Adam M. Pyzyna

Person

Cortlandt Manor, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Silicide passivation of niobium
- Patent number 11,737,373
- Issue date Aug 22, 2023
- International Business Machines Corporation
- Matthew W. Copel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reproducible and manufacturable nanogaps for embedded transverse el...
- Patent number 11,221,310
- Issue date Jan 11, 2022
- International Business Machines Corporation
- Adam M. Pyzyna
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Directed self-assembly for copper patterning
- Patent number 10,600,656
- Issue date Mar 24, 2020
- International Business Machines Corporation
- Eric A. Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS compatible non-filamentary resistive memory stack
- Patent number 10,505,112
- Issue date Dec 10, 2019
- International Business Machines Corporation
- Takashi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stacked capacitor with symmetric leakage and break-down behaviors
- Patent number 10,332,957
- Issue date Jun 25, 2019
- International Business Machines Corporation
- Takashi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reproducible and manufacturable nanogaps for embedded transverse el...
- Patent number 10,168,299
- Issue date Jan 1, 2019
- International Business Machines Corporation
- Adam M. Pyzyna
- G01 - MEASURING TESTING
Information Patent Grant
Trench silicide with self-aligned contact vias
- Patent number 10,068,850
- Issue date Sep 4, 2018
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic device including moat power metallization in trench
- Patent number 10,014,214
- Issue date Jul 3, 2018
- GLOBALFOUNDRIES Inc.
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench silicide with self-aligned contact vias
- Patent number 9,721,888
- Issue date Aug 1, 2017
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic device including moat power metallization in trench
- Patent number 9,716,036
- Issue date Jul 25, 2017
- GLOBALFOUNDRIES Inc.
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetoresistive structures with stressed layer
- Patent number 9,653,679
- Issue date May 16, 2017
- International Business Machines Corporation
- Anthony J. Annunziata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetoresistive structures with stressed layer
- Patent number 9,601,686
- Issue date Mar 21, 2017
- International Business Machines Corporation
- Anthony J. Annunziata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-temperature sidewall image transfer process using ALD metals, m...
- Patent number 9,437,443
- Issue date Sep 6, 2016
- GLOBALFOUNDRIES Inc.
- Markus Brink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode pair fabrication using directed self assembly of diblock...
- Patent number 9,349,640
- Issue date May 24, 2016
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode pair fabrication using directed self assembly of diblock...
- Patent number 9,306,164
- Issue date Apr 5, 2016
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Borderless self-aligned metal contact patterning using printable di...
- Patent number 9,018,090
- Issue date Apr 28, 2015
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Silicide passivation of niobium
- Publication number 20220102614
- Publication date Mar 31, 2022
- International Business Machines Corporation
- Matthew W. Copel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CMOS Compatible Non-Filamentary Resistive Memory Stack
- Publication number 20190393413
- Publication date Dec 26, 2019
- International Business Machines Corporation
- Takashi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTED SELF-ASSEMBLY FOR COPPER PATTERNING
- Publication number 20190157106
- Publication date May 23, 2019
- International Business Machines Corporation
- Eric A. Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPRODUCIBLE AND MANUFACTURABLE NANOGAPS FOR EMBEDDED TRANSVERSE EL...
- Publication number 20190072518
- Publication date Mar 7, 2019
- International Business Machines Corporation
- Adam M. Pyzyna
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
REPRODUCIBLE AND MANUFACTURABLE NANOGAPS FOR EMBEDDED TRANSVERSE EL...
- Publication number 20180017524
- Publication date Jan 18, 2018
- International Business Machines Corporation
- Adam M. Pyzyna
- G01 - MEASURING TESTING
Information Patent Application
STACKED CAPACITOR WITH SYMMETRIC LEAKAGE AND BREAK-DOWN BEHAVIORS
- Publication number 20180006108
- Publication date Jan 4, 2018
- International Business Machines Corporation
- Takashi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH SILICIDE WITH SELF-ALIGNED CONTACT VIAS
- Publication number 20170330830
- Publication date Nov 16, 2017
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC DEVICE INCLUDING MOAT POWER METALLIZATION IN TRENCH
- Publication number 20170250111
- Publication date Aug 31, 2017
- GLOBALFOUNDRIES INC.
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH SILICIDE WITH SELF-ALIGNED CONTACT VIAS
- Publication number 20170162496
- Publication date Jun 8, 2017
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC DEVICE INCLUDING MOAT POWER METALLIZATION IN TRENCH
- Publication number 20160358852
- Publication date Dec 8, 2016
- GLOBALFOUNDRIES INC.
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low-Temperature Sidewall Image Transfer Process Using ALD Metals, M...
- Publication number 20140367833
- Publication date Dec 18, 2014
- Markus Brink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISPOSABLE CARBON-BASED TEMPLATE LAYER FOR FORMATION OF BORDERLESS...
- Publication number 20140051239
- Publication date Feb 20, 2014
- International Business Machines Corporation
- Gregory Breyta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISPOSABLE CARBON-BASED TEMPLATE LAYER FOR FORMATION OF BORDERLESS...
- Publication number 20140048884
- Publication date Feb 20, 2014
- International Business Machines Corporation
- Gregory Breyta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BORDERLESS SELF-ALIGNED METAL CONTACT PATTERNING USING PRINTABLE DI...
- Publication number 20130087860
- Publication date Apr 11, 2013
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS

Adam M. Pyzyna

Person

Patents Grantslast 30 patents

Silicide passivation of niobium

Reproducible and manufacturable nanogaps for embedded transverse el...

Directed self-assembly for copper patterning

CMOS compatible non-filamentary resistive memory stack

Stacked capacitor with symmetric leakage and break-down behaviors

Reproducible and manufacturable nanogaps for embedded transverse el...

Trench silicide with self-aligned contact vias

Electronic device including moat power metallization in trench

Trench silicide with self-aligned contact vias

Electronic device including moat power metallization in trench

Magnetoresistive structures with stressed layer

Magnetoresistive structures with stressed layer

Low-temperature sidewall image transfer process using ALD metals, m...

Electrode pair fabrication using directed self assembly of diblock...

Electrode pair fabrication using directed self assembly of diblock...

Borderless self-aligned metal contact patterning using printable di...

Patents Applicationslast 30 patents

Silicide passivation of niobium

CMOS Compatible Non-Filamentary Resistive Memory Stack

DIRECTED SELF-ASSEMBLY FOR COPPER PATTERNING

REPRODUCIBLE AND MANUFACTURABLE NANOGAPS FOR EMBEDDED TRANSVERSE EL...

REPRODUCIBLE AND MANUFACTURABLE NANOGAPS FOR EMBEDDED TRANSVERSE EL...

STACKED CAPACITOR WITH SYMMETRIC LEAKAGE AND BREAK-DOWN BEHAVIORS

TRENCH SILICIDE WITH SELF-ALIGNED CONTACT VIAS

ELECTRONIC DEVICE INCLUDING MOAT POWER METALLIZATION IN TRENCH

TRENCH SILICIDE WITH SELF-ALIGNED CONTACT VIAS

ELECTRONIC DEVICE INCLUDING MOAT POWER METALLIZATION IN TRENCH

Low-Temperature Sidewall Image Transfer Process Using ALD Metals, M...

DISPOSABLE CARBON-BASED TEMPLATE LAYER FOR FORMATION OF BORDERLESS...

DISPOSABLE CARBON-BASED TEMPLATE LAYER FOR FORMATION OF BORDERLESS...

BORDERLESS SELF-ALIGNED METAL CONTACT PATTERNING USING PRINTABLE DI...