Akihito Toda

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Nirasaki-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method, plasma processing apparatus and storage m...
- Patent number 8,058,585
- Issue date Nov 15, 2011
- Tokyo Electron Limited
- Hiroki Amemiya
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Processing method
- Patent number 7,297,635
- Issue date Nov 20, 2007
- Tokyo Electron Limited
- Akihito Toda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching equipment including a post processing apparatus for removin...
- Patent number 6,299,722
- Issue date Oct 9, 2001
- Tokyo Electron Limited
- Akihito Toda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer etching method and post-etching process
- Patent number 5,858,878
- Issue date Jan 12, 1999
- Tokyo Electron Limited
- Akihito Toda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for treating substrates
- Patent number 5,385,624
- Issue date Jan 31, 1995
- Tokyo Electron Limited
- Yutaka Amemiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus
- Patent number 5,147,493
- Issue date Sep 15, 1992
- Tokyo Electron Limited
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ANNULAR ASSEMBLY FOR PLASMA PROCESSING, PLASMA PROCESSING APPARATUS...
- Publication number 20090229759
- Publication date Sep 17, 2009
- TOKYO ELECTRON LIMITED
- Masahiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES, CONTR...
- Publication number 20080176408
- Publication date Jul 24, 2008
- TOKYO ELECTRON LIMITED
- Akihito TODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD
- Publication number 20070298617
- Publication date Dec 27, 2007
- TOKYO ELECTRON LIMITED
- Akihito Toda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma processing method, plasma processing apparatus and storage m...
- Publication number 20070221632
- Publication date Sep 27, 2007
- Hiroki Amemiya
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Processing method
- Publication number 20040259356
- Publication date Dec 23, 2004
- Akihito Toda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY