Akio Yamada

Person

Saitama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Three-dimensional laminating and shaping apparatus and laminating a...
- Patent number 11,229,971
- Issue date Jan 25, 2022
- Advantest Corporation
- Shinji Sugatani
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Three-dimensional laminating and shaping apparatus and laminating a...
- Patent number 10,919,105
- Issue date Feb 16, 2021
- Advantest Corporation
- Shinji Sugatani
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Device, manufacturing method, and exposure apparatus
- Patent number 10,573,491
- Issue date Feb 25, 2020
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method
- Patent number 10,256,074
- Issue date Apr 9, 2019
- Intel Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Information processing system, information processing method, commu...
- Patent number 10,115,127
- Issue date Oct 30, 2018
- NEC Corporation
- Toshiyuki Nomura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure apparatus and exposure method
- Patent number 9,977,337
- Issue date May 22, 2018
- Advantest Corporation
- Shoji Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and exposure method
- Patent number 9,859,099
- Issue date Jan 2, 2018
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure apparatus and method of manufacturin...
- Patent number 9,824,860
- Issue date Nov 21, 2017
- Advantest Corp.
- Akio Yamada
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Exposure apparatus
- Patent number 9,799,489
- Issue date Oct 24, 2017
- Advantest Corp.
- Shinichi Hamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Information processing system, information processing method, infor...
- Patent number 9,792,528
- Issue date Oct 17, 2017
- NEC Corporation
- Toshiyuki Nomura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Information processing system, information processing method, infor...
- Patent number 9,754,169
- Issue date Sep 5, 2017
- NEC Corporation
- Toshiyuki Nomura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure apparatus and exposure method
- Patent number 9,734,988
- Issue date Aug 15, 2017
- Intel Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus
- Patent number 9,684,245
- Issue date Jun 20, 2017
- Advantest Corporation
- Akio Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam exposure apparatus suitable for drawing on li...
- Patent number 9,607,807
- Issue date Mar 28, 2017
- Advantest Corp.
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure apparatus
- Patent number 9,478,396
- Issue date Oct 25, 2016
- Advantest Corp.
- Shinichi Hamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Information processing apparatus and control method and control pro...
- Patent number 9,418,314
- Issue date Aug 16, 2016
- NEC Corporation
- Toshiyuki Nomura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Video processing system, video processing method, video processing...
- Patent number 9,355,317
- Issue date May 31, 2016
- NEC Corporation
- Toshiyuki Nomura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electromagnetic lens for electron beam exposure apparatus
- Patent number 8,957,389
- Issue date Feb 17, 2015
- Advantest Corp.
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image direction judging device, image direction judging method and...
- Patent number 8,548,254
- Issue date Oct 1, 2013
- NEC Corporation
- Masumi Ishikawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electron beam exposure apparatus and electron beam exposure method
- Patent number 8,487,281
- Issue date Jul 16, 2013
- Advantest Corp.
- Masaki Kurokawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam lithography apparatus and electron beam lithography m...
- Patent number 8,466,439
- Issue date Jun 18, 2013
- Advantest Corp.
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam lithography apparatus and electron beam lithography m...
- Patent number 8,384,052
- Issue date Feb 26, 2013
- Advantest Corp.
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi-column electron beam exposure apparatus and multi-column elec...
- Patent number 8,222,619
- Issue date Jul 17, 2012
- Advantest Corp.
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask for multi-column electron beam exposure, and electron beam exp...
- Patent number 8,196,067
- Issue date Jun 5, 2012
- Advantest Corp.
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Viewing surveillance system for carrying out surveillance independe...
- Patent number 7,920,164
- Issue date Apr 5, 2011
- NEC Corporation
- Eiji Kasutani
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Electron beam exposure mask, electron beam exposure method, and ele...
- Patent number 7,847,272
- Issue date Dec 7, 2010
- Advantest Corp.
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electrical connector with plug connector and receptacle connector
- Patent number 7,845,987
- Issue date Dec 7, 2010
- DDK Ltd.
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrical connector
- Patent number 7,575,466
- Issue date Aug 18, 2009
- DDK Ltd.
- Shinya Ishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrical connector
- Patent number 7,540,770
- Issue date Jun 2, 2009
- DDK Ltd.
- Shinya Ishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Picture retrieving apparatus and method which converts orthogonal t...
- Patent number 7,457,460
- Issue date Nov 25, 2008
- NEC Corporation
- Eiji Kasutani
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
3D ADDITIVE MANUFACTURING DEVICE AND ADDITIVE MANUFACTURING METHOD
- Publication number 20200061908
- Publication date Feb 27, 2020
- Advantest Corporation
- Akio YAMADA
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
THREE-DIMENSIONAL LAMINATING AND SHAPING APPARATUS AND LAMINATING A...
- Publication number 20190118287
- Publication date Apr 25, 2019
- Advantest Corporation
- Shinji SUGATANI
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
THREE-DIMENSIONAL LAMINATING AND SHAPING APPARATUS AND LAMINATING A...
- Publication number 20190118286
- Publication date Apr 25, 2019
- ADVANTEST CORPORATION
- Shinji SUGATANI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXPOSURE APPARATUS AND COMPUTER READABLE NON-TRANSITORY STORAGE MEDIUM
- Publication number 20180067402
- Publication date Mar 8, 2018
- Advantest Corporation
- Akio YAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD
- Publication number 20170358426
- Publication date Dec 14, 2017
- Intel Corporation
- Akio YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTICOLUMN CHARGED PARTICLE BEAM EXPOSURE APPARATUS
- Publication number 20170323760
- Publication date Nov 9, 2017
- Advantest Corporation
- Masaki Kurokawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20170229285
- Publication date Aug 10, 2017
- Advantest Corporation
- Shinichi Hamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD
- Publication number 20170090298
- Publication date Mar 30, 2017
- Advantest Corporation
- Shoji KOJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD
- Publication number 20160314934
- Publication date Oct 27, 2016
- Advantest Corporation
- Akio YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE, MANUFACTURING METHOD, AND EXPOSURE APPARATUS
- Publication number 20160314930
- Publication date Oct 27, 2016
- Advantest Corporation
- Akio YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD
- Publication number 20160189930
- Publication date Jun 30, 2016
- Advantest Corporation
- Akio YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM EXPOSURE APPARATUS SUITABLE FOR DRAWING ON LI...
- Publication number 20160133438
- Publication date May 12, 2016
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20160062249
- Publication date Mar 3, 2016
- Advantest Corporation
- Akio YAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURIN...
- Publication number 20150243480
- Publication date Aug 27, 2015
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM EXPOSURE APPARATUS
- Publication number 20150200074
- Publication date Jul 16, 2015
- Advantest Corporation
- Shinichi Hamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, INFOR...
- Publication number 20150098610
- Publication date Apr 9, 2015
- NEC Corporation
- Toshiyuki Nomura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, INFOR...
- Publication number 20150010237
- Publication date Jan 8, 2015
- Toshiyuki Nomura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INFORMATION PROCESSING APPARATUS AND CONTROL METHOD AND CONTROL PRO...
- Publication number 20150003704
- Publication date Jan 1, 2015
- Toshiyuki Nomura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Video Processing System, Video Processing Method, Video Processing...
- Publication number 20140376815
- Publication date Dec 25, 2014
- NEC Corporation
- Toshiyuki Nomura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, COMMU...
- Publication number 20140310097
- Publication date Oct 16, 2014
- NEC Corporation
- Toshiyuki Nomura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ELECTROMAGNETIC LENS FOR ELECTRON BEAM EXPOSURE APPARATUS
- Publication number 20140166893
- Publication date Jun 19, 2014
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM EXPOSURE APPARATUS AND METHOD
- Publication number 20140131589
- Publication date May 15, 2014
- Advantest Corporation
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRON BEAM EXPOSURE APPARATUS AND ELECTRON BEAM EXPOSURE METHOD
- Publication number 20120256106
- Publication date Oct 11, 2012
- Masaki Kurokawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam lithography apparatus and electron beam lithography m...
- Publication number 20110226967
- Publication date Sep 22, 2011
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multi-column electron beam lithography apparatus and electron beam...
- Publication number 20110204224
- Publication date Aug 25, 2011
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam lithography apparatus and electron beam lithography m...
- Publication number 20110057114
- Publication date Mar 10, 2011
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRICAL CONNECTOR
- Publication number 20100190383
- Publication date Jul 29, 2010
- DDK LTD
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-column electron beam exposure apparatus and multi-column elec...
- Publication number 20100019172
- Publication date Jan 28, 2010
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask for multi-column electron beam exposure, and electron beam exp...
- Publication number 20090311613
- Publication date Dec 17, 2009
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Application
Image Direction Judging Device, Image Direction Judging Method and...
- Publication number 20090297038
- Publication date Dec 3, 2009
- NEC Corporation
- Masumi Ishikawa
- G06 - COMPUTING CALCULATING COUNTING

Akio Yamada

Person

Patents Grantslast 30 patents

Three-dimensional laminating and shaping apparatus and laminating a...

Three-dimensional laminating and shaping apparatus and laminating a...

Device, manufacturing method, and exposure apparatus

Exposure apparatus and exposure method

Information processing system, information processing method, commu...

Exposure apparatus and exposure method

Exposure apparatus and exposure method

Charged particle beam exposure apparatus and method of manufacturin...

Exposure apparatus

Information processing system, information processing method, infor...

Information processing system, information processing method, infor...

Exposure apparatus and exposure method

Exposure apparatus

Charged particle beam exposure apparatus suitable for drawing on li...

Charged particle beam exposure apparatus

Information processing apparatus and control method and control pro...

Video processing system, video processing method, video processing...

Electromagnetic lens for electron beam exposure apparatus

Image direction judging device, image direction judging method and...

Electron beam exposure apparatus and electron beam exposure method

Electron beam lithography apparatus and electron beam lithography m...

Electron beam lithography apparatus and electron beam lithography m...

Multi-column electron beam exposure apparatus and multi-column elec...

Mask for multi-column electron beam exposure, and electron beam exp...

Viewing surveillance system for carrying out surveillance independe...

Electron beam exposure mask, electron beam exposure method, and ele...

Electrical connector with plug connector and receptacle connector

Electrical connector

Electrical connector

Picture retrieving apparatus and method which converts orthogonal t...

Patents Applicationslast 30 patents

3D ADDITIVE MANUFACTURING DEVICE AND ADDITIVE MANUFACTURING METHOD

THREE-DIMENSIONAL LAMINATING AND SHAPING APPARATUS AND LAMINATING A...

THREE-DIMENSIONAL LAMINATING AND SHAPING APPARATUS AND LAMINATING A...

EXPOSURE APPARATUS AND COMPUTER READABLE NON-TRANSITORY STORAGE MEDIUM

EXPOSURE APPARATUS AND EXPOSURE METHOD

MULTICOLUMN CHARGED PARTICLE BEAM EXPOSURE APPARATUS

EXPOSURE APPARATUS

EXPOSURE APPARATUS AND EXPOSURE METHOD

EXPOSURE APPARATUS AND EXPOSURE METHOD

DEVICE, MANUFACTURING METHOD, AND EXPOSURE APPARATUS

EXPOSURE APPARATUS AND EXPOSURE METHOD

CHARGED PARTICLE BEAM EXPOSURE APPARATUS SUITABLE FOR DRAWING ON LI...

EXPOSURE APPARATUS

CHARGED PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURIN...

CHARGED PARTICLE BEAM EXPOSURE APPARATUS

INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, INFOR...

INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, INFOR...

INFORMATION PROCESSING APPARATUS AND CONTROL METHOD AND CONTROL PRO...

Video Processing System, Video Processing Method, Video Processing...

INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, COMMU...

ELECTROMAGNETIC LENS FOR ELECTRON BEAM EXPOSURE APPARATUS

ELECTRON BEAM EXPOSURE APPARATUS AND METHOD

ELECTRON BEAM EXPOSURE APPARATUS AND ELECTRON BEAM EXPOSURE METHOD

Electron beam lithography apparatus and electron beam lithography m...

Multi-column electron beam lithography apparatus and electron beam...

Electron beam lithography apparatus and electron beam lithography m...

ELECTRICAL CONNECTOR

Multi-column electron beam exposure apparatus and multi-column elec...

Mask for multi-column electron beam exposure, and electron beam exp...

Image Direction Judging Device, Image Direction Judging Method and...