Akinori Kitamura

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method and etching apparatus
- Patent number 10,672,622
- Issue date Jun 2, 2020
- Tokyo Electron Limited
- Yusuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching silicon layer and plasma processing apparatus
- Patent number 10,121,674
- Issue date Nov 6, 2018
- Tokyo Electron Limited
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching silicon layer and plasma processing apparatus
- Patent number 9,779,954
- Issue date Oct 3, 2017
- Tokyo Electron Limited
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching organic film
- Patent number 9,711,371
- Issue date Jul 18, 2017
- Tokyo Electron Limited
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 9,570,312
- Issue date Feb 14, 2017
- Tokyo Electron Limited
- Ryohei Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selectively removing a region formed of silicon oxide and...
- Patent number 9,502,537
- Issue date Nov 22, 2016
- Tokyo Electron Limited
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 9,412,607
- Issue date Aug 9, 2016
- Tokyo Electron Limited
- Tomiko Kamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 9,209,034
- Issue date Dec 8, 2015
- Tokyo Electron Limited
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 9,087,798
- Issue date Jul 21, 2015
- Tokyo Electron Limited
- Hiroto Ohtake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bevel/backside polymer removing method and device, substrate proces...
- Patent number 8,821,644
- Issue date Sep 2, 2014
- Tokyo Electron Limited
- Isamu Sakuragi
- B24 - GRINDING POLISHING
Information Patent Grant
Plasma etching method, plasma etching apparatus, control program an...
- Patent number 7,883,631
- Issue date Feb 8, 2011
- Tokyo Electron Limited
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 7,842,190
- Issue date Nov 30, 2010
- Tokyo Electron Limited
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching gas, etching method and etching gas evaluation method
- Patent number 7,794,616
- Issue date Sep 14, 2010
- Tokyo Electron Limited
- Masanobu Honda
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Semiconductor device manufacturing method, semiconductor device man...
- Patent number 7,655,572
- Issue date Feb 2, 2010
- Tokyo Electron Limited
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 7,473,377
- Issue date Jan 6, 2009
- Tokyo Electron Limited
- Tomoyo Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 7,300,881
- Issue date Nov 27, 2007
- Tokyo Electron Limited
- Kazuya Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma processing
- Patent number 7,183,219
- Issue date Feb 27, 2007
- Tokyo Electron AT Limited and Japan Science and Technology Corporation
- Kiichi Hama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry developing method
- Patent number 6,986,851
- Issue date Jan 17, 2006
- Tokyo Electron Limited
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20190067031
- Publication date Feb 28, 2019
- TOKYO ELECTRON LIMITED
- Yusuke SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING SILICON LAYER AND PLASMA PROCESSING APPARATUS
- Publication number 20170323796
- Publication date Nov 9, 2017
- TOKYO ELECTRON LIMITED
- Akinori KITAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING ORGANIC FILM
- Publication number 20160126071
- Publication date May 5, 2016
- TOKYO ELECTRON LIMITED
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING SILICON LAYER AND PLASMA PROCESSING APPARATUS
- Publication number 20150162203
- Publication date Jun 11, 2015
- TOKYO ELECTRON LIMITED
- Akinori KITAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20150099366
- Publication date Apr 9, 2015
- TOKYO ELECTRON LIMITED
- Ryohei Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SELECTIVELY REMOVING A REGION FORMED OF SILICON OXIDE AND...
- Publication number 20150064922
- Publication date Mar 5, 2015
- TOKYO ELECTRON LIMITED
- Akinori KITAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20150044877
- Publication date Feb 12, 2015
- TOKYO ELECTRON LIMITED
- Hiroto Ohtake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20150024603
- Publication date Jan 22, 2015
- TOKYO ELECTRON LIMITED
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20140332372
- Publication date Nov 13, 2014
- TOKYO ELECTRON LIMITED
- Tomiko Kamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CHECKING SUBSTRATE EDGE PROCESSING APPARATUS
- Publication number 20090188892
- Publication date Jul 30, 2009
- TOKYO ELECTRON LIMITED
- Kumiko Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEVEL/BACKSIDE POLYMER REMOVING METHOD AND DEVICE, SUBSTRATE PROCES...
- Publication number 20090143894
- Publication date Jun 4, 2009
- TOKYO ELECTRON LIMITED
- Isamu SAKURAGI
- B24 - GRINDING POLISHING
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20070228006
- Publication date Oct 4, 2007
- TOKYO ELECTRON LIMITED
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS, CONTROL PROGRAM AN...
- Publication number 20070212887
- Publication date Sep 13, 2007
- TOKYO ELECTRON LIMITED
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS, CONTROL PROGRAM AN...
- Publication number 20070197040
- Publication date Aug 23, 2007
- TOKYO ELECTRON LIMITED
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MAN...
- Publication number 20070090093
- Publication date Apr 26, 2007
- TOKYO ELECTRON LIMITED
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching gas, etching method and etching gas evaluation method
- Publication number 20060027530
- Publication date Feb 9, 2006
- TOKYO ELECTRON LIMITED
- Masanobu Honda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Plasma processing method
- Publication number 20050103748
- Publication date May 19, 2005
- TOKYO ELECTRON LIMITED
- Tomoyo Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method
- Publication number 20050101137
- Publication date May 12, 2005
- TOKYO ELECTRON LIMITED
- Kazuya Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching
- Publication number 20050101140
- Publication date May 12, 2005
- TOKYO ELECTRON LIMITED
- Tomoyo Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry developing method
- Publication number 20040169009
- Publication date Sep 2, 2004
- Akinori Kitamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Akinori Kitamura

Person

Patents Grantslast 30 patents

Etching method and etching apparatus

Method for etching silicon layer and plasma processing apparatus

Method for etching silicon layer and plasma processing apparatus

Method of etching organic film

Plasma etching method

Method of selectively removing a region formed of silicon oxide and...

Plasma etching method

Plasma etching method and plasma etching apparatus

Etching method

Bevel/backside polymer removing method and device, substrate proces...

Plasma etching method, plasma etching apparatus, control program an...

Plasma etching method

Etching gas, etching method and etching gas evaluation method

Semiconductor device manufacturing method, semiconductor device man...

Plasma processing method

Plasma etching method

Method of plasma processing

Dry developing method

Patents Applicationslast 30 patents

ETCHING METHOD AND ETCHING APPARATUS

METHOD FOR ETCHING SILICON LAYER AND PLASMA PROCESSING APPARATUS

METHOD OF ETCHING ORGANIC FILM

METHOD FOR ETCHING SILICON LAYER AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING METHOD

METHOD OF SELECTIVELY REMOVING A REGION FORMED OF SILICON OXIDE AND...

ETCHING METHOD

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

PLASMA ETCHING METHOD

METHOD OF CHECKING SUBSTRATE EDGE PROCESSING APPARATUS

BEVEL/BACKSIDE POLYMER REMOVING METHOD AND DEVICE, SUBSTRATE PROCES...

PLASMA ETCHING METHOD

PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS, CONTROL PROGRAM AN...

PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS, CONTROL PROGRAM AN...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MAN...

Etching gas, etching method and etching gas evaluation method

Plasma processing method

Plasma etching method

Method of plasma etching

Dry developing method