Sumitomo Eaton Nova Corporation

Organization

Tokyo, JP

Organizations

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Wafer scanning device
- Patent number 7,217,934
- Issue date May 15, 2007
- Sumitomo Eaton Nova Corporation
- Masahumi Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mover device and semiconductor manufacturing apparatus and method
- Patent number 7,187,143
- Issue date Mar 6, 2007
- Sumitomo Eaton Nova, Corporation
- Keiji Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam deflecting method, beam deflector for scanning, ion implantati...
- Patent number 7,138,641
- Issue date Nov 21, 2006
- Sumitomo Eaton Nova Corporation
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source apparatus and electronic energy optimized method therefor
- Patent number 7,012,263
- Issue date Mar 14, 2006
- Sumitomo Eaton Nova Corporation
- Hirohiko Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and method for controlling the same
- Patent number 6,984,833
- Issue date Jan 10, 2006
- Sumitomo Eaton Nova Corporation
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam charge neutralizer and method therefor
- Patent number 6,815,697
- Issue date Nov 9, 2004
- Sumitomo Eaton Nova Corporation
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam mass separation filter, mass separation method thereof and...
- Patent number 6,803,590
- Issue date Oct 12, 2004
- Sumitomo Eaton Nova Corporation
- Adam Brailove
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing method and apparatus therefor
- Patent number 6,797,968
- Issue date Sep 28, 2004
- Sumitomo Eaton Nova Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus capable of increasing beam current
- Patent number 6,794,661
- Issue date Sep 21, 2004
- Sumitomo Eaton Nova Corporation
- Mitsukuni Tsukihara
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Ion implantation apparatus equipped with plasma shower and ion impl...
- Patent number 6,753,539
- Issue date Jun 22, 2004
- Sumitomo Eaton Nova Corporation
- Hiroshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and ion implantation method
- Patent number 6,720,563
- Issue date Apr 13, 2004
- Sumitomo Eaton Nova Corporation
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection method of coating film thickness and ion implantation equ...
- Patent number 6,663,791
- Issue date Dec 16, 2003
- Sumitomo Eaton Nova Corporation
- Hiroshi Kawaguchi
- G01 - MEASURING TESTING
Information Patent Grant
Ion implantation apparatus suited for low energy ion implantation a...
- Patent number 6,635,889
- Issue date Oct 21, 2003
- Sumitomo Eaton Nova Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus
- Patent number 6,573,517
- Issue date Jun 3, 2003
- Sumitomo Eaton Nova Corporation
- Michiro Sugitani
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Wafer carrying system and carrying method thereof
- Patent number 6,547,504
- Issue date Apr 15, 2003
- Sumitomo Eaton Nova Corporation
- Masamitsu Shinozuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer transport apparatus that can transfer multiple wafers in a sh...
- Patent number 5,931,627
- Issue date Aug 3, 1999
- Sumitomo Eaton Nova Corporation
- Keiji Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Robot arm capable of three-dimensionally moving a robot arm member
- Patent number 5,046,992
- Issue date Sep 10, 1991
- Sumitomo Eaton Nova Corporation
- Tadamoto Tamai
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Ion implantation capable of uniformly injecting an ion beam into a...
- Patent number 5,030,835
- Issue date Jul 9, 1991
- Sumitomo Eaton Nova Corporation
- Tadamoto Tamai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implantation apparatus capable of avoiding electrification of a...
- Patent number 4,994,674
- Issue date Feb 19, 1991
- Sumitomo Eaton Nova Corporation
- Tadamoto Tamai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanting apparatus
- Patent number 4,914,292
- Issue date Apr 3, 1990
- Sumitomo Eaton Nova Corporation
- Tadamoto Tamai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanting system
- Patent number 4,904,902
- Issue date Feb 27, 1990
- Sumitomo Eaton Nova Corporation
- Tadamoto Tamai
- H01 - BASIC ELECTRIC ELEMENTS

Please log in for detailed analytics

Patents Applicationslast 30 patents

Information Patent Application
Wafer processing system, wafer processing method, and ion implantat...
- Publication number 20060182532
- Publication date Aug 17, 2006
- SUMITOMO EATON NOVA CORPORATION
- Keiji Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Irradiation system with ion beam/charged particle beam
- Publication number 20060113468
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Takanori Yagita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to increase low-energy beam current in irradiation system wi...
- Publication number 20060113465
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam deflecting method, beam deflector for scanning, ion implantati...
- Publication number 20060113490
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam space-charge compensation device and ion implantation system h...
- Publication number 20060113491
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Hiroshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer charge compensation device and ion implantation system having...
- Publication number 20060113492
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Hiroshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Irradiation system ion beam and method to enhance accuracy of irrad...
- Publication number 20060113493
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Irradiation system with ion beam/charged particle beam
- Publication number 20060113467
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Takanori Yagita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implanter and method for controlling the same
- Publication number 20040251432
- Publication date Dec 16, 2004
- SUMITOMO EATON NOVA CORPORATION
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion source apparatus and electronic energy optimized method therefor
- Publication number 20040251424
- Publication date Dec 16, 2004
- SUMITOMO EATON NOVA CORPORATION
- Hirohiko Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mover device and semiconductor manufacturing apparatus and method
- Publication number 20040194565
- Publication date Oct 7, 2004
- Sumitomo Eaton Nova, Corporation
- Keiji Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam charge neutralizer and method therefor
- Publication number 20030183780
- Publication date Oct 2, 2003
- SUMITOMO EATON NOVA CORPORATION
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam mass separation filter, mass separation method thereof and...
- Publication number 20030168588
- Publication date Sep 11, 2003
- SUMITOMO EATON NOVA CORPORATION
- Adam Brailove
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implantation apparatus equipped with plasma shower and ion impl...
- Publication number 20030160190
- Publication date Aug 28, 2003
- SUMITOMO EATON NOVA CORPORATION
- Hiroshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam processing method and apparatus therefor
- Publication number 20030122090
- Publication date Jul 3, 2003
- SUMITOMO EATON NOVA CORPORATION
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implantation apparatus capable of increasing beam current
- Publication number 20020179854
- Publication date Dec 5, 2002
- SUMITOMO EATON NOVA CORPORATION
- Mitsukuni Tsukihara
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Ion implantation apparatus suited for low energy ion implantation a...
- Publication number 20020096650
- Publication date Jul 25, 2002
- SUMITOMO EATON NOVA CORPORATION
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer carrying system and carrying method thereof
- Publication number 20020014390
- Publication date Feb 7, 2002
- SUMITOMO EATON NOVA CORPORATION
- Masamitsu Shinozuka
- H01 - BASIC ELECTRIC ELEMENTS

Please log in for detailed analytics

Trademarklast 30 trademarks

Information Trademark
76646382 - SHX
- Serial number 76646382
- Registration number 3209953
- Filing date Sep 8, 2005
- Sumitomo Eaton Nova Corporation
- 7 - Machines and machine tools
Information Trademark
76599183 - SEN
- Serial number 76599183
- Registration number 3089128
- Filing date Jun 24, 2004
- Sumitomo Eaton Nova Corporation
- 7 - Machines and machine tools

Sumitomo Eaton Nova Corporation

Organization

Patents Grantslast 30 patents

Wafer scanning device

Mover device and semiconductor manufacturing apparatus and method

Beam deflecting method, beam deflector for scanning, ion implantati...

Ion source apparatus and electronic energy optimized method therefor

Ion implanter and method for controlling the same

Ion beam charge neutralizer and method therefor

Ion beam mass separation filter, mass separation method thereof and...

Ion beam processing method and apparatus therefor

Ion implantation apparatus capable of increasing beam current

Ion implantation apparatus equipped with plasma shower and ion impl...

Ion implantation apparatus and ion implantation method

Detection method of coating film thickness and ion implantation equ...

Ion implantation apparatus suited for low energy ion implantation a...

Ion implantation apparatus

Wafer carrying system and carrying method thereof

Wafer transport apparatus that can transfer multiple wafers in a sh...

Robot arm capable of three-dimensionally moving a robot arm member

Ion implantation capable of uniformly injecting an ion beam into a...

Ion implantation apparatus capable of avoiding electrification of a...

Ion implanting apparatus

Ion implanting system

Patents Applicationslast 30 patents

Wafer processing system, wafer processing method, and ion implantat...

Irradiation system with ion beam/charged particle beam

Method to increase low-energy beam current in irradiation system wi...

Beam deflecting method, beam deflector for scanning, ion implantati...

Beam space-charge compensation device and ion implantation system h...

Wafer charge compensation device and ion implantation system having...

Irradiation system ion beam and method to enhance accuracy of irrad...

Irradiation system with ion beam/charged particle beam

Ion implanter and method for controlling the same

Ion source apparatus and electronic energy optimized method therefor

Mover device and semiconductor manufacturing apparatus and method

Ion beam charge neutralizer and method therefor

Ion beam mass separation filter, mass separation method thereof and...

Ion implantation apparatus equipped with plasma shower and ion impl...

Ion beam processing method and apparatus therefor

Ion implantation apparatus capable of increasing beam current

Ion implantation apparatus suited for low energy ion implantation a...

Wafer carrying system and carrying method thereof

Trademarklast 30 trademarks

76646382 - SHX

76599183 - SEN