Adam FISCHBACH

Person

Campbell, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor processing chamber to accommodate parasitic plasma fo...
- Patent number 12,205,845
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Khokan Chandra Paul
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single chamber flowable film formation and treatments
- Patent number 12,142,459
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Khokan Chandra Paul
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing chambers for deposition and etch
- Patent number 11,699,571
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Khokan Chandra Paul
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic housing systems
- Patent number 11,587,764
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing chamber
- Patent number 11,560,626
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Timothy Joseph Franklin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tuneable uniformity control utilizing rotational magnetic housing
- Patent number 11,557,466
- Issue date Jan 17, 2023
- Applied Materials, Inc.
- Samuel E. Gottheim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radio frequency conduit
- Patent number D946534
- Issue date Mar 22, 2022
- Applied Materials, Inc.
- Adam Fischbach
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Modulating film properties by optimizing plasma coupling materials
- Patent number 11,270,905
- Issue date Mar 8, 2022
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF electrostatic chuck filter circuit
- Patent number 11,189,517
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH EFFICIENCY MICROWAVE PLASMA APPLICATOR
- Publication number 20240379329
- Publication date Nov 14, 2024
- Applied Materials, Inc,
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA APPLICATOR WITH REPLACEABLE DIELECTRIC PLATE
- Publication number 20240379331
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH INTEGRATED OPTICAL SENSORS
- Publication number 20240153795
- Publication date May 9, 2024
- Applied Materials, Inc.
- Adam Fischbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR DEPOSITION AND ETCH
- Publication number 20230343552
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Khokan Chandra Paul
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETIC HOUSING SYSTEMS
- Publication number 20230154726
- Publication date May 18, 2023
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNEABLE UNIFORMITY CONTROL UTILIZING ROTATIONAL MAGNETIC HOUSING
- Publication number 20230139431
- Publication date May 4, 2023
- Applied Materials, Inc.
- Samuel E. GOTTHEIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER TO ACCOMMODATE PARASITIC PLASMA FO...
- Publication number 20220130713
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Khokan Chandra Paul
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE CHAMBER FLOWABLE FILM FORMATION AND TREATMENTS
- Publication number 20220076922
- Publication date Mar 10, 2022
- Applied Materials, Inc.
- Khokan Chandra Paul
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBERS FOR DEPOSITION AND ETCH
- Publication number 20220076920
- Publication date Mar 10, 2022
- Applied Materials, Inc.
- Khokan Chandra Paul
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULATING FILM PROPERTIES BY OPTIMIZING PLASMA COUPLING MATERIALS
- Publication number 20210005500
- Publication date Jan 7, 2021
- Applied Materials, Inc.
- Eswaranand VENKATASUBRAMANIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING CHAMBER
- Publication number 20200370177
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Timothy Joseph FRANKLIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF ELECTROSTATIC CHUCK FILTER CIRCUIT
- Publication number 20200343123
- Publication date Oct 29, 2020
- Applied Materials, Inc.
- Zheng John YE
- H01 - BASIC ELECTRIC ELEMENTS

Adam FISCHBACH

Person

Patents Grantslast 30 patents

Semiconductor processing chamber to accommodate parasitic plasma fo...

Single chamber flowable film formation and treatments

Semiconductor processing chambers for deposition and etch

Magnetic housing systems

Substrate processing chamber

Tuneable uniformity control utilizing rotational magnetic housing

Radio frequency conduit

Modulating film properties by optimizing plasma coupling materials

RF electrostatic chuck filter circuit

Patents Applicationslast 30 patents

HIGH EFFICIENCY MICROWAVE PLASMA APPLICATOR

MICROWAVE PLASMA APPLICATOR WITH REPLACEABLE DIELECTRIC PLATE

MODULAR MICROWAVE SOURCE WITH INTEGRATED OPTICAL SENSORS

SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR DEPOSITION AND ETCH

MAGNETIC HOUSING SYSTEMS

TUNEABLE UNIFORMITY CONTROL UTILIZING ROTATIONAL MAGNETIC HOUSING

SEMICONDUCTOR PROCESSING CHAMBER TO ACCOMMODATE PARASITIC PLASMA FO...

SINGLE CHAMBER FLOWABLE FILM FORMATION AND TREATMENTS

SEMICONDUCTOR PROCESSING CHAMBERS FOR DEPOSITION AND ETCH

MODULATING FILM PROPERTIES BY OPTIMIZING PLASMA COUPLING MATERIALS

SUBSTRATE PROCESSING CHAMBER

RF ELECTROSTATIC CHUCK FILTER CIRCUIT