Abhishek Shendre

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,886,166
- Issue date Jan 30, 2024
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,756,765
- Issue date Sep 12, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,604,451
- Issue date Mar 14, 2023
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods and systems to classify features in electronic designs
- Patent number 11,263,496
- Issue date Mar 1, 2022
- D2S, Inc.
- Mariusz Niewczas
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
CORRECTING RULE VIOLATIONS IN A LAYOUT
- Publication number 20250190673
- Publication date Jun 12, 2025
- D2S, INC.
- Mariusz A. Niewczas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CORRECTING RULE VIOLATIONS IN A LAYOUT
- Publication number 20250190674
- Publication date Jun 12, 2025
- D2S, INC.
- Mariusz A. Niewczas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PIXEL-BASED RULE CHECK FOR LAYOUTS
- Publication number 20250189948
- Publication date Jun 12, 2025
- Mariusz A. Niewczas
- G05 - CONTROLLING REGULATING
Information Patent Application
CORRECTING RULE VIOLATIONS IN A LAYOUT
- Publication number 20250189885
- Publication date Jun 12, 2025
- D2S, INC.
- Mariusz A. Niewczas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PIXEL-BASED RULE CHECK FOR LAYOUTS
- Publication number 20250190675
- Publication date Jun 12, 2025
- D2S, INC.
- Mariusz A. Niewczas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230386784
- Publication date Nov 30, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20230205177
- Publication date Jun 29, 2023
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230124768
- Publication date Apr 20, 2023
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20210313143
- Publication date Oct 7, 2021
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20210208569
- Publication date Jul 8, 2021
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHODS AND SYSTEMS TO CLASSIFY FEATURES IN ELECTRONIC DESIGNS
- Publication number 20200272865
- Publication date Aug 27, 2020
- D2S, INC.
- Mariusz Niewczas
- G06 - COMPUTING CALCULATING COUNTING

Abhishek Shendre

Person

Patents Grantslast 30 patents

Method and system for determining a charged particle beam exposure...

Method and system of reducing charged particle beam write time

Method and system for determining a charged particle beam exposure...

Method and system of reducing charged particle beam write time

Methods and systems to classify features in electronic designs

Patents Applicationslast 30 patents

CORRECTING RULE VIOLATIONS IN A LAYOUT

CORRECTING RULE VIOLATIONS IN A LAYOUT

PIXEL-BASED RULE CHECK FOR LAYOUTS

CORRECTING RULE VIOLATIONS IN A LAYOUT

PIXEL-BASED RULE CHECK FOR LAYOUTS

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHODS AND SYSTEMS TO CLASSIFY FEATURES IN ELECTRONIC DESIGNS