Adarsh BASAVALINGAPPA

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Albany, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Method for selectively etching with reduced aspect ratio dependence
- Patent number 10,541,141
- Issue date Jan 21, 2020
- Lam Research Corporation
- Adarsh Basavalingappa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectively etching with reduced aspect ratio dependence
- Patent number 10,037,890
- Issue date Jul 31, 2018
- Lam Research Corporation
- Adarsh Basavalingappa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectively etching silicon oxide with respect to an org...
- Patent number 10,002,773
- Issue date Jun 19, 2018
- Lam Research Corporation
- Bhaskar Nagabhirava
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR SELECTIVELY ETCHING WITH REDUCED ASPECT RATIO DEPENDENCE
- Publication number 20180330959
- Publication date Nov 15, 2018
- LAM RESEARCH CORPORATION
- Adarsh BASAVALINGAPPA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVELY ETCHING SILICON OXIDE WITH RESPECT TO AN ORG...
- Publication number 20180102257
- Publication date Apr 12, 2018
- LAM RESEARCH CORPORATION
- Bhaskar NAGABHIRAVA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVELY ETCHING WITH REDUCED ASPECT RATIO DEPENDENCE
- Publication number 20180102253
- Publication date Apr 12, 2018
- LAM RESEARCH CORPORATION
- Adarsh BASAVALINGAPPA
- H01 - BASIC ELECTRIC ELEMENTS