SVG LITHOGRAPHY SYSTEMS, INC

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WILTON, CT, US

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Patents Grantslast 30 patents

Information Patent Grant
High numerical aperture catadioptric lens
- Patent number 6,486,940
- Issue date Nov 26, 2002
- SVG Lithography Systems, Inc.
- David M. Williamson
- G02 - OPTICS
Information Patent Grant
Multi-channel grating interference alignment sensor
- Patent number 6,469,793
- Issue date Oct 22, 2002
- SVG Lithography Systems, Inc.
- Stuart T. Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV reticle thermal management
- Patent number 6,445,439
- Issue date Sep 3, 2002
- SVG Lithography Systems, Inc.
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non absorbing reticle and method of making same
- Patent number 6,444,372
- Issue date Sep 3, 2002
- SVG Lithography Systems, Inc.
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer alignment jig for wafer-handling systems
- Patent number 6,425,280
- Issue date Jul 30, 2002
- International Business Machines Corporation
- Dennis B. Ames
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In situ projection optic metrology method and apparatus
- Patent number 6,360,012
- Issue date Mar 19, 2002
- SVG Lithography Systems, Inc.
- Justin L. Kreuzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dose correction for along scan linewidth variation
- Patent number 6,292,255
- Issue date Sep 18, 2001
- SVG Lithography Systems, Inc.
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system with spatially controllable partial coherence
- Patent number 6,259,513
- Issue date Jul 10, 2001
- SVG Lithography Systems, Inc.
- Gregg Gallatin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective fly's eye condenser for EUV lithography
- Patent number 6,195,201
- Issue date Feb 27, 2001
- SVG Lithography Systems, Inc.
- Donald G. Koch
- G02 - OPTICS
Information Patent Grant
Dynamically adjustable high resolution adjustable slit
- Patent number 6,097,474
- Issue date Aug 1, 2000
- SVG Lithography Systems, Inc.
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling illumination field to reduce line width varia...
- Patent number 6,013,401
- Issue date Jan 11, 2000
- SVG Lithography Systems, Inc.
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vacuum assisted debris removal system
- Patent number 5,973,764
- Issue date Oct 26, 1999
- SVG Lithography Systems, Inc.
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line width insensitive wafer target detection in two directions
- Patent number 5,966,215
- Issue date Oct 12, 1999
- SVG Lithography Systems, Inc.
- Louis Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adjustable slit
- Patent number 5,966,202
- Issue date Oct 12, 1999
- SVG Lithography Systems, Inc.
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
On-axix mask and wafer alignment system
- Patent number 5,966,216
- Issue date Oct 12, 1999
- SVG Lithography Systems, Inc.
- Daniel N. Galburt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Four mirror EUV projection optics
- Patent number 5,956,192
- Issue date Sep 21, 1999
- SVG Lithography Systems, Inc.
- David M. Williamson
- G02 - OPTICS
Information Patent Grant
Line width insensitive wafer target detection
- Patent number 5,920,396
- Issue date Jul 6, 1999
- SVG Lithography Systems, Inc.
- Louis Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting an illumination field based on selected reticl...
- Patent number 5,895,737
- Issue date Apr 20, 1999
- SVG Lithography Systems, Inc.
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction of pattern noise in scanning lithographic system illumina...
- Patent number 5,896,188
- Issue date Apr 20, 1999
- SVG Lithography Systems, Inc.
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lamp stablity diagnostic system
- Patent number 5,818,575
- Issue date Oct 6, 1998
- SVG Lithography Systems, Inc.
- Michael A. Creighton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High numerical aperture ring field optical reduction system
- Patent number 5,815,310
- Issue date Sep 29, 1998
- SVG Lithography Systems, Inc.
- David M. Williamson
- G02 - OPTICS
Information Patent Grant
Multiple detector alignment system for photolithography
- Patent number 5,767,523
- Issue date Jun 16, 1998
- SVG Lithography Systems, Inc.
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Moving interferometer wafer stage
- Patent number 5,757,160
- Issue date May 26, 1998
- SVG Lithography Systems, Inc.
- Justin Kreuzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle container with corner holding
- Patent number 5,727,685
- Issue date Mar 17, 1998
- SVG Lithography Systems, Inc.
- Joseph Laganza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system having spatially separate vertical and horizont...
- Patent number 5,724,122
- Issue date Mar 3, 1998
- SVG Lithography Systems, Inc.
- Mark L. Oskotsky
- G02 - OPTICS
Information Patent Grant
Illumination system and method employing a deformable mirror and di...
- Patent number 5,684,566
- Issue date Nov 4, 1997
- SVG Lithography Systems, Inc.
- Stuart T. Stanton
- G02 - OPTICS
Information Patent Grant
Hybrid illumination system for use in photolithography
- Patent number 5,631,721
- Issue date May 20, 1997
- SVG Lithography Systems, Inc.
- Stuart Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and wafer diffraction grating alignment system wherein the dif...
- Patent number 5,559,601
- Issue date Sep 24, 1996
- SVG Lithography Systems, Inc.
- Gregg M. Gallatin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric optical reduction system with high numerical aperture
- Patent number 5,537,260
- Issue date Jul 16, 1996
- SVG Lithography Systems, Inc.
- David M. Williamson
- G02 - OPTICS
Information Patent Grant
Off axis alignment system for scanning photolithography
- Patent number 5,477,057
- Issue date Dec 19, 1995
- SVG Lithography Systems, Inc.
- David Angeley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

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Trademarklast 30 trademarks

Information Trademark
75403244 - MICRASCAN STEP & SCAN
- Serial number 75403244
- Filing date Dec 10, 1997
- SVG LITHOGRAPHY SYSTEMS, INC.
- 9 - Scientific, nautical, surveying, photographic, cinematographic, optical, weighing, measuring, signalling, checking (supervision), life-saving and teaching apparatus and instruments

SVG LITHOGRAPHY SYSTEMS, INC

Organization

Patents Grantslast 30 patents

High numerical aperture catadioptric lens

Multi-channel grating interference alignment sensor

EUV reticle thermal management

Non absorbing reticle and method of making same

Wafer alignment jig for wafer-handling systems

In situ projection optic metrology method and apparatus

Dose correction for along scan linewidth variation

Illumination system with spatially controllable partial coherence

Reflective fly&#x00027;s eye condenser for EUV lithography

Dynamically adjustable high resolution adjustable slit

Method of controlling illumination field to reduce line width varia...

Vacuum assisted debris removal system

Line width insensitive wafer target detection in two directions

Adjustable slit

On-axix mask and wafer alignment system

Four mirror EUV projection optics

Line width insensitive wafer target detection

Method for adjusting an illumination field based on selected reticl...

Reduction of pattern noise in scanning lithographic system illumina...

Lamp stablity diagnostic system

High numerical aperture ring field optical reduction system

Multiple detector alignment system for photolithography

Moving interferometer wafer stage

Reticle container with corner holding

Illumination system having spatially separate vertical and horizont...

Illumination system and method employing a deformable mirror and di...

Hybrid illumination system for use in photolithography

Mask and wafer diffraction grating alignment system wherein the dif...

Catadioptric optical reduction system with high numerical aperture

Off axis alignment system for scanning photolithography

Trademarklast 30 trademarks

75403244 - MICRASCAN STEP & SCAN

Reflective fly's eye condenser for EUV lithography