Akira Asano

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Yamanashi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Noble metal barrier for fluorine-doped carbon films
- Patent number 8,119,518
- Issue date Feb 21, 2012
- Tokyo Electron Limited
- Kenichi Nishizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluorine doped carbon films produced by modification by radicals
- Patent number 7,875,549
- Issue date Jan 25, 2011
- Tokyo Electron Limited
- Kenichi Nishizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for supercritical carbon dioxide processing of fluoro-carbon...
- Patent number 7,307,019
- Issue date Dec 11, 2007
- Tokyo Electron Limited
- Kohei Kawamura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FLUORINE DOPED CARBON FILMS PRODUCED BY MODIFICATION BY RADICALS
- Publication number 20100317188
- Publication date Dec 16, 2010
- TOKYO ELECTON LIMITED
- Kenichi Nishizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma film-forming method and plasma film-forming apparatus
- Publication number 20060251828
- Publication date Nov 9, 2006
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for forming film, method for manufacturing semiconductor dev...
- Publication number 20060223306
- Publication date Oct 5, 2006
- Kohei Kawamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
A METHOD FOR SUPERCRITICAL CARBON DIOXIDE PROCESSING OF FLUORO-CARB...
- Publication number 20060068583
- Publication date Mar 30, 2006
- TOKYO ELECTRON LIMITED
- Kohei Kawamura
- H01 - BASIC ELECTRIC ELEMENTS