Akinobu Tanaka

Person

Jyoetsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Order receiving system and order receiving method
- Patent number 9,424,602
- Issue date Aug 23, 2016
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Shouhei Taniguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Chemically amplified negative resist composition and patterning pro...
- Patent number 9,075,306
- Issue date Jul 7, 2015
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition and patterning process
- Patent number 8,828,645
- Issue date Sep 9, 2014
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition and patterning process
- Patent number 8,603,724
- Issue date Dec 10, 2013
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition and patterning process
- Patent number 8,597,868
- Issue date Dec 3, 2013
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 8,592,133
- Issue date Nov 26, 2013
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and patterning process
- Patent number 8,586,282
- Issue date Nov 19, 2013
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition, patterning process, and testing proces...
- Patent number 8,557,509
- Issue date Oct 15, 2013
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition and pattern formin...
- Patent number 8,546,060
- Issue date Oct 1, 2013
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified negative resist composition for EB or EUV lith...
- Patent number 8,470,511
- Issue date Jun 25, 2013
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition and patterning process
- Patent number 8,470,509
- Issue date Jun 25, 2013
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, chemically amplified negative resist composition, and patt...
- Patent number 8,470,512
- Issue date Jun 25, 2013
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition for EB or EUV lith...
- Patent number 8,426,108
- Issue date Apr 23, 2013
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 8,394,577
- Issue date Mar 12, 2013
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 8,389,201
- Issue date Mar 5, 2013
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive photoresist composition and pattern f...
- Patent number 8,361,693
- Issue date Jan 29, 2013
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition and patterning process using the same
- Patent number 8,361,692
- Issue date Jan 29, 2013
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist composition and pattern forming process
- Patent number 8,288,076
- Issue date Oct 16, 2012
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition and resist pattern...
- Patent number 8,252,518
- Issue date Aug 28, 2012
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 8,168,367
- Issue date May 1, 2012
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist patterning process and manufacturing photo mask
- Patent number 8,110,335
- Issue date Feb 7, 2012
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salts and positive resist materials using the same
- Patent number 6,841,334
- Issue date Jan 11, 2005
- Shin-Etsu Chemical Co., Ltd.
- Fujio Yagihashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivat...
- Patent number 6,667,415
- Issue date Dec 23, 2003
- Shin-Etsu Chemical Co., Ltd.
- Fujio Yagihashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salts and chemically amplified positive resist compositions
- Patent number 5,880,169
- Issue date Mar 9, 1999
- Shin-Etsu Chemical Co., Ltd.
- Yoichi Osawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bisphenol carboxylic acid tertiary ester derivatives and chemically...
- Patent number 5,856,561
- Issue date Jan 5, 1999
- Shin-Etsu Chemical Co., Ltd.
- Takesi Nagata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salts and chemically amplified positive resist compositions
- Patent number 5,824,824
- Issue date Oct 20, 1998
- Shin-Etsu Chemical Co., Ltd.
- Yoichi Osawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 5,679,496
- Issue date Oct 21, 1997
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 5,629,134
- Issue date May 13, 1997
- Shin-Etsu Chemical Co., Ltd.
- Katsuyuki Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 5,624,787
- Issue date Apr 29, 1997
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 5,612,170
- Issue date Mar 18, 1997
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MONITORING CAMERA SYSTEM AND CONTROL METHOD OF MONITORING CAMERA SY...
- Publication number 20150244991
- Publication date Aug 27, 2015
- Panasonic Intellectual Property Management Co., Ltd.
- Junko Noda
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20140051025
- Publication date Feb 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Akinobu TANAKA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ORDER RECEIVING SYSTEM AND ORDER RECEIVING METHOD
- Publication number 20130138515
- Publication date May 30, 2013
- PANASONIC CORPORATION
- Shouhei TANIGUCHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120183892
- Publication date Jul 19, 2012
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120183893
- Publication date Jul 19, 2012
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATT...
- Publication number 20120028190
- Publication date Feb 2, 2012
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMIN...
- Publication number 20110200919
- Publication date Aug 18, 2011
- Keiichi MASUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR EB OR EUV LITH...
- Publication number 20110200941
- Publication date Aug 18, 2011
- Keiichi MASUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION FOR EB OR EUV LITH...
- Publication number 20110200942
- Publication date Aug 18, 2011
- Keiichi MASUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20110177464
- Publication date Jul 21, 2011
- Shin-Etsu Chemical Co., Ltd.
- Takanobu TAKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20110171579
- Publication date Jul 14, 2011
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20110143266
- Publication date Jun 16, 2011
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20110129765
- Publication date Jun 2, 2011
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20110003251
- Publication date Jan 6, 2011
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION AND PATTERN F...
- Publication number 20100316955
- Publication date Dec 16, 2010
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition and patterning process using the same
- Publication number 20100304301
- Publication date Dec 2, 2010
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20100304302
- Publication date Dec 2, 2010
- Keiichi MASUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition, patterning process, and testing proces...
- Publication number 20100291484
- Publication date Nov 18, 2010
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS
- Publication number 20100261123
- Publication date Oct 14, 2010
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified positive resist composition and resist pattern...
- Publication number 20100167207
- Publication date Jul 1, 2010
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and patterning process
- Publication number 20100009299
- Publication date Jan 14, 2010
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist patterning process and manufacturing photo mask
- Publication number 20100009271
- Publication date Jan 14, 2010
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20090214960
- Publication date Aug 27, 2009
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20080241751
- Publication date Oct 2, 2008
- Shin-Etsu Chemical Co., Ltd.
- Takanobu TAKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Onium salts and positive resist materials using the same
- Publication number 20040076905
- Publication date Apr 22, 2004
- Fujio Yagihashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALTS AND POSITIVE RESIST MATERIALS USING THE SAME
- Publication number 20030096189
- Publication date May 22, 2003
- FUJIO YAGIHASHI
- C07 - ORGANIC CHEMISTRY

Akinobu Tanaka

Person

Patents Grantslast 30 patents

Order receiving system and order receiving method

Chemically amplified negative resist composition and patterning pro...

Negative resist composition and patterning process

Negative resist composition and patterning process

Negative resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Negative resist composition, patterning process, and testing proces...

Chemically amplified positive resist composition and pattern formin...

Chemically amplified negative resist composition for EB or EUV lith...

Negative resist composition and patterning process

Polymer, chemically amplified negative resist composition, and patt...

Chemically amplified positive resist composition for EB or EUV lith...

Patterning process

Positive resist composition and pattern forming process

Chemically amplified positive photoresist composition and pattern f...

Negative resist composition and patterning process using the same

Chemically amplified resist composition and pattern forming process

Chemically amplified positive resist composition and resist pattern...

Resist composition and patterning process

Resist patterning process and manufacturing photo mask

Onium salts and positive resist materials using the same

Tertiary butyl 4,4-bis(4&#x02032;-hydroxyphenyl) pentanoate derivat...

Sulfonium salts and chemically amplified positive resist compositions

Bisphenol carboxylic acid tertiary ester derivatives and chemically...

Sulfonium salts and chemically amplified positive resist compositions

Chemically amplified positive resist composition

Chemically amplified positive resist composition

Chemically amplified positive resist composition

Positive resist composition

Patents Applicationslast 30 patents

MONITORING CAMERA SYSTEM AND CONTROL METHOD OF MONITORING CAMERA SY...

NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS

ORDER RECEIVING SYSTEM AND ORDER RECEIVING METHOD

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATT...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMIN...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR EB OR EUV LITH...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION FOR EB OR EUV LITH...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...

NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS

NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS

NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION AND PATTERN F...

Negative resist composition and patterning process using the same

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING PROCESS

Negative resist composition, patterning process, and testing proces...

PATTERNING PROCESS

Chemically amplified positive resist composition and resist pattern...

Resist composition and patterning process

Resist patterning process and manufacturing photo mask

RESIST COMPOSITION AND PATTERNING PROCESS

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...

Onium salts and positive resist materials using the same

ONIUM SALTS AND POSITIVE RESIST MATERIALS USING THE SAME

Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivat...