ZOND, INC.

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Mansfield, MA, US

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Patents Grantslast 30 patents

Information Patent Grant
Method of ionized physical vapor desposition sputter coating high a...
- Patent number 9,771,648
- Issue date Sep 26, 2017
- Zond, Inc.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for sputtering hard coatings
- Patent number 9,123,508
- Issue date Sep 1, 2015
- Zond, LLC
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for generating strongly-ionized plasmas with...
- Patent number 8,125,155
- Issue date Feb 28, 2012
- Zond, Inc.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for generating strongly-ionized plasmas with...
- Patent number 7,898,183
- Issue date Mar 1, 2011
- Zond, Inc.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High deposition rate sputtering
- Patent number 7,811,421
- Issue date Oct 12, 2010
- Zond, Inc.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for generating strongly-ionized plasmas with...
- Patent number 7,808,184
- Issue date Oct 5, 2010
- Zond, Inc.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High density plasma source
- Patent number 7,750,575
- Issue date Jul 6, 2010
- Zond, Inc.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for generating strongly-ionized plasmas with...
- Patent number 7,663,319
- Issue date Feb 16, 2010
- Zond, Inc.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for generating high-density plasma
- Patent number 7,604,716
- Issue date Oct 20, 2009
- Zond, Inc.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-density plasma source
- Patent number 7,446,479
- Issue date Nov 4, 2008
- Zond, Inc.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for generating strongly-ionized plasmas with...
- Patent number 7,345,429
- Issue date Mar 18, 2008
- Zond, Inc.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-power pulsed magnetron sputtering
- Patent number 7,147,759
- Issue date Dec 12, 2006
- Zond, Inc.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for generating strongly-ionized plasmas with...
- Patent number 7,095,179
- Issue date Aug 22, 2006
- Zond, Inc.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Generation of uniformly-distributed plasma
- Patent number 6,903,511
- Issue date Jun 7, 2005
- Zond, Inc.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-power pulsed magnetically enhanced plasma processing
- Patent number 6,896,775
- Issue date May 24, 2005
- Zond, Inc.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High deposition rate sputtering
- Patent number 6,896,773
- Issue date May 24, 2005
- Zond, Inc.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for generating high-density plasma
- Patent number 6,853,142
- Issue date Feb 8, 2005
- Zond, Inc.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-density plasma source using excited atoms
- Patent number 6,806,652
- Issue date Oct 19, 2004
- Zond, Inc.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-density plasma source
- Patent number 6,806,651
- Issue date Oct 19, 2004
- Zond, Inc.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generation using multi-step ionization
- Patent number 6,805,779
- Issue date Oct 19, 2004
- Zond, Inc.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS

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Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR GENERATING HIGH-CURRENT ELECTRICAL DISCHARGES
- Publication number 20190368030
- Publication date Dec 5, 2019
- Zond, LLC
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR SPUTTERING HARD COATINGS
- Publication number 20180044780
- Publication date Feb 15, 2018
- Zond, LLC
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF COATING HIGH ASPECT RATIO FEATURES
- Publication number 20170029937
- Publication date Feb 2, 2017
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH POWER PULSE IONIZED PHYSICAL VAPOR DEPOSITION
- Publication number 20170029936
- Publication date Feb 2, 2017
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for Generating High-Current Electrical Discharges
- Publication number 20150315698
- Publication date Nov 5, 2015
- Zond, LLC
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR SPUTTERING HARD COATINGS
- Publication number 20150315697
- Publication date Nov 5, 2015
- Zond, LLC
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods And Apparatus For Generating Strongly-Ionized Plasmas With...
- Publication number 20140238844
- Publication date Aug 28, 2014
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods And Apparatus For Generating Strongly-Ionized Plasmas With...
- Publication number 20110133651
- Publication date Jun 9, 2011
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods And Apparatus For Generating Strongly-Ionized Plasmas With...
- Publication number 20110019332
- Publication date Jan 27, 2011
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Power Pulse Ionized Physical Vapor Deposition
- Publication number 20100326815
- Publication date Dec 30, 2010
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Power Pulse Magnetron Sputtering For High Aspect-Ratio Feature...
- Publication number 20100270144
- Publication date Oct 28, 2010
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and Apparatus for Generating Strongly-Ionized Plasmas with...
- Publication number 20100101935
- Publication date Apr 29, 2010
- ZOND, INC.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Hard Coating a Blade
- Publication number 20090321249
- Publication date Dec 31, 2009
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Density Plasma Source
- Publication number 20090032191
- Publication date Feb 5, 2009
- ZOND, INC.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR GENERATING STRONGLY-IONIZED PLASMAS WITH...
- Publication number 20070188104
- Publication date Aug 16, 2007
- ZOND, INC.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Source With Segmented Magnetron
- Publication number 20070181417
- Publication date Aug 9, 2007
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High-Power Pulsed Magnetron Sputtering
- Publication number 20070119701
- Publication date May 31, 2007
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods And Apparatus For Generating Strongly-Ionized Plasmas With...
- Publication number 20060279223
- Publication date Dec 14, 2006
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR GENERATING HIGH CURRENT ELECTRICAL DISCHARGES
- Publication number 20060066248
- Publication date Mar 30, 2006
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and Apparatus for Generating Strongly-Ionized Plasmas with...
- Publication number 20050184669
- Publication date Aug 25, 2005
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE WITH SEGMENTED MAGNETRON CATHODE
- Publication number 20050103620
- Publication date May 19, 2005
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Generation of Uniformly-Distributed Plasma
- Publication number 20040222745
- Publication date Nov 11, 2004
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-DENSITY PLASMA SOURCE USING EXCITED ATOMS
- Publication number 20040212312
- Publication date Oct 28, 2004
- ZOND, INC.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS

Organization

Patents Grantslast 30 patents

Method of ionized physical vapor desposition sputter coating high a...

Apparatus and method for sputtering hard coatings

Methods and apparatus for generating strongly-ionized plasmas with...

Methods and apparatus for generating strongly-ionized plasmas with...

High deposition rate sputtering

Methods and apparatus for generating strongly-ionized plasmas with...

High density plasma source

Methods and apparatus for generating strongly-ionized plasmas with...

Methods and apparatus for generating high-density plasma

High-density plasma source

Methods and apparatus for generating strongly-ionized plasmas with...

High-power pulsed magnetron sputtering

Methods and apparatus for generating strongly-ionized plasmas with...

Generation of uniformly-distributed plasma

High-power pulsed magnetically enhanced plasma processing

High deposition rate sputtering

Methods and apparatus for generating high-density plasma

High-density plasma source using excited atoms

High-density plasma source

Plasma generation using multi-step ionization

Patents Applicationslast 30 patents

APPARATUS FOR GENERATING HIGH-CURRENT ELECTRICAL DISCHARGES

APPARATUS AND METHOD FOR SPUTTERING HARD COATINGS

METHOD OF COATING HIGH ASPECT RATIO FEATURES

HIGH POWER PULSE IONIZED PHYSICAL VAPOR DEPOSITION

Apparatus for Generating High-Current Electrical Discharges

APPARATUS AND METHOD FOR SPUTTERING HARD COATINGS

Methods And Apparatus For Generating Strongly-Ionized Plasmas With...

Methods And Apparatus For Generating Strongly-Ionized Plasmas With...

Methods And Apparatus For Generating Strongly-Ionized Plasmas With...

High Power Pulse Ionized Physical Vapor Deposition

High Power Pulse Magnetron Sputtering For High Aspect-Ratio Feature...

Methods and Apparatus for Generating Strongly-Ionized Plasmas with...

Method of Hard Coating a Blade

High Density Plasma Source

METHODS AND APPARATUS FOR GENERATING STRONGLY-IONIZED PLASMAS WITH...

Plasma Source With Segmented Magnetron

High-Power Pulsed Magnetron Sputtering

Methods And Apparatus For Generating Strongly-Ionized Plasmas With...

APPARATUS FOR GENERATING HIGH CURRENT ELECTRICAL DISCHARGES

Methods and Apparatus for Generating Strongly-Ionized Plasmas with...

PLASMA SOURCE WITH SEGMENTED MAGNETRON CATHODE

Generation of Uniformly-Distributed Plasma

HIGH-DENSITY PLASMA SOURCE USING EXCITED ATOMS