Adam Loyack

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Philadelphia, PA, US

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Patents Grantslast 30 patents

Information Patent Grant
Creep-resistant polishing pad window
- Patent number 8,697,217
- Issue date Apr 15, 2014
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- Adam Loyack
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad with light stable polymeric endpo...
- Patent number 8,257,545
- Issue date Sep 4, 2012
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Adam Loyack
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Chemical Mechanical Polishing Pad With Light Stable Polymeric Endpo...
- Publication number 20120077418
- Publication date Mar 29, 2012
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Adam Loyack
- B24 - GRINDING POLISHING
Information Patent Application
Creep-resistant polishing pad window
- Publication number 20110177758
- Publication date Jul 21, 2011
- Adam Loyack
- B24 - GRINDING POLISHING