Abdurrahman Sezginer

Person

Monte Serano, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Inspection of reticles using machine learning
- Patent number 12,094,101
- Issue date Sep 17, 2024
- KLA-Tencor Corporation
- Hawren Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Setting up inspection of a specimen
- Patent number 11,748,872
- Issue date Sep 5, 2023
- KLA Corp.
- Hong Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Defect inspection and review using transmissive current image of ch...
- Patent number 11,410,830
- Issue date Aug 9, 2022
- KLA Corporation
- Hong Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer inspection using difference images
- Patent number 11,270,430
- Issue date Mar 8, 2022
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection of reticles using machine learning
- Patent number 11,257,207
- Issue date Feb 22, 2022
- KLA-Tencor Corporation
- Hawren Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and methods for measuring phase and amplitude of light th...
- Patent number 11,131,629
- Issue date Sep 28, 2021
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Grant
Arbitrary wavefront compensator for deep ultraviolet (DUV) optical...
- Patent number 10,761,031
- Issue date Sep 1, 2020
- KLA-Tencor Corporation
- Qiang Zhang
- G01 - MEASURING TESTING
Information Patent Grant
Block-to-block reticle inspection
- Patent number 10,539,512
- Issue date Jan 21, 2020
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for inspecting reticles
- Patent number 10,395,361
- Issue date Aug 27, 2019
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for predicting wafer-level defect printability
- Patent number 10,304,180
- Issue date May 28, 2019
- KLA-Tencor Corporation
- Rui-fang Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Critical dimension uniformity monitoring for extreme ultra-violet r...
- Patent number 10,288,415
- Issue date May 14, 2019
- KLA-Tencor Corporation
- Rui-fang Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Techniques and systems for model-based critical dimension measurements
- Patent number 9,875,534
- Issue date Jan 23, 2018
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Critical dimension uniformity monitoring for extreme ultraviolet re...
- Patent number 9,863,761
- Issue date Jan 9, 2018
- KLA-Tencor Corporation
- Rui-fang Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Machine learning method and apparatus for inspecting reticles
- Patent number 9,805,462
- Issue date Oct 31, 2017
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Block-to-block reticle inspection
- Patent number 9,766,185
- Issue date Sep 19, 2017
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Machine learning method and apparatus for inspecting reticles
- Patent number 9,652,843
- Issue date May 16, 2017
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for predicting wafer-level defect printability
- Patent number 9,547,892
- Issue date Jan 17, 2017
- KLA-Tencor Corporation
- Rui-fang Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scatterometry-based imaging and critical dimension metrology
- Patent number 9,494,535
- Issue date Nov 15, 2016
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle inspection using near-field recovery
- Patent number 9,478,019
- Issue date Oct 25, 2016
- KLA-Tencor Corp.
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Machine learning method and apparatus for inspecting reticles
- Patent number 9,430,824
- Issue date Aug 30, 2016
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Grant
Wave front aberration metrology of optics of EUV mask inspection sy...
- Patent number 9,335,206
- Issue date May 10, 2016
- KLA-Tencor Corporation
- Qiang Zhang
- G01 - MEASURING TESTING
Information Patent Grant
Model-based registration and critical dimension metrology
- Patent number 9,311,700
- Issue date Apr 12, 2016
- KLA-Tencor Corporation
- Mohammad Mehdi Daneshpanah
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for modifying a data set of a photomask
- Patent number 9,292,627
- Issue date Mar 22, 2016
- Cadence Design Systems, Inc.
- Dipankar Pramanik
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method, system, and program product for routing an integrated circu...
- Patent number 8,782,586
- Issue date Jul 15, 2014
- Cadence Design Systems, Inc.
- Abdurrahman Sezginer
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method of eliminating a lithography operation
- Patent number 8,716,135
- Issue date May 6, 2014
- Cadence Design Systems, Inc.
- Judy Huckabay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for self-aligned doubled patterning lithography
- Patent number 8,679,981
- Issue date Mar 25, 2014
- Cadence Design Systems, Inc.
- Milind Weling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of eliminating a lithography operation
- Patent number 8,656,321
- Issue date Feb 18, 2014
- Cadence Design Systems, Inc.
- Judy Huckabay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for modifying a data set of a photomask
- Patent number 8,572,517
- Issue date Oct 29, 2013
- Cadence Design Systems, Inc.
- Dipankar Pramanik
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method, system, and program product for routing an integrated circu...
- Patent number 8,549,458
- Issue date Oct 1, 2013
- Cadence Design Systems, Inc.
- Abdurrahman Sezginer
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method of eliminating a lithography operation
- Patent number 8,440,569
- Issue date May 14, 2013
- Cadence Design Systems, Inc.
- Milind Weling
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SHOT NOISE REDUCTION USING FRAME AVERAGING
- Publication number 20230351553
- Publication date Nov 2, 2023
- KLA Corporation
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION WITH PREVIOUS STEP SUBTRACTION
- Publication number 20230316478
- Publication date Oct 5, 2023
- KLA Corporation
- Robert M. Danen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTI-MODE OPTICAL INSPECTION
- Publication number 20230314336
- Publication date Oct 5, 2023
- KLA Corporation
- Kuljit S. Virk
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR OPTICAL WAFER CHARACTERIZATION WITH IMAGE UP...
- Publication number 20220383470
- Publication date Dec 1, 2022
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION OF RETICLES USING MACHINE LEARNING
- Publication number 20220084179
- Publication date Mar 17, 2022
- KLA-Tencor Corporation
- Hawren Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Setting Up Inspection of a Specimen
- Publication number 20220067898
- Publication date Mar 3, 2022
- KLA Corporation
- Hong Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Finding Semiconductor Defects Using Convolutional Context Attributes
- Publication number 20210158223
- Publication date May 27, 2021
- KLA Corporation
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION OF RETICLES USING MACHINE LEARNING
- Publication number 20190206041
- Publication date Jul 4, 2019
- KLA-Tencor Corporation
- Hawren Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
WAFER INSPECTION USING DIFFERENCE IMAGES
- Publication number 20180342051
- Publication date Nov 29, 2018
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS AND METHODS FOR MEASURING PHASE AND AMPLITUDE OF LIGHT TH...
- Publication number 20180340886
- Publication date Nov 29, 2018
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
CRITICAL DIMENSION UNIFORMITY MONITORING FOR EXTREME ULTRA-VIOLET R...
- Publication number 20180080759
- Publication date Mar 22, 2018
- KLA-Tencor Corporation
- Rui-fang Shi
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR INSPECTING RETICLES
- Publication number 20180082415
- Publication date Mar 22, 2018
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
Block-to-Block Reticle Inspection
- Publication number 20180003647
- Publication date Jan 4, 2018
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR PREDICTING WAFER-LEVEL DEFECT PRINTABILITY
- Publication number 20170309008
- Publication date Oct 26, 2017
- KLA-Tencor Corporation
- Rui-fang Shi
- G01 - MEASURING TESTING
Information Patent Application
MACHINE LEARNING METHOD AND APPARATUS FOR INSPECTING RETICLES
- Publication number 20170221190
- Publication date Aug 3, 2017
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
TECHNIQUES AND SYSTEMS FOR MODEL-BASED CRITICAL DIMENSION MEASUREMENTS
- Publication number 20170069080
- Publication date Mar 9, 2017
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MACHINE LEARNING METHOD AND APPARATUS FOR INSPECTING RETICLES
- Publication number 20160335753
- Publication date Nov 17, 2016
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR PREDICTING WAFER-LEVEL DEFECT PRINTABILITY
- Publication number 20160012579
- Publication date Jan 14, 2016
- KLA-Tencor Corporation
- Rui-fang Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Reticle Inspection Using Near-Field Recovery
- Publication number 20150324963
- Publication date Nov 12, 2015
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
Scatterometry-Based Imaging and Critical Dimension Metrology
- Publication number 20150300965
- Publication date Oct 22, 2015
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
CRITICAL DIMENSION UNIFORMITY MONITORING FOR EXTREME ULTRAVIOLET RE...
- Publication number 20150144798
- Publication date May 28, 2015
- KLA-Tencor Corporation
- Rui-fang Shi
- G01 - MEASURING TESTING
Information Patent Application
Block-to-Block Reticle Inspection
- Publication number 20150078650
- Publication date Mar 19, 2015
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
MACHINE LEARNING METHOD AND APPARATUS FOR INSPECTING RETICLES
- Publication number 20140341462
- Publication date Nov 20, 2014
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
Model-Based Registration and Critical Dimension Metrology
- Publication number 20140086475
- Publication date Mar 27, 2014
- KLA-Tencor Corporation
- Mohammad Mehdi Daneshpanah
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR MODIFYING A DATA SET OF A PHOTOMASK
- Publication number 20140068527
- Publication date Mar 6, 2014
- Cadence Design Systems, Inc.
- Dipankar PRAMANIK
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
WAVE FRONT ABERRATION METROLOGY OF OPTICS OF EUV MASK INSPECTION SY...
- Publication number 20140063490
- Publication date Mar 6, 2014
- Qiang Zhang
- G02 - OPTICS
Information Patent Application
Capacitive Inspection Of EUV Photomasks
- Publication number 20130088245
- Publication date Apr 11, 2013
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- B82 - NANO-TECHNOLOGY
Information Patent Application
SYSTEM AND METHOD FOR MODEL BASED MULTI-PATTERNING OPTIMIZATION
- Publication number 20120102442
- Publication date Apr 26, 2012
- Justin Ghan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD, SYSTEM, AND PROGRAM PRODUCT FOR ROUTING AN INTEGRATED CIRCU...
- Publication number 20110113393
- Publication date May 12, 2011
- Cadence Design Systems, Inc.
- Abdurrahman SEZGINER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD, SYSTEM, AND PROGRAM PRODUCT FOR ROUTING AN INTEGRATED CIRCU...
- Publication number 20110014786
- Publication date Jan 20, 2011
- Cadence Design Systems, Inc.
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING

Abdurrahman Sezginer

Person

Patents Grantslast 30 patents

Inspection of reticles using machine learning

Setting up inspection of a specimen

Defect inspection and review using transmissive current image of ch...

Wafer inspection using difference images

Inspection of reticles using machine learning

Apparatus and methods for measuring phase and amplitude of light th...

Arbitrary wavefront compensator for deep ultraviolet (DUV) optical...

Block-to-block reticle inspection

Apparatus and methods for inspecting reticles

Apparatus and methods for predicting wafer-level defect printability

Critical dimension uniformity monitoring for extreme ultra-violet r...

Techniques and systems for model-based critical dimension measurements

Critical dimension uniformity monitoring for extreme ultraviolet re...

Machine learning method and apparatus for inspecting reticles

Block-to-block reticle inspection

Machine learning method and apparatus for inspecting reticles

Apparatus and methods for predicting wafer-level defect printability

Scatterometry-based imaging and critical dimension metrology

Reticle inspection using near-field recovery

Machine learning method and apparatus for inspecting reticles

Wave front aberration metrology of optics of EUV mask inspection sy...

Model-based registration and critical dimension metrology

System and method for modifying a data set of a photomask

Method, system, and program product for routing an integrated circu...

Method of eliminating a lithography operation

Method for self-aligned doubled patterning lithography

Method of eliminating a lithography operation

System and method for modifying a data set of a photomask

Method, system, and program product for routing an integrated circu...

Method of eliminating a lithography operation

Patents Applicationslast 30 patents

SHOT NOISE REDUCTION USING FRAME AVERAGING

INSPECTION WITH PREVIOUS STEP SUBTRACTION

MULTI-MODE OPTICAL INSPECTION

SYSTEM AND METHOD FOR OPTICAL WAFER CHARACTERIZATION WITH IMAGE UP...

INSPECTION OF RETICLES USING MACHINE LEARNING

Setting Up Inspection of a Specimen

Finding Semiconductor Defects Using Convolutional Context Attributes

INSPECTION OF RETICLES USING MACHINE LEARNING

WAFER INSPECTION USING DIFFERENCE IMAGES

APPARATUS AND METHODS FOR MEASURING PHASE AND AMPLITUDE OF LIGHT TH...

CRITICAL DIMENSION UNIFORMITY MONITORING FOR EXTREME ULTRA-VIOLET R...

APPARATUS AND METHODS FOR INSPECTING RETICLES

Block-to-Block Reticle Inspection

APPARATUS AND METHODS FOR PREDICTING WAFER-LEVEL DEFECT PRINTABILITY

MACHINE LEARNING METHOD AND APPARATUS FOR INSPECTING RETICLES

TECHNIQUES AND SYSTEMS FOR MODEL-BASED CRITICAL DIMENSION MEASUREMENTS

MACHINE LEARNING METHOD AND APPARATUS FOR INSPECTING RETICLES

APPARATUS AND METHODS FOR PREDICTING WAFER-LEVEL DEFECT PRINTABILITY

Reticle Inspection Using Near-Field Recovery

Scatterometry-Based Imaging and Critical Dimension Metrology

CRITICAL DIMENSION UNIFORMITY MONITORING FOR EXTREME ULTRAVIOLET RE...

Block-to-Block Reticle Inspection

MACHINE LEARNING METHOD AND APPARATUS FOR INSPECTING RETICLES

Model-Based Registration and Critical Dimension Metrology

SYSTEM AND METHOD FOR MODIFYING A DATA SET OF A PHOTOMASK

WAVE FRONT ABERRATION METROLOGY OF OPTICS OF EUV MASK INSPECTION SY...

Capacitive Inspection Of EUV Photomasks

SYSTEM AND METHOD FOR MODEL BASED MULTI-PATTERNING OPTIMIZATION

METHOD, SYSTEM, AND PROGRAM PRODUCT FOR ROUTING AN INTEGRATED CIRCU...

METHOD, SYSTEM, AND PROGRAM PRODUCT FOR ROUTING AN INTEGRATED CIRCU...