Akihiro Seki

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,579,529
- Issue date Feb 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Matsui
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Patterning process and resist composition
- Patent number 9,551,932
- Issue date Jan 24, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt, resist composition and patterning process
- Patent number 9,122,155
- Issue date Sep 1, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt, resist composition, and patterning process
- Patent number 8,956,803
- Issue date Feb 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,871,427
- Issue date Oct 28, 2014
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Patterning process
- Patent number 8,722,321
- Issue date May 13, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist compositions and patterning process
- Patent number 7,638,260
- Issue date Dec 29, 2009
- Shin-Etsu Chemical Co., Ltd.
- Akihiro Seki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist compositions and patterning process
- Patent number 7,618,764
- Issue date Nov 17, 2009
- Shin-Etsu Chemical Co., Ltd.
- Shigeo Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generators, chemically amplified resist compositions, and...
- Patent number 7,494,760
- Issue date Feb 24, 2009
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fine contact hole forming method employing thermal flow process
- Patent number 7,344,827
- Issue date Mar 18, 2008
- Shin-Etsu Chemical Co., Inc.
- Katsuya Takemura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitrogen-containing organic compound, resist composition and patter...
- Patent number 7,252,925
- Issue date Aug 7, 2007
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplification, positive resist compositions
- Patent number 6,838,224
- Issue date Jan 4, 2005
- Shi-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplification resist compositions
- Patent number 6,737,214
- Issue date May 18, 2004
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplification, positive resist compositions
- Patent number 6,682,869
- Issue date Jan 27, 2004
- Shin-Etu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist compositions and patterning process
- Patent number 6,395,446
- Issue date May 28, 2002
- Shin-Etsu Chemical Co., Ltd.
- Akihiro Seki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200285152
- Publication date Sep 10, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Matsui
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20150268555
- Publication date Sep 24, 2015
- Shin-Etsu Chemical Co., Ltd.
- Kenji FUNATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20140212808
- Publication date Jul 31, 2014
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20140199629
- Publication date Jul 17, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masaki OHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SULFONIUM SALT, RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20140199630
- Publication date Jul 17, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masaki OHASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20130045444
- Publication date Feb 21, 2013
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERNING PROCESS
- Publication number 20120270159
- Publication date Oct 25, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist compositions and patterning process
- Publication number 20080268370
- Publication date Oct 30, 2008
- Shin-Etsu Chemical Co., Ltd.
- Shigeo Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist compositions and patterning process
- Publication number 20080124653
- Publication date May 29, 2008
- Shin-Etsu Chemical Co., Ltd.
- Akihiro Seki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist compositions and patterning process
- Publication number 20080118863
- Publication date May 22, 2008
- Shin-Etsu Chemical Co., Ltd.
- Shigeo Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoacid generators, chemically amplified resist compositions, and...
- Publication number 20070287096
- Publication date Dec 13, 2007
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Nitrogen-containing organic compound, resist composition and patter...
- Publication number 20050095533
- Publication date May 5, 2005
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fine contact hole forming method employing thermal flow process
- Publication number 20040224513
- Publication date Nov 11, 2004
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplification, positive resist compositions
- Publication number 20010038971
- Publication date Nov 8, 2001
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Chemical amplification, positive resist compositions
- Publication number 20010033994
- Publication date Oct 25, 2001
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Chemical amplification resist compositions
- Publication number 20010031421
- Publication date Oct 18, 2001
- Takanobu Takeda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Akihiro Seki

Person

Patents Grantslast 30 patents

Positive resist composition and patterning process

Patterning process and resist composition

Sulfonium salt, resist composition and patterning process

Sulfonium salt, resist composition, and patterning process

Positive resist composition and patterning process

Patterning process

Positive resist compositions and patterning process

Positive resist compositions and patterning process

Photoacid generators, chemically amplified resist compositions, and...

Fine contact hole forming method employing thermal flow process

Nitrogen-containing organic compound, resist composition and patter...

Chemical amplification, positive resist compositions

Chemical amplification resist compositions

Chemical amplification, positive resist compositions

Resist compositions and patterning process

Patents Applicationslast 30 patents

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

PATTERNING PROCESS AND RESIST COMPOSITION

SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS

SULFONIUM SALT, RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

PATTERNING PROCESS

Positive resist compositions and patterning process

Positive resist compositions and patterning process

Positive resist compositions and patterning process

Photoacid generators, chemically amplified resist compositions, and...

Nitrogen-containing organic compound, resist composition and patter...

Fine contact hole forming method employing thermal flow process

Chemical amplification, positive resist compositions

Chemical amplification, positive resist compositions

Chemical amplification resist compositions