S.E.S. COMPANY LIMITED

Organization

Tokyo, JP

Organizations

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Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and substrate processing device
- Patent number 7,648,580
- Issue date Jan 19, 2010
- Ses Co., Ltd.
- Katsuyoshi Nakatsukasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate and substrate processing apparatus
- Patent number 7,437,834
- Issue date Oct 21, 2008
- Ses Co., Ltd.
- Katsuyoshi Nakatsukasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single wafer type substrate cleaning method and apparatus
- Patent number 7,029,538
- Issue date Apr 18, 2006
- S.E.S. Company Limited
- Yuji Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single wafer type substrate cleaning method and apparatus
- Patent number 6,915,809
- Issue date Jul 12, 2005
- S.E.S. Company Limited
- Kizoh Shibagaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single wafer type substrate cleaning method and apparatus
- Patent number 6,824,621
- Issue date Nov 30, 2004
- S.E.S. Company Limited
- Kizoh Shibagaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single wafer type substrate cleaning method and apparatus
- Patent number 6,807,974
- Issue date Oct 26, 2004
- S.E.S. Company Limited
- Yuji Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single wafer type cleaning method and apparatus
- Patent number 6,792,959
- Issue date Sep 21, 2004
- S.E.S. Company Limited
- Yuji Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning system
- Patent number 6,763,839
- Issue date Jul 20, 2004
- S.E.S. Company Limited
- Ryoichi Ohkura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single wafer type cleaning method and apparatus
- Patent number 6,752,877
- Issue date Jun 22, 2004
- S.E.S. Company Limited
- Yuji Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment method of semiconductor wafers and the like and treatment...
- Patent number 6,695,926
- Issue date Feb 24, 2004
- Ses Co., Ltd.
- Tetsuo Koyanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing unit
- Patent number 6,637,445
- Issue date Oct 28, 2003
- S.E.S. Company Limited
- Kazuhisa Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment method of semiconductor wafers and the like and treatment...
- Patent number 5,951,779
- Issue date Sep 14, 1999
- Ses Co., Ltd.
- Tetsuo Koyanagi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTROLESS PLATING METHOD
- Publication number 20100092661
- Publication date Apr 15, 2010
- S.E.S. CO., LTD.
- Tetsuya Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROPLATING METHOD
- Publication number 20100000872
- Publication date Jan 7, 2010
- S.E.S. CO., LTD.
- Tetsuya Shimizu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD AND APPARATUS FOR TESTING LEAKAGE OF PIPE PASSAGE
- Publication number 20090165534
- Publication date Jul 2, 2009
- FUJIKIN INCORPORATION
- Gisuke Kohno
- G01 - MEASURING TESTING
Information Patent Application
Substrate Treatment Apparatus
- Publication number 20080105286
- Publication date May 8, 2008
- S.E.S. CO., Ltd.
- Hiroshi Kizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Treatment Apparatus
- Publication number 20080035182
- Publication date Feb 14, 2008
- S.E.S. Co. Ltd.
- Katsuyoshi Nakatsukasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of processing substrate and substrate processing apparatus
- Publication number 20060201363
- Publication date Sep 14, 2006
- S.E.S. CO., Ltd.
- Katsuyoshi Nakatsukasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single wafer type cleaning method and apparatus
- Publication number 20030201003
- Publication date Oct 30, 2003
- S.E.S. COMPANY LIMITED
- Yuji Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single wafer type substrate cleaning method and apparatus
- Publication number 20030047192
- Publication date Mar 13, 2003
- S.E.S. COMPANY LIMITED
- Yuji Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single wafer type substrate cleaning method and apparatus
- Publication number 20020195128
- Publication date Dec 26, 2002
- S.E.S. COMPANY LIMITED
- Kizoh Shibagaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single wafer type cleaning method and apparatus
- Publication number 20020179120
- Publication date Dec 5, 2002
- S.E.S. COMPANY LIMITED
- Yuji Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single wafer type substrate cleaning method and apparatus
- Publication number 20020074020
- Publication date Jun 20, 2002
- S.E.S. COMPANY LIMITED
- Yuji Ono
- H01 - BASIC ELECTRIC ELEMENTS

S.E.S. COMPANY LIMITED

Organization

Patents Grantslast 30 patents

Substrate processing method and substrate processing device

Method of processing substrate and substrate processing apparatus

Single wafer type substrate cleaning method and apparatus

Single wafer type substrate cleaning method and apparatus

Single wafer type substrate cleaning method and apparatus

Single wafer type substrate cleaning method and apparatus

Single wafer type cleaning method and apparatus

Substrate cleaning system

Single wafer type cleaning method and apparatus

Treatment method of semiconductor wafers and the like and treatment...

Substrate processing unit

Treatment method of semiconductor wafers and the like and treatment...

Patents Applicationslast 30 patents

ELECTROLESS PLATING METHOD

ELECTROPLATING METHOD

METHOD AND APPARATUS FOR TESTING LEAKAGE OF PIPE PASSAGE

Substrate Treatment Apparatus

Substrate Treatment Apparatus

Method of processing substrate and substrate processing apparatus

Single wafer type cleaning method and apparatus

Single wafer type substrate cleaning method and apparatus

Single wafer type substrate cleaning method and apparatus

Single wafer type cleaning method and apparatus

Single wafer type substrate cleaning method and apparatus

Trademarklast 30 trademarks