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Akinori Nakano
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Ota-ku, NL
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last 30 patents
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Patent Grant
Method for forming SiOCH film using organoaminosilane annealing
Patent number
9,190,263
Issue date
Nov 17, 2015
ASM IP Holding B.V.
Dai Ishikawa
H01 - BASIC ELECTRIC ELEMENTS
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last 30 patents
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Patent Application
Method for Forming SiOCH Film Using Organoaminosilane Annealing
Publication number
20150056821
Publication date
Feb 26, 2015
ASM IP HOLDING B.V.
Dai Ishikawa
H01 - BASIC ELECTRIC ELEMENTS