Aina USHIYAMA

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Production method for hemiaminal compound and production method for...
- Patent number 12,264,136
- Issue date Apr 1, 2025
- FUJIFILM Corporation
- Aina Ushiyama
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230236502
- Publication date Jul 27, 2023
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20230148344
- Publication date May 11, 2023
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230133710
- Publication date May 4, 2023
- FUJIFILM CORPORATION
- Aina USHIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230139891
- Publication date May 4, 2023
- FUJIFILM CORPORATION
- Masafumi Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20230043143
- Publication date Feb 9, 2023
- FUJIFILM CORPORATION
- Aina USHIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20220334476
- Publication date Oct 20, 2022
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RE...
- Publication number 20220179307
- Publication date Jun 9, 2022
- FUJIFILM CORPORATION
- Akira TAKADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20220082938
- Publication date Mar 17, 2022
- FUJIFILM CORPORATION
- Aina USHIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20220043347
- Publication date Feb 10, 2022
- FUJIFILM CORPORATION
- Akira TAKADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRODUCTION METHOD FOR HEMIAMINAL COMPOUND AND PRODUCTION METHOD FOR...
- Publication number 20220002257
- Publication date Jan 6, 2022
- FUJIFILM CORPORATION
- Aina USHIYAMA
- C07 - ORGANIC CHEMISTRY

Aina USHIYAMA

Person

Patents Grantslast 30 patents

Production method for hemiaminal compound and production method for...

Patents Applicationslast 30 patents

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RE...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PRODUCTION METHOD FOR HEMIAMINAL COMPOUND AND PRODUCTION METHOD FOR...