Akihiro OSHIMA

Person

Ibaraki-shi, Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing low-molecular-weight polytetrafluoroethylene
- Patent number 11,780,973
- Issue date Oct 10, 2023
- Osaka University
- Akihiro Oshima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing paper
- Patent number 11,634,867
- Issue date Apr 25, 2023
- Osaka University
- Akihiro Oshima
- D21 - PAPER-MAKING PRODUCTION OF CELLULOSE
Information Patent Grant
Molding material and method for producing resin molded body using same
- Patent number 11,623,975
- Issue date Apr 11, 2023
- Osaka University
- Akihiro Oshima
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Resist patterning method, latent resist image forming device, resis...
- Patent number 10,670,967
- Issue date Jun 2, 2020
- Osaka University
- Seiichi Tagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist-pattern-forming method and chemically amplified resist material
- Patent number 10,073,348
- Issue date Sep 11, 2018
- Osaka University
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified resist material, pattern-forming method, compo...
- Patent number 10,073,349
- Issue date Sep 11, 2018
- Osaka University
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitization chemical-amplification type resist material, met...
- Patent number 10,025,187
- Issue date Jul 17, 2018
- Tokyo Electron Limited
- Seiji Nagahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment system
- Patent number 10,025,190
- Issue date Jul 17, 2018
- Tokyo Electron Limited
- Seiji Nagahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist patterning method, latent resist image forming device, resis...
- Patent number 9,977,332
- Issue date May 22, 2018
- Osaka University
- Seiichi Tagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method
- Patent number 9,971,247
- Issue date May 15, 2018
- Osaka University
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MANUFACTURING METHOD FOR HYDROFLUOROOLEFIN OR FLUOROOLEFIN
- Publication number 20230014347
- Publication date Jan 19, 2023
- DAIKIN INDUSTRIES, LTD.
- Yuuta HASUMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING LOW MOLECULAR WEIGHT POLYTETRAFLUOROETHYLENE,...
- Publication number 20220356276
- Publication date Nov 10, 2022
- DAIKIN INDUSTRIES, LTD.
- Takayuki Tanaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING LOW-MOLECULAR WEIGHT POLYTETRAFLUOROETHYLENE,...
- Publication number 20220127391
- Publication date Apr 28, 2022
- DAIKIN INDUSTRIES, LTD.
- Chisato HIGASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING LOW-MOLECULAR-WEIGHT POLYTETRAFLUOROETHYLENE
- Publication number 20210347953
- Publication date Nov 11, 2021
- OSAKA UNIVERSITY
- Akihiro OSHIMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING PAPER
- Publication number 20210108371
- Publication date Apr 15, 2021
- OSAKA UNIVERSITY
- Akihiro OSHIMA
- D21 - PAPER-MAKING PRODUCTION OF CELLULOSE
Information Patent Application
MOLDING MATERIAL AND METHOD FOR PRODUCING RESIN MOLDED BODY USING SAME
- Publication number 20200270386
- Publication date Aug 27, 2020
- OSAKA UNIVERSITY
- Akihiro OSHIMA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
RESIST PATTERNING METHOD, LATENT RESIST IMAGE FORMING DEVICE, RESIS...
- Publication number 20180231892
- Publication date Aug 16, 2018
- OSAKA UNIVERSITY
- Seiichi TAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR PREVENTING ADHESION OF AQUATIC ORGANISMS
- Publication number 20170158848
- Publication date Jun 8, 2017
- DAIKIN INDUSTRIES, LTD.
- Kazuya KAWAHARA
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20170052450
- Publication date Feb 23, 2017
- Osaka University
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL
- Publication number 20170052448
- Publication date Feb 23, 2017
- Osaka University
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPO...
- Publication number 20170052449
- Publication date Feb 23, 2017
- Osaka University
- HISASHI NAKAGAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SUBSTRATE TREATMENT SYSTEM
- Publication number 20170031245
- Publication date Feb 2, 2017
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, MET...
- Publication number 20160357103
- Publication date Dec 8, 2016
- Tokyo Electron Limited
- Seiji NAGAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROSTRUCTURAL MATERIALS AND FABRICATION METHOD THEREOF
- Publication number 20160193756
- Publication date Jul 7, 2016
- DAIKIN INDUSTRIES, LTD.
- Akihiro OSHIMA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
RESIST PATTERNING METHOD, LATENT RESIST IMAGE FORMING DEVICE, RESIS...
- Publication number 20160004160
- Publication date Jan 7, 2016
- OSAKA UNIVERSITY
- Seiichi TAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROSTRUCTURAL MATERIALS AND FABRICATION METHOD THEREOF
- Publication number 20120231220
- Publication date Sep 13, 2012
- JAPAN ATOMIC ENERGY AGENCY
- Akihiro Oshima
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Akihiro OSHIMA

Person

Patents Grantslast 30 patents

Method for producing low-molecular-weight polytetrafluoroethylene

Method for producing paper

Molding material and method for producing resin molded body using same

Resist patterning method, latent resist image forming device, resis...

Resist-pattern-forming method and chemically amplified resist material

Chemically amplified resist material, pattern-forming method, compo...

Photosensitization chemical-amplification type resist material, met...

Substrate treatment system

Resist patterning method, latent resist image forming device, resis...

Pattern-forming method

Patents Applicationslast 30 patents

MANUFACTURING METHOD FOR HYDROFLUOROOLEFIN OR FLUOROOLEFIN

METHOD FOR PRODUCING LOW MOLECULAR WEIGHT POLYTETRAFLUOROETHYLENE,...

METHOD FOR PRODUCING LOW-MOLECULAR WEIGHT POLYTETRAFLUOROETHYLENE,...

METHOD FOR PRODUCING LOW-MOLECULAR-WEIGHT POLYTETRAFLUOROETHYLENE

METHOD FOR PRODUCING PAPER

MOLDING MATERIAL AND METHOD FOR PRODUCING RESIN MOLDED BODY USING SAME

RESIST PATTERNING METHOD, LATENT RESIST IMAGE FORMING DEVICE, RESIS...

MATERIAL FOR PREVENTING ADHESION OF AQUATIC ORGANISMS

PATTERN-FORMING METHOD

RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL

CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPO...

SUBSTRATE TREATMENT SYSTEM

PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, MET...

MICROSTRUCTURAL MATERIALS AND FABRICATION METHOD THEREOF

RESIST PATTERNING METHOD, LATENT RESIST IMAGE FORMING DEVICE, RESIS...

MICROSTRUCTURAL MATERIALS AND FABRICATION METHOD THEREOF