Akihiro HISAI

Person

Kyoto-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Developing apparatus
- Patent number 9,581,907
- Issue date Feb 28, 2017
- Screen Semiconductor Solutions Co., Ltd.
- Masahiko Harumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing method
- Patent number 8,956,695
- Issue date Feb 17, 2015
- Screen Semiconductor Solutions Co., Ltd.
- Masahiko Harumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 8,580,340
- Issue date Nov 12, 2013
- Sokudo Co., Ltd.
- Masanori Imamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 8,496,761
- Issue date Jul 30, 2013
- Sokudo Co., Ltd.
- Koji Kaneyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate developing method and developing apparatus
- Patent number 8,137,576
- Issue date Mar 20, 2012
- Sokudo Co., Ltd.
- Masahiko Harumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 8,034,190
- Issue date Oct 11, 2011
- Sokudo Co., Ltd.
- Shuichi Yasuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,726,891
- Issue date Jun 1, 2010
- Sokudo Co., Ltd.
- Koji Kaneyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat processing device
- Patent number 7,017,658
- Issue date Mar 28, 2006
- Dainippon Screen Mfg. Co., Ltd.
- Akihiro Hisai
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Substrate processing apparatus and method including a device for ap...
- Patent number 6,913,781
- Issue date Jul 5, 2005
- Dainippon Screen Mfg. Co., Ltd.
- Koji Kaneyama
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Thermal processor
- Patent number 6,736,206
- Issue date May 18, 2004
- Dainippon Screen Mfg. Co., Ltd.
- Akihiro Hisai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of thermally processing substrate
- Patent number 6,080,969
- Issue date Jun 27, 2000
- SMC Corporation
- Hiroyasu Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing system hot plate construction substrate
- Patent number 5,927,077
- Issue date Jul 27, 1999
- Dainippon Screen Mfg. Co., Ltd.
- Akihiro Hisai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treating liquid supplying apparatus for a substrate spin treating a...
- Patent number 5,514,215
- Issue date May 7, 1996
- Dainippon Screen Mfg. Co., Ltd.
- Kazuhisa Takamatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DEVELOPING APPARATUS
- Publication number 20150104747
- Publication date Apr 16, 2015
- SCREEN Semiconductor Solutions Co., Ltd.
- Masahiko Harumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPING APPARATUS
- Publication number 20120122038
- Publication date May 17, 2012
- SOKUDO CO., LTD.
- Masahiko Harumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20110135820
- Publication date Jun 9, 2011
- Masanori IMAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20100190116
- Publication date Jul 29, 2010
- SOKUDO CO., LTD.
- Koji Kaneyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20100159142
- Publication date Jun 24, 2010
- SOKUDO CO., LTD.
- Shuichi Yasuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPING APPARATUS
- Publication number 20090103960
- Publication date Apr 23, 2009
- SOKUDO CO., LTD.
- Masahiko Harumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE DEVELOPING METHOD AND DEVELOPING APPARATUS
- Publication number 20080203058
- Publication date Aug 28, 2008
- Sokudo Co., Ltd.
- Masahiko Harumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Heat treatment apparatus
- Publication number 20060292515
- Publication date Dec 28, 2006
- Dainippon Screen Mfg. Co., Ltd.
- Akihiro Hisai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20060104635
- Publication date May 18, 2006
- Dainippon Screen Mfg. Co., Ltd.
- Koji Kaneyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20060098978
- Publication date May 11, 2006
- Schuichi Yasuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20060098979
- Publication date May 11, 2006
- Dainippon Screen Mfg. Co., Ltd.
- Koji Kaneyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20050220985
- Publication date Oct 6, 2005
- Dainippon Screen Mfg. Co., Ltd.
- Koji Kaneyama
- G11 - INFORMATION STORAGE
Information Patent Application
Heat processing device
- Publication number 20030192686
- Publication date Oct 16, 2003
- Dainippon Screen Mfg. Co., Ltd.
- Akihiro Hisai
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
Substrate processing apparatus
- Publication number 20030155077
- Publication date Aug 21, 2003
- Dainippon Screen Mfg. Co., Ltd.
- Akihiro Hisai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20020192358
- Publication date Dec 19, 2002
- Dainippon Screen Mfg. Co., Ltd.
- Koji Kaneyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thermal processor
- Publication number 20020139523
- Publication date Oct 3, 2002
- Dainippon Screen Mfg. Co., Ltd.
- Akihiro Hisai
- H01 - BASIC ELECTRIC ELEMENTS

Akihiro HISAI

Person

Patents Grantslast 30 patents

Developing apparatus

Developing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate developing method and developing apparatus

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Heat processing device

Substrate processing apparatus and method including a device for ap...

Thermal processor

Apparatus for and method of thermally processing substrate

Processing system hot plate construction substrate

Treating liquid supplying apparatus for a substrate spin treating a...

Patents Applicationslast 30 patents

DEVELOPING APPARATUS

DEVELOPING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

DEVELOPING APPARATUS

SUBSTRATE DEVELOPING METHOD AND DEVELOPING APPARATUS

Heat treatment apparatus

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Heat processing device

Substrate processing apparatus

Substrate processing apparatus and substrate processing method

Thermal processor