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Akimasa Soyano
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Yokkaichi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
Patent number
9,261,780
Issue date
Feb 16, 2016
JSR Corporation
Yusuke Asano
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Radiation-sensitive resin composition
Patent number
8,916,333
Issue date
Dec 23, 2014
JSR Corporation
Hiroshi Tomioka
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Radiation-sensitive resin composition, polymer, and compound
Patent number
8,507,575
Issue date
Aug 13, 2013
JSR Corporation
Nobuji Matsumura
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photoresist polymer compositions
Patent number
7,510,817
Issue date
Mar 31, 2009
JSR Corporation
Didier Benoit
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Radiation-sensitive resin composition
Patent number
6,800,419
Issue date
Oct 5, 2004
JSR Corporation
Akimasa Soyano
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Radiation-sensitive resin composition
Patent number
6,623,907
Issue date
Sep 23, 2003
JSR Corporation
Jun Numata
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Patents Applications
last 30 patents
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20140004463
Publication date
Jan 2, 2014
JSR Corporation
Yusuke Asano
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20130143160
Publication date
Jun 6, 2013
JSR Corporation
Yusuke Asano
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
Publication number
20130022926
Publication date
Jan 24, 2013
JSR Corporation
Hiroshi Tomioka
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND
Publication number
20120065291
Publication date
Mar 15, 2012
JSR Corporation
Nobuji Matsumura
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRA...
Publication number
20110151378
Publication date
Jun 23, 2011
JSR Corporation
Nobuji MATSUMURA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
Publication number
20110143279
Publication date
Jun 16, 2011
JSR Corporation
Tsutomu SHIMOKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photoresist polymer compositions
Publication number
20060257781
Publication date
Nov 16, 2006
Didier Benoit
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Radiation-sensitive resin composition
Publication number
20030203307
Publication date
Oct 30, 2003
Akimasa Soyano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Radiation-sensitive resin composition
Publication number
20010023050
Publication date
Sep 20, 2001
Jun Numata
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC