Akihiro Nakae

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 6,916,749
- Issue date Jul 12, 2005
- Renesas Technology Corp.
- Kouichirou Tsujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure condition determination system
- Patent number 6,801,297
- Issue date Oct 5, 2004
- Renesas Technology Corp.
- Akihiro Nakae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for evaluating lithography process margin simulating layo...
- Patent number 6,760,892
- Issue date Jul 6, 2004
- Renesas Technology Corp.
- Hironobu Taoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask of attenuation type and manufacturing method thereof
- Patent number 6,048,647
- Issue date Apr 11, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Junji Miyazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo mask and method for fabricating semiconductor devices using t...
- Patent number 5,989,756
- Issue date Nov 23, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Akihiro Nakae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern determination method
- Patent number 5,955,227
- Issue date Sep 21, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Kouichirou Tsujita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask, method of fabricating same, and method of manufactur...
- Patent number 5,888,677
- Issue date Mar 30, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Akihiro Nakae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of correcting light proximity effect
- Patent number 5,867,253
- Issue date Feb 2, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Akihiro Nakae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Apparatus for evaluating lithography process margin simulating layo...
- Publication number 20040225993
- Publication date Nov 11, 2004
- Hironobu Taoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20040087044
- Publication date May 6, 2004
- Mitsubishi Denki Kabushiki Kaisha
- Kouichirou Tsujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Exposure condition determination system
- Publication number 20040008329
- Publication date Jan 15, 2004
- Mitsubishi Denki Kabushiki Kaisha
- Akihiro Nakae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for evaluating lithography process margin simulating layo...
- Publication number 20030154460
- Publication date Aug 14, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Hironobu Taoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Akihiro Nakae

Person

Patents Grantslast 30 patents

Method of manufacturing semiconductor device

Exposure condition determination system

Apparatus for evaluating lithography process margin simulating layo...

Phase shift mask of attenuation type and manufacturing method thereof

Photo mask and method for fabricating semiconductor devices using t...

Pattern determination method

Exposure mask, method of fabricating same, and method of manufactur...

Method of correcting light proximity effect

Patents Applicationslast 30 patents

Apparatus for evaluating lithography process margin simulating layo...

Method of manufacturing semiconductor device

Exposure condition determination system

Apparatus for evaluating lithography process margin simulating layo...