Abhijit Basu Mallick

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Defect free germanium oxide gap fill
- Patent number 12,198,936
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Huiyuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High pressure oxidation of metal films
- Patent number 12,173,413
- Issue date Dec 24, 2024
- Applied Materials, Inc.
- Amrita B. Mullick
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature growth of transition metal chalcogenides
- Patent number 12,110,584
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Chandan Das
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flowable film curing using H2 plasma
- Patent number 12,054,827
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Shishi Jiang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conformal silicon-germanium film deposition
- Patent number 12,046,468
- Issue date Jul 23, 2024
- Applied Materials, Inc.
- Huiyuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a diamond film
- Patent number 12,037,679
- Issue date Jul 16, 2024
- Applied Materials, Inc.
- Vicknesh Sahmuganathan
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Processes for depositing sib films
- Patent number 12,033,848
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Aykut Aydin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processes to deposit amorphous-silicon etch protection liner
- Patent number 12,027,374
- Issue date Jul 2, 2024
- Applied Materials, Inc.
- Zeqing Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Super-conformal germanium oxide films
- Patent number 12,018,364
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Huiyuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal-doped carbon hardmasks
- Patent number 12,014,925
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dose reduction of patterned metal oxide photoresists
- Patent number 11,994,800
- Issue date May 28, 2024
- Applied Materials, Inc.
- Tejinder Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective patterning with molecular layer deposition
- Patent number 11,990,369
- Issue date May 21, 2024
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Silicide films through selective deposition
- Patent number 11,978,635
- Issue date May 7, 2024
- Applied Materials, Inc.
- Swaminathan Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Area selective carbon-based film deposition
- Patent number 11,972,940
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Xinke Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
3D NAND gate stack reinforcement
- Patent number 11,967,524
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Praket Prakash Jha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ nucleation for nanocrystalline diamond film deposition
- Patent number 11,946,134
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Sze Chieh Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tribological properties of diamond films
- Patent number 11,894,230
- Issue date Feb 6, 2024
- Applied Materials, Inc.
- Vicknesh Sahmuganathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for Si gap fill by PECVD
- Patent number 11,848,232
- Issue date Dec 19, 2023
- Applied Materials, Inc.
- Xin Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High density carbon films for patterning applications
- Patent number 11,842,897
- Issue date Dec 12, 2023
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-k boron carbonitride films
- Patent number 11,830,729
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- Zeqing Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal deposition of silicon-germanium
- Patent number 11,830,734
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- Huiyuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD based oxide-metal multi structure for 3D NAND memory devices
- Patent number 11,817,320
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Susmit Singha Roy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Diffusion barriers for germanium
- Patent number 11,791,155
- Issue date Oct 17, 2023
- Applied Materials, Inc.
- Huiyuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carbon hard masks for patterning applications and methods related t...
- Patent number 11,784,042
- Issue date Oct 10, 2023
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Defect free germanium oxide gap fill
- Patent number 11,781,218
- Issue date Oct 10, 2023
- Applied Materials, Inc.
- Huiyuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of silicon using deposition-treat-etch process
- Patent number 11,769,666
- Issue date Sep 26, 2023
- Applied Materials, Inc.
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molecular layer deposition contact landing protection for 3D NAND
- Patent number 11,756,785
- Issue date Sep 12, 2023
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen free silicon dioxide
- Patent number 11,732,352
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Zeqing Shen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Non-conformal high selectivity film for etch critical dimension con...
- Patent number 11,702,751
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Bo Qi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conformal high concentration boron doping of semiconductors
- Patent number 11,705,335
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS
- Publication number 20250054748
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Guangyan Zhong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIAMOND-LIKE CARBON GAP FILL
- Publication number 20250046599
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Jialiang WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTIVE-ION DEPOSITION PROCESSES FOR DIELECTRIC MATERIAL FORMATION
- Publication number 20250046602
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOPED DIAMOND-LIKE CARBON
- Publication number 20250046610
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Jialiang WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NEUTRAL STRESS DIAMOND-LIKE CARBON
- Publication number 20250046611
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Jialiang WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NESTED-LOOP PLASMA ENHANCED ATOMIC LAYER DEPOSITION
- Publication number 20240420952
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Bhaskar Soman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU ETCH AND INHIBITION IN PLASMA ENHANCED ATOMIC LAYER DEPOSITION
- Publication number 20240420934
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Bhaskar Soman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SILICON-AND-METAL-CONTAINING MATERIALS FOR HARDMASK AP...
- Publication number 20240387174
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Guangyan Zhong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SILICON-AND-METAL-CONTAINING MATERIALS FOR HARDMASK AP...
- Publication number 20240387190
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Guangyan Zhong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSES FOR DEPOSITING SIB FILMS
- Publication number 20240339316
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Aykut AYDIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPRESSIVE FILMS FOR LARGE AREA GAPFILL
- Publication number 20240332028
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Supriya Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSES TO DEPOSIT AMORPHOUS-SILICON ETCH PROTECTION LINER
- Publication number 20240321589
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Zeqing SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL AND SELECTIVE SIN DEPOSITION
- Publication number 20240290612
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Zeqing SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC DEVICE FABRICATION USING AREA-SELECTIVE DEPOSITION
- Publication number 20240282632
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Zachary J. Devereaux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE ETCHING OF SILICON-CONTAINING MATERIAL RELATIVE TO METAL-...
- Publication number 20240266185
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Han Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN SITU NUCLEATION FOR NANOCRYSTALLINE DIAMOND FILM DEPOSITION
- Publication number 20240229231
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Sze Chieh Tan
- B82 - NANO-TECHNOLOGY
Information Patent Application
INNER SPACER LINER FOR GATE-ALL-AROUND DEVICE
- Publication number 20240234531
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Sai Hooi Yeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AREA SELECTIVE CARBON-BASED FILM DEPOSITION
- Publication number 20240234127
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Xinke Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTILAYER INNER SPACER FOR GATE-ALL-AROUND DEVICE
- Publication number 20240194757
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Sai Hooi Yeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AREA SELECTIVE DEPOSITION THROUGH SURFACE SILYLATION
- Publication number 20240183035
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Xinke Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SIN GAP FILL VIA NUCLEATION INHIBITION
- Publication number 20240145235
- Publication date May 2, 2024
- Applied Materials, Inc.
- Zeqing SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIAL
- Publication number 20240120193
- Publication date Apr 11, 2024
- Applied Materials, Inc.
- Shankar Venkataraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOLECULAR LAYER DEPOSITION CARBON MASKS FOR DIRECT SELECTIVE DEPOSI...
- Publication number 20240105499
- Publication date Mar 28, 2024
- Applied Materials, Inc.
- Zeqing Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MIDDLE OF LINE DIELECTRIC LAYER ENGINEERING FOR VIA VOID PREVENTION
- Publication number 20240105505
- Publication date Mar 28, 2024
- Applied Materials, Inc.
- Nicolas Louis BREIL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MIDDLE OF LINE DIELECTRIC LAYER ENGINEERING FOR VIA VOID PREVENTION
- Publication number 20240105509
- Publication date Mar 28, 2024
- Applied Materials, Inc.
- Nicolas Louis BREIL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SACRIFICIAL LAYER FOR FORMING MERGED HIGH ASPECT RATIO CONTACTS IN...
- Publication number 20240090213
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Jialiang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINE-DOPED SILICON-CONTAINING MATERIALS
- Publication number 20240087882
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Siyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH DENSITY CARBON FILMS FOR PATTERNING APPLICATIONS
- Publication number 20240087894
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Eswaranand VENKATASUBRAMANIAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION FOR SUB 20 NM PITCH EUV PATTERNING
- Publication number 20240055255
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Zeqing Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO REDUCE LINE EDGE ROUGHNESS FOR EUV PHOTORESIST PATTERN
- Publication number 20240027912
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Xinke Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Abhijit Basu Mallick

Person

Patents Grantslast 30 patents

Defect free germanium oxide gap fill

High pressure oxidation of metal films

Low temperature growth of transition metal chalcogenides

Flowable film curing using H2 plasma

Conformal silicon-germanium film deposition

Method of forming a diamond film

Processes for depositing sib films

Processes to deposit amorphous-silicon etch protection liner

Super-conformal germanium oxide films

Metal-doped carbon hardmasks

Dose reduction of patterned metal oxide photoresists

Selective patterning with molecular layer deposition

Silicide films through selective deposition

Area selective carbon-based film deposition

3D NAND gate stack reinforcement

In situ nucleation for nanocrystalline diamond film deposition

Tribological properties of diamond films

Method for Si gap fill by PECVD

High density carbon films for patterning applications

Low-k boron carbonitride films

Thermal deposition of silicon-germanium

CVD based oxide-metal multi structure for 3D NAND memory devices

Diffusion barriers for germanium

Carbon hard masks for patterning applications and methods related t...

Defect free germanium oxide gap fill

Selective deposition of silicon using deposition-treat-etch process

Molecular layer deposition contact landing protection for 3D NAND

Hydrogen free silicon dioxide

Non-conformal high selectivity film for etch critical dimension con...

Conformal high concentration boron doping of semiconductors

Patents Applicationslast 30 patents

ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS

DIAMOND-LIKE CARBON GAP FILL

REACTIVE-ION DEPOSITION PROCESSES FOR DIELECTRIC MATERIAL FORMATION

DOPED DIAMOND-LIKE CARBON

NEUTRAL STRESS DIAMOND-LIKE CARBON

NESTED-LOOP PLASMA ENHANCED ATOMIC LAYER DEPOSITION

IN-SITU ETCH AND INHIBITION IN PLASMA ENHANCED ATOMIC LAYER DEPOSITION

FORMATION OF SILICON-AND-METAL-CONTAINING MATERIALS FOR HARDMASK AP...

FORMATION OF SILICON-AND-METAL-CONTAINING MATERIALS FOR HARDMASK AP...

PROCESSES FOR DEPOSITING SIB FILMS

COMPRESSIVE FILMS FOR LARGE AREA GAPFILL

PROCESSES TO DEPOSIT AMORPHOUS-SILICON ETCH PROTECTION LINER

CONFORMAL AND SELECTIVE SIN DEPOSITION

ELECTRONIC DEVICE FABRICATION USING AREA-SELECTIVE DEPOSITION

SELECTIVE ETCHING OF SILICON-CONTAINING MATERIAL RELATIVE TO METAL-...

IN SITU NUCLEATION FOR NANOCRYSTALLINE DIAMOND FILM DEPOSITION

INNER SPACER LINER FOR GATE-ALL-AROUND DEVICE

AREA SELECTIVE CARBON-BASED FILM DEPOSITION

MULTILAYER INNER SPACER FOR GATE-ALL-AROUND DEVICE

AREA SELECTIVE DEPOSITION THROUGH SURFACE SILYLATION

SIN GAP FILL VIA NUCLEATION INHIBITION

CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIAL

MOLECULAR LAYER DEPOSITION CARBON MASKS FOR DIRECT SELECTIVE DEPOSI...

MIDDLE OF LINE DIELECTRIC LAYER ENGINEERING FOR VIA VOID PREVENTION

MIDDLE OF LINE DIELECTRIC LAYER ENGINEERING FOR VIA VOID PREVENTION

SACRIFICIAL LAYER FOR FORMING MERGED HIGH ASPECT RATIO CONTACTS IN...

FLUORINE-DOPED SILICON-CONTAINING MATERIALS

HIGH DENSITY CARBON FILMS FOR PATTERNING APPLICATIONS

SELECTIVE DEPOSITION FOR SUB 20 NM PITCH EUV PATTERNING

METHOD TO REDUCE LINE EDGE ROUGHNESS FOR EUV PHOTORESIST PATTERN