Aaron Eppler

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Los Gatos, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Reducing aspect ratio dependent etch with direct current bias pulsing
- Patent number 12,237,149
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Deyang Li
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
REDUCING ASPECT RATIO DEPENDENT ETCH WITH DIRECT CURRENT BIAS PULSING
- Publication number 20240162007
- Publication date May 16, 2024
- Applied Materials, Inc.
- Deyang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIDEWALL PASSIVATION FOR PLASMA ETCHING
- Publication number 20230245895
- Publication date Aug 3, 2023
- Applied Materials, Inc.
- Zhonghua Yao
- H01 - BASIC ELECTRIC ELEMENTS