Akifumi Ueda

Person

Tsukuba-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, photosensitive dry film, pattern...
- Patent number 9,625,812
- Issue date Apr 18, 2017
- Micro Process Inc
- Akifumi Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist polymer, process for production thereof, resist composition,...
- Patent number 9,188,857
- Issue date Nov 17, 2015
- MITSUBISHI RAYON CO., LTD.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, photosensitive dry film and metho...
- Patent number 8,647,806
- Issue date Feb 11, 2014
- Micro Process Inc
- Akifumi Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, photosensitive dry film and metho...
- Patent number 8,647,807
- Issue date Feb 11, 2014
- Micro Process Inc
- Akifumi Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist polymer, resist composition, process for pattern formation,...
- Patent number 8,614,283
- Issue date Dec 24, 2013
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist polymer and resist composition
- Patent number 8,580,481
- Issue date Nov 12, 2013
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist polymer, process for production thereof, resist composition,...
- Patent number 8,476,401
- Issue date Jul 2, 2013
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist polymer, resist composition, process for pattern formation,...
- Patent number 8,241,829
- Issue date Aug 14, 2012
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist polymer and resist composition
- Patent number 8,092,979
- Issue date Jan 10, 2012
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist polymer, resist composition, process for pattern formation,...
- Patent number 8,049,042
- Issue date Nov 1, 2011
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist polymer and resist composition
- Patent number 7,575,846
- Issue date Aug 18, 2009
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyester resin for a dye receptive layer of a recording medium for...
- Patent number 5,376,500
- Issue date Dec 27, 1994
- Mitsubishi Rayon Co., Ltd.
- Kenji Kushi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Recording medium for sublimation type heat-sensitive transfer recor...
- Patent number 5,326,741
- Issue date Jul 5, 1994
- Mitsubishi Rayon Co., Ltd.
- Kenji Kushi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Recording medium for sublimation type heat-sensitive transfer recor...
- Patent number 5,326,742
- Issue date Jul 5, 1994
- Mitsubishi Rayon Co., Ltd.
- Kenji Kushi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, PATTERN...
- Publication number 20150168832
- Publication date Jun 18, 2015
- MICRO PROCESS INC.
- Akifumi Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST POLYMER, PROCESS FOR PRODUCTION THEREOF, RESIST COMPOSITION,...
- Publication number 20130252181
- Publication date Sep 26, 2013
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM AND METHO...
- Publication number 20130004895
- Publication date Jan 3, 2013
- MICRO PROCESS INC.
- Akifumi Ueda
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM AND METHO...
- Publication number 20120301830
- Publication date Nov 29, 2012
- MICRO PROCESS INC.
- Akifumi Ueda
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
RESIST POLYMER AND RESIST COMPOSITION
- Publication number 20120034561
- Publication date Feb 9, 2012
- Mitsubishi Rayon Co., Ltd.
- Hikaru MOMOSE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION,...
- Publication number 20110144295
- Publication date Jun 16, 2011
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST POLYMER AND RESIST COMPOSITION
- Publication number 20090263743
- Publication date Oct 22, 2009
- Mitsubishi Rayon Co., Ltd.
- Hikaru MOMOSE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION,...
- Publication number 20090198065
- Publication date Aug 6, 2009
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist Polymer, Process For Production Thereof, Resist Composition,...
- Publication number 20080032241
- Publication date Feb 7, 2008
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist polymer, resist composition, process for pattern formation,...
- Publication number 20070190449
- Publication date Aug 16, 2007
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist polymer and resist composition
- Publication number 20060127801
- Publication date Jun 15, 2006
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Akifumi Ueda

Person

Patents Grantslast 30 patents

Photosensitive resin composition, photosensitive dry film, pattern...

Resist polymer, process for production thereof, resist composition,...

Photosensitive resin composition, photosensitive dry film and metho...

Photosensitive resin composition, photosensitive dry film and metho...

Resist polymer, resist composition, process for pattern formation,...

Resist polymer and resist composition

Resist polymer, process for production thereof, resist composition,...

Resist polymer, resist composition, process for pattern formation,...

Resist polymer and resist composition

Resist polymer, resist composition, process for pattern formation,...

Resist polymer and resist composition

Polyester resin for a dye receptive layer of a recording medium for...

Recording medium for sublimation type heat-sensitive transfer recor...

Recording medium for sublimation type heat-sensitive transfer recor...

Patents Applicationslast 30 patents

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, PATTERN...

RESIST POLYMER, PROCESS FOR PRODUCTION THEREOF, RESIST COMPOSITION,...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM AND METHO...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM AND METHO...

RESIST POLYMER AND RESIST COMPOSITION

RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION,...

RESIST POLYMER AND RESIST COMPOSITION

RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION,...

Resist Polymer, Process For Production Thereof, Resist Composition,...

Resist polymer, resist composition, process for pattern formation,...

Resist polymer and resist composition