Akihiro Nakauchi

Person

Utsunomiya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Measuring method and measuring apparatus
- Patent number 9,719,773
- Issue date Aug 1, 2017
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Grant
Calculation method and calculation apparatus
- Patent number 8,868,366
- Issue date Oct 21, 2014
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Grant
Shape measurement apparatus, and shape measurement method
- Patent number 8,823,950
- Issue date Sep 2, 2014
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Grant
Measurement method and measurement apparatus that measure a surface...
- Patent number 8,345,263
- Issue date Jan 1, 2013
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Grant
Measurement method and measurement apparatus that measure a surface...
- Patent number 8,314,937
- Issue date Nov 20, 2012
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Grant
Measuring apparatus, exposure apparatus and method, and device manu...
- Patent number 8,004,691
- Issue date Aug 23, 2011
- Canon Kabushiki Kaisha
- Chidane Ouchi
- G01 - MEASURING TESTING
Information Patent Grant
Exposure apparatus mounted with measuring apparatus
- Patent number 7,619,748
- Issue date Nov 17, 2009
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Grant
Exposure apparatus and device manufacturing method using the same
- Patent number 7,602,473
- Issue date Oct 13, 2009
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of calculating two-dimensional wavefront aberration
- Patent number 7,403,291
- Issue date Jul 22, 2008
- Canon Kabushiki Kaisha
- Kazuki Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aberration measuring apparatus for an optical system utilizing soft...
- Patent number 7,081,962
- Issue date Jul 25, 2006
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Grant
Projection exposure apparatus and aberration measurement method
- Patent number 6,977,728
- Issue date Dec 20, 2005
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Grant
Projection exposure apparatus having aberration measurement device
- Patent number 6,859,264
- Issue date Feb 22, 2005
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface shape measuring apparatus and method
- Patent number 6,721,056
- Issue date Apr 13, 2004
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Grant
Wavefront aberration measurement method and projection exposure app...
- Patent number 6,650,398
- Issue date Nov 18, 2003
- Canon Kabushi Kaisha
- Akihiro Nakauchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MEASUREMENT APPARATUS AND MEASUREMENT METHOD
- Publication number 20140182150
- Publication date Jul 3, 2014
- Canon Kabushiki Kaisha
- Yuya Nishikawa
- G01 - MEASURING TESTING
Information Patent Application
SHAPE MEASUREMENT APPARATUS, AND SHAPE MEASUREMENT METHOD
- Publication number 20140055794
- Publication date Feb 27, 2014
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Application
MEASUREMENT APPARATUS AND METHOD
- Publication number 20120010850
- Publication date Jan 12, 2012
- Canon Kabushiki Kaisha
- Akihiro NAKAUCHI
- G01 - MEASURING TESTING
Information Patent Application
MEASURING METHOD AND MEASURING APPARATUS
- Publication number 20110112785
- Publication date May 12, 2011
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Application
CALCULATION METHOD AND CALCULATION APPARATUS
- Publication number 20110093228
- Publication date Apr 21, 2011
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Application
MEASUREMENT METHOD AND MEASUREMENT APPARATUS
- Publication number 20100177322
- Publication date Jul 15, 2010
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Application
MEASUREMENT METHOD AND MEASUREMENT APPARATUS
- Publication number 20100149547
- Publication date Jun 17, 2010
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Application
MEASURING APPARATUS, EXPOSURE APPARATUS AND METHOD, AND DEVICE MANU...
- Publication number 20090290136
- Publication date Nov 26, 2009
- Canon Kabushiki Kaisha
- Chidane Ouchi
- G01 - MEASURING TESTING
Information Patent Application
Exposure apparatus and device manufacturing method using the same
- Publication number 20060238737
- Publication date Oct 26, 2006
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of calculating two-dimensional wavefront aberration
- Publication number 20060061757
- Publication date Mar 23, 2006
- Kazuki Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus mounted with measuring apparatus
- Publication number 20050190378
- Publication date Sep 1, 2005
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Application
Wavefront aberration measuring apparatus
- Publication number 20040174533
- Publication date Sep 9, 2004
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Application
Aberration measuring apparatus
- Publication number 20040174532
- Publication date Sep 9, 2004
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Application
Projection exposure apparatus and aberration measurement method
- Publication number 20030086078
- Publication date May 8, 2003
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G01 - MEASURING TESTING
Information Patent Application
Wavefront aberration measurement method and projection exposure app...
- Publication number 20020122162
- Publication date Sep 5, 2002
- Akihiro Nakauchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection exposure apparatus having aberration measurement device
- Publication number 20020024643
- Publication date Feb 28, 2002
- Akihiro Nakauchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Akihiro Nakauchi

Person

Patents Grantslast 30 patents

Measuring method and measuring apparatus

Calculation method and calculation apparatus

Shape measurement apparatus, and shape measurement method

Measurement method and measurement apparatus that measure a surface...

Measurement method and measurement apparatus that measure a surface...

Measuring apparatus, exposure apparatus and method, and device manu...

Exposure apparatus mounted with measuring apparatus

Exposure apparatus and device manufacturing method using the same

Method of calculating two-dimensional wavefront aberration

Aberration measuring apparatus for an optical system utilizing soft...

Projection exposure apparatus and aberration measurement method

Projection exposure apparatus having aberration measurement device

Surface shape measuring apparatus and method

Wavefront aberration measurement method and projection exposure app...

Patents Applicationslast 30 patents

MEASUREMENT APPARATUS AND MEASUREMENT METHOD

SHAPE MEASUREMENT APPARATUS, AND SHAPE MEASUREMENT METHOD

MEASUREMENT APPARATUS AND METHOD

MEASURING METHOD AND MEASURING APPARATUS

CALCULATION METHOD AND CALCULATION APPARATUS

MEASUREMENT METHOD AND MEASUREMENT APPARATUS

MEASUREMENT METHOD AND MEASUREMENT APPARATUS

MEASURING APPARATUS, EXPOSURE APPARATUS AND METHOD, AND DEVICE MANU...

Exposure apparatus and device manufacturing method using the same

Method of calculating two-dimensional wavefront aberration

Exposure apparatus mounted with measuring apparatus

Wavefront aberration measuring apparatus

Aberration measuring apparatus

Projection exposure apparatus and aberration measurement method

Wavefront aberration measurement method and projection exposure app...

Projection exposure apparatus having aberration measurement device