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Akihiko Seki
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Joetsu-shi, JP
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last 30 patents
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Patent Grant
Positive resist composition and patterning process
Patent number
9,778,568
Issue date
Oct 3, 2017
Shin-Etsu Chemical Co., Ltd.
Kenji Funatsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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last 30 patents
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Patent Application
POSTITIVE RESIST COMPOSTION AND PATTERNING PROCESS
Publication number
20160327864
Publication date
Nov 10, 2016
Shin-Etsu Chemical Co., Ltd.
Kenji Funatsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY