Abaneshwar Prasad

Person

Naperville, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing pad with light-stable light-transmitting region
- Patent number 9,156,125
- Issue date Oct 13, 2015
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with microporous regions
- Patent number 8,075,372
- Issue date Dec 13, 2011
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
CMP porous pad with component-filled pores
- Patent number 7,699,684
- Issue date Apr 20, 2010
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
Method of preparing a conductive film
- Patent number 7,686,994
- Issue date Mar 30, 2010
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer polishing pad material for CMP
- Patent number 7,435,161
- Issue date Oct 14, 2008
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
Transparent microporous materials for CMP
- Patent number 7,435,165
- Issue date Oct 14, 2008
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
Method for manufacturing microporous CMP materials having controlle...
- Patent number 7,311,862
- Issue date Dec 25, 2007
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
Transparent microporous materials for CMP
- Patent number 7,267,607
- Issue date Sep 11, 2007
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad comprising biodegradable polymer
- Patent number 7,264,641
- Issue date Sep 4, 2007
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polishing pad comprising hydrophobic region and endpoint detection...
- Patent number 7,204,742
- Issue date Apr 17, 2007
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
CMP porous pad with component-filled pores
- Patent number 7,195,544
- Issue date Mar 27, 2007
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
Low surface energy CMP pad
- Patent number 7,059,936
- Issue date Jun 13, 2006
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with oriented pore structure
- Patent number 6,998,166
- Issue date Feb 14, 2006
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
CMP pad with composite transparent window
- Patent number 6,960,120
- Issue date Nov 1, 2005
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
Microporous polishing pads
- Patent number 6,935,931
- Issue date Aug 30, 2005
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
Microporous polishing pads
- Patent number 6,913,517
- Issue date Jul 5, 2005
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
Microporous polishing pads
- Patent number 6,899,598
- Issue date May 31, 2005
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
Microporous polishing pads
- Patent number 6,896,593
- Issue date May 24, 2005
- Cabot Microelectronic Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Grant
Multi-layer polishing pad material for CMP
- Patent number 6,884,156
- Issue date Apr 26, 2005
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
CMP POLISHING PAD WITH COLUMNAR STRUCTURE AND METHODS RELATED THERETO
- Publication number 20170036320
- Publication date Feb 9, 2017
- Abaneshwar PRASAD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING PAD WITH LIGHT-STABLE LIGHT-TRANSMITTING REGION
- Publication number 20130273813
- Publication date Oct 17, 2013
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD COMPRISING TRANSMISSIVE REGION
- Publication number 20130237136
- Publication date Sep 12, 2013
- Cabot Microelectronics Corporation
- Kelly Newell
- B24 - GRINDING POLISHING
Information Patent Application
STACKED POLISHING PAD FOR HIGH TEMPERATURE APPLICATIONS
- Publication number 20080274674
- Publication date Nov 6, 2008
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
Method for manufacturing microporous CMP materials having controlle...
- Publication number 20080057845
- Publication date Mar 6, 2008
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
CMP Porous Pad with Component-Filled Pores
- Publication number 20070180778
- Publication date Aug 9, 2007
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad comprising magnetically sensitive particles and metho...
- Publication number 20060286906
- Publication date Dec 21, 2006
- Cabot Microelectronics Corporation
- Ronald E. Myers
- B24 - GRINDING POLISHING
Information Patent Application
Method of preparing a conductive film
- Publication number 20060199002
- Publication date Sep 7, 2006
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing microporous CMP materials having controlle...
- Publication number 20060052040
- Publication date Mar 9, 2006
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad with microporous regions
- Publication number 20060046622
- Publication date Mar 2, 2006
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
Surface textured microporous polishing pads
- Publication number 20050276967
- Publication date Dec 15, 2005
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Transparent microporous materials for CMP
- Publication number 20050277371
- Publication date Dec 15, 2005
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad comprising hydrophobic region and endpoint detection...
- Publication number 20050211376
- Publication date Sep 29, 2005
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
CMC porous pad with component-filled pores
- Publication number 20050215177
- Publication date Sep 29, 2005
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
Low surface energy CMP pad
- Publication number 20050215179
- Publication date Sep 29, 2005
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
Multi-layer polishing pad material for CMP
- Publication number 20050197050
- Publication date Sep 8, 2005
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
Negative poisson's ratio material-containing CMP polishing pad
- Publication number 20050153634
- Publication date Jul 14, 2005
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Polishing pad comprising biodegradable polymer
- Publication number 20050101228
- Publication date May 12, 2005
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad comprising biodegradable polymer
- Publication number 20050098540
- Publication date May 12, 2005
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multi-layer polishing pad material for CMP
- Publication number 20040259484
- Publication date Dec 23, 2004
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad with oriented pore structure
- Publication number 20040258882
- Publication date Dec 23, 2004
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
Microporous polishing pads
- Publication number 20040177563
- Publication date Sep 16, 2004
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Microporous polishing pads
- Publication number 20040171339
- Publication date Sep 2, 2004
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Microporous polishing pads
- Publication number 20040171340
- Publication date Sep 2, 2004
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Microporous polishing pads
- Publication number 20040171338
- Publication date Sep 2, 2004
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
CMP pad with composite transparent window
- Publication number 20040157533
- Publication date Aug 12, 2004
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
Transparent microporous materials for CMP
- Publication number 20040082276
- Publication date Apr 29, 2004
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B24 - GRINDING POLISHING
Information Patent Application
Microporous polishing pads
- Publication number 20030220061
- Publication date Nov 27, 2003
- Cabot Microelectronics Corporation
- Abaneshwar Prasad
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Abaneshwar Prasad

Person

Patents Grantslast 30 patents

Polishing pad with light-stable light-transmitting region

Polishing pad with microporous regions

CMP porous pad with component-filled pores

Method of preparing a conductive film

Multi-layer polishing pad material for CMP

Transparent microporous materials for CMP

Method for manufacturing microporous CMP materials having controlle...

Transparent microporous materials for CMP

Polishing pad comprising biodegradable polymer

Polishing pad comprising hydrophobic region and endpoint detection...

CMP porous pad with component-filled pores

Low surface energy CMP pad

Polishing pad with oriented pore structure

CMP pad with composite transparent window

Microporous polishing pads

Microporous polishing pads

Microporous polishing pads

Microporous polishing pads

Multi-layer polishing pad material for CMP

Patents Applicationslast 30 patents

CMP POLISHING PAD WITH COLUMNAR STRUCTURE AND METHODS RELATED THERETO

POLISHING PAD WITH LIGHT-STABLE LIGHT-TRANSMITTING REGION

POLISHING PAD COMPRISING TRANSMISSIVE REGION

STACKED POLISHING PAD FOR HIGH TEMPERATURE APPLICATIONS

Method for manufacturing microporous CMP materials having controlle...

CMP Porous Pad with Component-Filled Pores

Polishing pad comprising magnetically sensitive particles and metho...

Method of preparing a conductive film

Method for manufacturing microporous CMP materials having controlle...

Polishing pad with microporous regions

Surface textured microporous polishing pads

Transparent microporous materials for CMP

Polishing pad comprising hydrophobic region and endpoint detection...

CMC porous pad with component-filled pores

Low surface energy CMP pad

Multi-layer polishing pad material for CMP

Negative poisson's ratio material-containing CMP polishing pad

Polishing pad comprising biodegradable polymer

Polishing pad comprising biodegradable polymer

Multi-layer polishing pad material for CMP

Polishing pad with oriented pore structure

Microporous polishing pads

Microporous polishing pads

Microporous polishing pads

Microporous polishing pads

CMP pad with composite transparent window

Transparent microporous materials for CMP

Microporous polishing pads