Akimasa Soyano

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Rotselaar, BE

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Patents Applicationslast 30 patents

Information Patent Application
WATERMARK DEFECT REDUCTION BY RESIST OPTIMIZATION
- Publication number 20080213689
- Publication date Sep 4, 2008
- Interuniversitair Microelektronica Centrum (IMEC) VZW
- Michael Kocsis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY