Akiko Kotachi

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 6,329,125
- Issue date Dec 11, 2001
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 6,200,725
- Issue date Mar 13, 2001
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 6,013,416
- Issue date Jan 11, 2000
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 5,968,713
- Issue date Oct 19, 1999
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material including si-containing resist having acid removabl...
- Patent number 5,856,071
- Issue date Jan 5, 1999
- Fujitsu Limited
- Akiko Kotachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for formation of resist patterns
- Patent number 5,403,699
- Issue date Apr 4, 1995
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for forming resist pattern
- Patent number 5,326,670
- Issue date Jul 5, 1994
- Fujitsu Limited
- Akiko Kotachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method and radiation resist for use when working th...
- Patent number 5,192,643
- Issue date Mar 9, 1993
- Fujitsu Limited
- Akiko Kotachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and pattern formation process
- Patent number 5,153,103
- Issue date Oct 6, 1992
- Fujitsu Limited
- Akiko Kotachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material for energy beam lithography and method of using the...
- Patent number 5,104,479
- Issue date Apr 14, 1992
- Fujitsu Limited
- Akiko Kotachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material for energy beam lithography and method of using the...
- Patent number 5,066,751
- Issue date Nov 19, 1991
- Fujitsu Limited
- Akiko Kotachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Chemically amplified resist compositions and process for the format...
- Publication number 20010003640
- Publication date Jun 14, 2001
- FUJITSU LIMITED
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Akiko Kotachi

Person

Patents Grantslast 30 patents

Chemically amplified resist compositions and process for the format...

Chemically amplified resist compositions and process for the format...

Chemically amplified resist compositions and process for the format...

Chemically amplified resist compositions and process for the format...

Resist material including si-containing resist having acid removabl...

Process for formation of resist patterns

Process for forming resist pattern

Pattern-forming method and radiation resist for use when working th...

Resist composition and pattern formation process

Resist material for energy beam lithography and method of using the...

Resist material for energy beam lithography and method of using the...

Patents Applicationslast 30 patents

Chemically amplified resist compositions and process for the format...