TAKUMI TECHNOLOGY CORPORATION

Organization

Santa Clara, CA, US

Organizations

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Patents Grantslast 30 patents

Information Patent Grant
Method of selecting a set of illumination conditions of a lithograp...
- Patent number 8,621,401
- Issue date Dec 31, 2013
- Takumi Technology Corporation
- Martinus Maria Berkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Model-based pattern characterization to generate rules for rule-mod...
- Patent number 8,281,264
- Issue date Oct 2, 2012
- Takumi Technology Corporation
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optimizing an integrated circuit physical layout
- Patent number 8,151,234
- Issue date Apr 3, 2012
- Takumi Technology Corporation
- Martinus Maria Berkens
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Contact or proximity printing using a magnified mask image
- Patent number 7,932,020
- Issue date Apr 26, 2011
- Takumi Technology Corporation
- Christophe Pierrat
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Integrated circuit design using modified cells
- Patent number 7,934,184
- Issue date Apr 26, 2011
- Takumi Technology Corporation
- Youping Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Creating and applying variable bias rules in rule-based optical pro...
- Patent number 7,908,572
- Issue date Mar 15, 2011
- Takumi Technology Corporation
- Youping Zhang
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Model-based pattern characterization to generate rules for rule-mod...
- Patent number 7,627,837
- Issue date Dec 1, 2009
- Takumi Technology Corp.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask data preparation
- Patent number 7,614,033
- Issue date Nov 3, 2009
- Takumi Technology Corp.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for integrated circuit layout partition and extraction for i...
- Patent number 7,533,363
- Issue date May 12, 2009
- Takumi Technology Corporation
- Youping Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System for designing integrated circuits with enhanced manufacturab...
- Patent number 7,523,429
- Issue date Apr 21, 2009
- Takumi Technology Corporation
- Armen Kroyan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Effective proximity effect correction methodology
- Patent number 7,458,056
- Issue date Nov 25, 2008
- Takumi Technology Corp.
- Christophe Pierrat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask data preparation
- Patent number 7,055,127
- Issue date May 30, 2006
- Takumi Technology Corp.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Effective proximity effect correction methodology
- Patent number 7,010,764
- Issue date Mar 7, 2006
- Takumi Technology Corp.
- Christophe Pierrat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Contact printing using a magnified mask image
- Patent number 6,961,186
- Issue date Nov 1, 2005
- Takumi Technology Corp.
- Christophe Pierrat
- G02 - OPTICS

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Patents Applicationslast 30 patents

Information Patent Application
Method of Selecting a Set of Illumination Conditions of a Lithogra...
- Publication number 20120042290
- Publication date Feb 16, 2012
- TAKUMI TECHNOLOGY CORPORATION
- Martinus Maria Berkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

TAKUMI TECHNOLOGY CORPORATION

Organization

Patents Grantslast 30 patents

Method of selecting a set of illumination conditions of a lithograp...

Model-based pattern characterization to generate rules for rule-mod...

Method for optimizing an integrated circuit physical layout

Contact or proximity printing using a magnified mask image

Integrated circuit design using modified cells

Creating and applying variable bias rules in rule-based optical pro...

Model-based pattern characterization to generate rules for rule-mod...

Mask data preparation

System for integrated circuit layout partition and extraction for i...

System for designing integrated circuits with enhanced manufacturab...

Effective proximity effect correction methodology

Mask data preparation

Effective proximity effect correction methodology

Contact printing using a magnified mask image

Patents Applicationslast 30 patents

Method of Selecting a Set of Illumination Conditions of a Lithogra...