 12, 2018
- Fujifilm Planar Solutions, LLC
- Deepak Mahulikar
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
REDUCTION IN LARGE PARTICLE COUNTS IN POLISHING SLURRIES
- Publication number 20180079931
- Publication date Mar 22, 2018
- Fujifilm Planar Solutions, LLC
- James McDonough
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ADVANCED FLUID PROCESSING METHODS AND SYSTEMS
- Publication number 20170259229
- Publication date Sep 14, 2017
- Fujifilm Planar Solutions, LLC
- Shih-Pin Chou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITIONS AND METHODS FOR POLISHING COBALT FILMS
- Publication number 20160189976
- Publication date Jun 30, 2016
- Fujifilm Planar Solutions, LLC
- Luling Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITIONS AND METHODS FOR POLISHING COBALT FILMS
- Publication number 20160068710
- Publication date Mar 10, 2016
- Fujifilm Planar Solutions, LLC
- Luling Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
REDUCTION IN LARGE PARTICLE COUNTS IN POLISHING SLURRIES
- Publication number 20160053136
- Publication date Feb 25, 2016
- Fujifilm Planar Solutions, LLC
- James McDonough
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR ADVANCED NODE FRONT-AND-BACK-END OF LINE CHEMICAL M...
- Publication number 20150132957
- Publication date May 14, 2015
- FUJIFILM PLANAR SOLUTIONS, LLC
- Bin Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND SYSTEM
- Publication number 20140238441
- Publication date Aug 28, 2014
- Fujifilm Planar Solutions, LLC
- Saeed Mohseni
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
HYDRATE FORMS OF 1,2,4-TRIAZOLE, PROCESSES FOR MANUFACTURE THEREOF,...
- Publication number 20140121382
- Publication date May 1, 2014
- FUJIFILM PLANAR SOLUTIONS, LLC
- Deepak Mahulikar
- C07 - ORGANIC CHEMISTRY
Information Patent Application
HIGHLY DILUTABLE POLISHING CONCENTRATES AND SLURRIES
- Publication number 20130288478
- Publication date Oct 31, 2013
- Fujifilm Planar Solutions, LLC
- Hyungjun Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Homogeneous Blending
- Publication number 20130067998
- Publication date Mar 21, 2013
- Planar Solutions, LLC
- Saeed H. Mohseni
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING...
- Publication number 20120145950
- Publication date Jun 14, 2012
- Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD AND SYSTEM
- Publication number 20120055865
- Publication date Mar 8, 2012
- Fujifilm Planar Solutions, LLC
- Saeed H. Mohseni
- B08 - CLEANING
Information Patent Application
COMPOSITION FOR ADVANCED NODE FRONT-AND BACK-END OF LINE CHEMICAL M...
- Publication number 20120003901
- Publication date Jan 5, 2012
- Planar Solutions, LLC
- Bin Hu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
HIGHLY DILUTABLE POLISHING CONCENTRATES AND SLURRIES
- Publication number 20110089143
- Publication date Apr 21, 2011
- Planar Solutions, LLC
- Hyungjun Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Copper polishing slurry
- Publication number 20090053896
- Publication date Feb 26, 2009
- Planar Solutions, LLC
- Bin Hu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Publication number 20070254964
- Publication date Nov 1, 2007
- Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Publication number 20070075292
- Publication date Apr 5, 2007
- Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Fumed silica to colloidal silica conversion process
- Publication number 20060283095
- Publication date Dec 21, 2006
- Planar Solutions, LLC
- Deepak Mahulikar
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Colloidal silica based chemical mechanical polishing slurry
- Publication number 20060124593
- Publication date Jun 15, 2006
- Planar Solutions, LLC
- Gert R.M. Moyaerts
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Planar Solutions, LLC

Organization

Patents Grantslast 30 patents

Reduction in large particle counts in polishing slurries

Advanced fluid processing methods and systems

Polishing compositions and methods of use thereof

Reduction in large particle counts in polishing slurries

Polishing compositions and methods for polishing cobalt films

Polishing compositions and methods for polishing cobalt films

Polishing compositions and methods for selectively polishing silico...

Polishing compositions and methods for selectively polishing silico...

Homogeneous blending

Composition for advanced node front-and-back-end of line chemical m...

Fluid processing

Composition for advanced node front-and back-end of line chemical m...

Ultrapure colloidal silica for use in chemical mechanical polishing...

Highly dilutable polishing concentrates and slurries

Hydrate forms of 1,2,4-triazole, processes for manufacture thereof,...

Highly dilutable polishing concentrates and slurries

Fluid processing

Ultrapure colloidal silica for use in chemical mechanical polishing...

Highly dilutable polishing concentrates and slurries

Patents Applicationslast 30 patents

POLISHING COMPOSITIONS CONTAINING CHARGED ABRASIVE

ADVANCED FLUID PROCESSING METHODS AND SYSTEMS

POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

CHEMICAL MECHANICAL POLISHING SLURRY FOR COBALT APPLICATIONS

POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

POLISHING COMPOSITIONS

REDUCTION IN LARGE PARTICLE COUNTS IN POLISHING SLURRIES

ELEVATED TEMPERATURE CMP COMPOSITIONS AND METHODS FOR USE THEREOF

REDUCTION IN LARGE PARTICLE COUNTS IN POLISHING SLURRIES

ADVANCED FLUID PROCESSING METHODS AND SYSTEMS

POLISHING COMPOSITIONS AND METHODS FOR POLISHING COBALT FILMS

POLISHING COMPOSITIONS AND METHODS FOR POLISHING COBALT FILMS

REDUCTION IN LARGE PARTICLE COUNTS IN POLISHING SLURRIES

COMPOSITION FOR ADVANCED NODE FRONT-AND-BACK-END OF LINE CHEMICAL M...

CLEANING METHOD AND SYSTEM

HYDRATE FORMS OF 1,2,4-TRIAZOLE, PROCESSES FOR MANUFACTURE THEREOF,...

HIGHLY DILUTABLE POLISHING CONCENTRATES AND SLURRIES

Homogeneous Blending

ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING...

CLEANING METHOD AND SYSTEM

COMPOSITION FOR ADVANCED NODE FRONT-AND BACK-END OF LINE CHEMICAL M...

HIGHLY DILUTABLE POLISHING CONCENTRATES AND SLURRIES

Copper polishing slurry

Ultrapure colloidal silica for use in chemical mechanical polishing...

Ultrapure colloidal silica for use in chemical mechanical polishing...

Fumed silica to colloidal silica conversion process

Colloidal silica based chemical mechanical polishing slurry