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A. Marcia Almanza-Workman
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Sunnyvale, CA, US
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last 30 patents
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Patent Grant
Polymer-based pattern mask system and method having enhanced adhesion
Patent number
8,029,964
Issue date
Oct 4, 2011
Hewlett-Packard Development Company, L.P.
A. Marcia Almanza-Workman
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Liquid toner-based pattern mask method and system
Patent number
8,017,293
Issue date
Sep 13, 2011
Hewlett-Packard Development Company, L.P.
A. Marcia Almanza-Workman
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
LIQUID TONER-BASED PATTERN MASK METHOD AND SYSTEM
Publication number
20080248405
Publication date
Oct 9, 2008
A. Marcia Almanza-Workman
H01 - BASIC ELECTRIC ELEMENTS