Abraham Arceo de la Pena

Person

Albany, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective shrink for contact trench
- Patent number 11,935,931
- Issue date Mar 19, 2024
- International Business Machines Corporation
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organic photoresist adhesion to metal oxide hardmasks
- Patent number 11,543,751
- Issue date Jan 3, 2023
- International Business Machines Corporation
- Abraham Arceo de la Pena
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating different width lines and spaces in a metal layer
- Patent number 11,373,880
- Issue date Jun 28, 2022
- International Business Machines Corporation
- Christopher J Penny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask films with graded vertical concentration formed using rea...
- Patent number 10,975,464
- Issue date Apr 13, 2021
- International Business Machines Corporation
- Ekmini Anuja De Silva
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Patterning directly on an amorphous silicon hardmask
- Patent number 10,950,440
- Issue date Mar 16, 2021
- International Business Machines Corporation
- Abraham Arceo de la Pena
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning directly on an amorphous silicon hardmask
- Patent number 10,755,926
- Issue date Aug 25, 2020
- International Business Machines Corporation
- Abraham Arceo de la Pena
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry and wet etch resistance for atomic layer deposited TiO2 for SIT...
- Patent number 10,366,879
- Issue date Jul 30, 2019
- International Business Machines Corporation
- Cornelius Brown Peethala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable TiOxNy hardmask for multilayer patterning
- Patent number 10,249,512
- Issue date Apr 2, 2019
- International Business Machines Corporation
- Abraham Arceo De La Pena
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable TiOxNy hardmask for multilayer patterning
- Patent number 9,941,142
- Issue date Apr 10, 2018
- International Business Machines Corporation
- Abraham Arceo De La Pena
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Application of titanium-oxide as a patterning hardmask
- Patent number 9,799,534
- Issue date Oct 24, 2017
- International Business Machines Corporation
- Abraham Arceo de la Pena
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CREATING DIFFERENT WIDTH LINES AND SPACES IN A METAL LAYER
- Publication number 20220093414
- Publication date Mar 24, 2022
- International Business Machines Corporation
- Christopher J Penny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Shrink for Contact Trench
- Publication number 20210384306
- Publication date Dec 9, 2021
- International Business Machines Corporation
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC PHOTORESIST ADHESION TO METAL OXIDE HARDMASKS
- Publication number 20210325784
- Publication date Oct 21, 2021
- International Business Machines Corporation
- Abraham Arceo de la Pena
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING DIRECTLY ON AN AMORPHOUS SILICON HARDMASK
- Publication number 20200090928
- Publication date Mar 19, 2020
- International Business Machines Corporation
- Abraham Arceo de la Pena
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD MASK FILMS WITH GRADED VERTICAL CONCENTRATION FORMED USING REA...
- Publication number 20190309410
- Publication date Oct 10, 2019
- International Business Machines Corporation
- Ekmini Anuja De Silva
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PATTERNING DIRECTLY ON AN AMORPHOUS SILICON HARDMASK
- Publication number 20190157072
- Publication date May 23, 2019
- International Business Machines Corporation
- Abraham Arceo de la Pena
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY AND WET ETCH RESISTANCE FOR ATOMIC LAYER DEPOSITED TIO2 FOR SIT...
- Publication number 20190148140
- Publication date May 16, 2019
- International Business Machines Corporation
- Cornelius Brown Peethala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE TiOxNy HARDMASK FOR MULTILAYER PATTERNING
- Publication number 20180197752
- Publication date Jul 12, 2018
- International Business Machines Corporation
- ABRAHAM ARCEO DE LA PENA
- H01 - BASIC ELECTRIC ELEMENTS

Abraham Arceo de la Pena

Person

Patents Grantslast 30 patents

Selective shrink for contact trench

Organic photoresist adhesion to metal oxide hardmasks

Creating different width lines and spaces in a metal layer

Hard mask films with graded vertical concentration formed using rea...

Patterning directly on an amorphous silicon hardmask

Patterning directly on an amorphous silicon hardmask

Dry and wet etch resistance for atomic layer deposited TiO2 for SIT...

Tunable TiOxNy hardmask for multilayer patterning

Tunable TiOxNy hardmask for multilayer patterning

Application of titanium-oxide as a patterning hardmask

Patents Applicationslast 30 patents

CREATING DIFFERENT WIDTH LINES AND SPACES IN A METAL LAYER

Selective Shrink for Contact Trench

ORGANIC PHOTORESIST ADHESION TO METAL OXIDE HARDMASKS

PATTERNING DIRECTLY ON AN AMORPHOUS SILICON HARDMASK

HARD MASK FILMS WITH GRADED VERTICAL CONCENTRATION FORMED USING REA...

PATTERNING DIRECTLY ON AN AMORPHOUS SILICON HARDMASK

DRY AND WET ETCH RESISTANCE FOR ATOMIC LAYER DEPOSITED TIO2 FOR SIT...

TUNABLE TiOxNy HARDMASK FOR MULTILAYER PATTERNING