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Akimitsu Oishi

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  • Hyogo, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Etching method
    • Patent number 8,859,434
    • Issue date Oct 14, 2014
    • SPP Technologies Co., Ltd.
    • Akimitsu Oishi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma etching method
    • Patent number 8,673,781
    • Issue date Mar 18, 2014
    • Sumitomo Precision Products Co., LTD
    • Akimitsu Oishi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Deposition method
    • Patent number 8,598,049
    • Issue date Dec 3, 2013
    • SecureView LLC
    • Masayasu Hatashita
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

  • Information Patent Application

    Etching Method
    • Publication number 20130115772
    • Publication date May 9, 2013
    • SPP TECHNOLOGIES CO., LTD.
    • Akimitsu Oishi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Deposition Method
    • Publication number 20120258604
    • Publication date Oct 11, 2012
    • SPP TECHNOLOGIES CO., LTD.
    • Masayasu Hatashita
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Plasma Etching Method
    • Publication number 20120052688
    • Publication date Mar 1, 2012
    • SUMITOMO PRECISION PRODUCTS CO., LTD.
    • Akimitsu Oishi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SILICON STRUCTURE HAVING AN OPENING WHICH HAS A HIGH ASPECT RATIO,...
    • Publication number 20090275202
    • Publication date Nov 5, 2009
    • Masahiko Tanaka
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...