Aiqin JIANG

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Guilderland, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Correction using stack difference
- Patent number 10,635,004
- Issue date Apr 28, 2020
- ASML Netherlands B.V.
- Aiqin Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lens heating aware source mask optimization for advanced lithography
- Patent number 9,940,427
- Issue date Apr 10, 2018
- ASML Netherlands B.V.
- Michael Matthew M. Crouse
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROCESS WINDOW BASED ON FAILURE RATE
- Publication number 20230221652
- Publication date Jul 13, 2023
- ASML NETHERLANS B.V.
- Aiqin JIANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CALIBRATING SIMULATION PROCESS BASED ON DEFECT-BASED PRO...
- Publication number 20230076218
- Publication date Mar 9, 2023
- ASML NETHERLANDS B.V.
- Koenraad VAN INGEN SCHENAU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CORRECTION USING STACK DIFFERENCE
- Publication number 20180129139
- Publication date May 10, 2018
- ASML NETHERLANDS B.V.
- Aiqin JIANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY
- Publication number 20130212543
- Publication date Aug 15, 2013
- ASML NETHERLANDS B.V.
- Michael Matthew M. CROUSE
- G06 - COMPUTING CALCULATING COUNTING