SPP TECHNOLOGIES CO., LTD.

Organization

Tokyo, JP

Organizations

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Maintenance support system, maintenance support method, and program
- Patent number 11,785,184
- Issue date Oct 10, 2023
- SPP Technologies Co., Ltd.
- Yutaka Tominaga
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate placing table, plasma processing apparatus provided with...
- Patent number 11,393,664
- Issue date Jul 19, 2022
- SPP Technologies Co., Ltd.
- Yasuyuki Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate placing table, plasma processing apparatus provided with...
- Patent number 11,361,949
- Issue date Jun 14, 2022
- SPP Technologies Co., Ltd.
- Yasuyuki Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma control apparatus
- Patent number 11,195,697
- Issue date Dec 7, 2021
- SPP Technologies Co., Ltd.
- Toshihiro Hayami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing silicon nitride film and silicon nitride film
- Patent number 10,559,459
- Issue date Feb 11, 2020
- Taiyo Nippon Sanso Corporation
- Hiroshi Taka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon nitride film and method of making thereof
- Patent number 10,280,084
- Issue date May 7, 2019
- SPP TECHNOLOGIES CO., LTD.
- Shoichi Murakami
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Etching device, plasma processing device
- Patent number 10,204,768
- Issue date Feb 12, 2019
- SPP Technologies Co., Ltd.
- Yasuyuki Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 9,123,542
- Issue date Sep 1, 2015
- SPP Technologies Co., Ltd.
- Shoichi Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus, method and program for manufacturing nitride film
- Patent number 9,117,660
- Issue date Aug 25, 2015
- SPP Technologies Co., Ltd.
- Shoichi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method
- Patent number 8,859,434
- Issue date Oct 14, 2014
- SPP Technologies Co., Ltd.
- Akimitsu Oishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processor
- Patent number 8,852,388
- Issue date Oct 7, 2014
- SPP Technologies Co., Ltd.
- Toshihiro Hayami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,771,461
- Issue date Jul 8, 2014
- SPP Technologies Co., Ltd.
- Toshihiro Hayami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 8,628,676
- Issue date Jan 14, 2014
- SPP Technologies Co., Ltd.
- Naoya Ikemoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, apparatus and program for manufacturing silicon structure
- Patent number 8,546,265
- Issue date Oct 1, 2013
- SPP Technologies Co., Ltd.
- Yoshiyuki Nozawa
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Plasma etching method capable of detecting end point and plasma etc...
- Patent number 8,518,283
- Issue date Aug 27, 2013
- SPP Technologies Co., Ltd.
- Takashi Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Substrate Processing Apparatus
- Publication number 20240395515
- Publication date Nov 28, 2024
- SPP TECHNOLOGIES CO., LTD.
- Kazuya OTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING GAS, PLASMA PROCESSING METHOD, AND PLASMA PROCESS...
- Publication number 20230230810
- Publication date Jul 20, 2023
- SPP TECHNOLOGIES CO., LTD.
- Kazuyuki SUEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WIDE-GAP SEMICONDUCTOR SUBSTRATE, APPARATUS FOR MANUFACTURING WIDE-...
- Publication number 20220416021
- Publication date Dec 29, 2022
- SPP TECHNOLOGIES CO., LTD.
- Takashi YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAINTENANCE SUPPORT SYSTEM, MAINTENANCE SUPPORT METHOD, AND PROGRAM
- Publication number 20220165044
- Publication date May 26, 2022
- SPP TECHNOLOGIES CO., LTD.
- Yutaka TOMINAGA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PRODUCTION PROCESS DETERMINATION DEVICE FOR SUBSTRATE PROCESSING AP...
- Publication number 20220114484
- Publication date Apr 14, 2022
- SPP TECHNOLOGIES CO., LTD.
- Katsuji HANADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF IGNITING PLASMA AND PLASMA GENERATING SYSTEM
- Publication number 20220115211
- Publication date Apr 14, 2022
- SPP TECHNOLOGIES CO., LTD.
- Bryan LIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAINTENANCE SUPPORT SYSTEM, MAINTENANCE SUPPORT METHOD, PROGRAM, ME...
- Publication number 20220012868
- Publication date Jan 13, 2022
- SPP TECHNOLOGIES CO., LTD.
- Takashi HABE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ABNORMALITY DETECTION APPARATUS
- Publication number 20210366750
- Publication date Nov 25, 2021
- SPP TECHNOLOGIES CO., LTD.
- Keisuke SUNABA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Substrate Placing Table, Plasma Processing Apparatus Provided With...
- Publication number 20210265141
- Publication date Aug 26, 2021
- SPP TECHNOLOGIES CO., LTD.
- Yasuyuki HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wide-Gap Semiconductor Substrate, Apparatus For Manufacturing Wide-...
- Publication number 20200127090
- Publication date Apr 23, 2020
- SPP TECHNOLOGIES CO., LTD.
- Takashi YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING SILICON NITRIDE FILM AND SILICON NITRIDE FILM
- Publication number 20190088465
- Publication date Mar 21, 2019
- Taiyo Nippon Sanso Corporation
- Hiroshi TAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CONTROL APPARATUS
- Publication number 20180315581
- Publication date Nov 1, 2018
- SPP TECHNOLOGIES CO., LTD.
- Toshihiro HAYAMI
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Plasma Processing Apparatus and Coil Used Therein
- Publication number 20160358748
- Publication date Dec 8, 2016
- SPP TECHNOLOGIES CO., LTD.
- Toshihiro Hayami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON NITRIDE FILM, PRODUCTION METHOD THEREFOR, AND PRODUCTION DE...
- Publication number 20160251224
- Publication date Sep 1, 2016
- SPP TECHNOLOGIES CO., LTD.
- Shoichi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Heating Device and Plasma Processing Apparatus Provided Therewith
- Publication number 20160153091
- Publication date Jun 2, 2016
- SPP TECHNOLOGIES CO., LTD.
- Toshihiro Hayami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus and Opening and Closing Mechanism used...
- Publication number 20160118225
- Publication date Apr 28, 2016
- SPP TECHNOLOGIES CO., LTD.
- Toshihiro Hayami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etching Device
- Publication number 20150170883
- Publication date Jun 18, 2015
- SPP TECHNOLOGIES CO., LTD.
- Takashi Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS, METHOD AND PROGRAM FOR MANUFACTURING NITRIDE FILM
- Publication number 20140220711
- Publication date Aug 7, 2014
- SPP Technologies Co., Ltd.
- Shoichi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Etching Method
- Publication number 20140187048
- Publication date Jul 3, 2014
- SPP TECHNOLOGIES CO., LTD.
- Shoichi Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching Method
- Publication number 20130115772
- Publication date May 9, 2013
- SPP TECHNOLOGIES CO., LTD.
- Akimitsu Oishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etching Method
- Publication number 20130034961
- Publication date Feb 7, 2013
- SPP TECHNOLOGIES CO., LTD.
- Naoya Ikemoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching Device, Plasma Processing Device
- Publication number 20120305194
- Publication date Dec 6, 2012
- SPP TECHNOLOGIES CO., LTD.
- Yasuyuki Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition Method
- Publication number 20120258604
- Publication date Oct 11, 2012
- SPP TECHNOLOGIES CO., LTD.
- Masayasu Hatashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Trademarklast 30 trademarks

Information Trademark
79177204 - SPT
- Serial number 79177204
- Registration number 5080036
- Filing date Sep 14, 2015
- SPP Technologies Co., Ltd.
- 7 - Machines and machine tools

SPP TECHNOLOGIES CO., LTD.

Organization

Patents Grantslast 30 patents

Maintenance support system, maintenance support method, and program

Substrate placing table, plasma processing apparatus provided with...

Substrate placing table, plasma processing apparatus provided with...

Plasma control apparatus

Method for producing silicon nitride film and silicon nitride film

Silicon nitride film and method of making thereof

Etching device, plasma processing device

Plasma etching method

Apparatus, method and program for manufacturing nitride film

Etching method

Plasma processor

Plasma processing apparatus

Plasma etching method

Method, apparatus and program for manufacturing silicon structure

Plasma etching method capable of detecting end point and plasma etc...

Patents Applicationslast 30 patents

Substrate Processing Apparatus

PLASMA PROCESSING GAS, PLASMA PROCESSING METHOD, AND PLASMA PROCESS...

WIDE-GAP SEMICONDUCTOR SUBSTRATE, APPARATUS FOR MANUFACTURING WIDE-...

MAINTENANCE SUPPORT SYSTEM, MAINTENANCE SUPPORT METHOD, AND PROGRAM

PRODUCTION PROCESS DETERMINATION DEVICE FOR SUBSTRATE PROCESSING AP...

METHOD OF IGNITING PLASMA AND PLASMA GENERATING SYSTEM

MAINTENANCE SUPPORT SYSTEM, MAINTENANCE SUPPORT METHOD, PROGRAM, ME...

ABNORMALITY DETECTION APPARATUS

Substrate Placing Table, Plasma Processing Apparatus Provided With...

Wide-Gap Semiconductor Substrate, Apparatus For Manufacturing Wide-...

METHOD FOR PRODUCING SILICON NITRIDE FILM AND SILICON NITRIDE FILM

PLASMA CONTROL APPARATUS

Plasma Processing Apparatus and Coil Used Therein

SILICON NITRIDE FILM, PRODUCTION METHOD THEREFOR, AND PRODUCTION DE...

Heating Device and Plasma Processing Apparatus Provided Therewith

Plasma Processing Apparatus and Opening and Closing Mechanism used...

Plasma Etching Device

APPARATUS, METHOD AND PROGRAM FOR MANUFACTURING NITRIDE FILM

Plasma Etching Method

Etching Method

Plasma Etching Method

Etching Device, Plasma Processing Device

Deposition Method

Trademarklast 30 trademarks

79177204 - SPT