Z Cap, L.L.C.

Follow

Organization

Scottsdale, AZ, US

Organizations

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for immersion treatment of semiconductor and o...
- Patent number 6,641,675
- Issue date Nov 4, 2003
- Z Cap, L.L.C.
- Paul William Dryer
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Method and apparatus for semiconductor wafer cleaning with reuse of...
- Patent number 6,415,803
- Issue date Jul 9, 2002
- Z Cap, L.L.C.
- James B. Sundin
- B08 - CLEANING
Information Patent Grant
Method and apparatus for immersion treatment of semiconductor and o...
- Patent number 6,284,055
- Issue date Sep 4, 2001
- Z Cap L.L.C.
- Paul William Dryer
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE

Patents Applicationslast 30 patents

Trademarklast 30 trademarks