Akira Eguchi

Person

Himeji, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polymer compound, resin composition for photoresists, and method fo...
- Patent number 9,261,785
- Issue date Feb 16, 2016
- Daicel Corporation
- Masamichi Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing resin solution for photoresist, photoresist co...
- Patent number 8,753,793
- Issue date Jun 17, 2014
- Daicel Chemical Industries, Ltd.
- Akira Eguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Monomer having electron-withdrawing substituent and lactone skeleto...
- Patent number 8,637,623
- Issue date Jan 28, 2014
- Daicel Chemical Industries, Ltd.
- Hiroshi Koyama
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST RESIN, METHOD FOR PRODUCING PHOTORESIST RESIN, PHOTORES...
- Publication number 20220372188
- Publication date Nov 24, 2022
- DAICEL CORPORATION
- Akinori ITO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MONOMER, RESIN FOR PHOTORESIST, RESIN COMPOSITION FOR PHOTORESIST,...
- Publication number 20220267494
- Publication date Aug 25, 2022
- DAICEL CORPORATION
- Akira EGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST RESIN, PRODUCTION METHOD FOR PHOTORESIST RESIN, PHOTORE...
- Publication number 20210040253
- Publication date Feb 11, 2021
- DAICEL CORPORATION
- Akinori ITO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MONOMERS, PHOTORESIST RESINS, PHOTORESIST RESIN COMPOSITIONS, AND P...
- Publication number 20200089115
- Publication date Mar 19, 2020
- Daicel Corporation
- Akira Eguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER COMPOUND, RESIN COMPOSITION FOR PHOTORESISTS, AND METHOD FO...
- Publication number 20150168831
- Publication date Jun 18, 2015
- DAICEL CORPORATION
- Masamichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING POLYMER COMPOUND, POLYMER COMPOUND, AND PHOTOR...
- Publication number 20150147696
- Publication date May 28, 2015
- DAICEL CORPORATION
- Akira Eguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING RESIN SOLUTION FOR PHOTORESIST, PHOTORESIST CO...
- Publication number 20110244394
- Publication date Oct 6, 2011
- Daicel Chemical Industries, Ltd.
- Akira Eguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETO...
- Publication number 20100297555
- Publication date Nov 25, 2010
- Hiroshi Koyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Akira Eguchi

Person

Patents Grantslast 30 patents

Polymer compound, resin composition for photoresists, and method fo...

Method for producing resin solution for photoresist, photoresist co...

Monomer having electron-withdrawing substituent and lactone skeleto...

Patents Applicationslast 30 patents

PHOTORESIST RESIN, METHOD FOR PRODUCING PHOTORESIST RESIN, PHOTORES...

MONOMER, RESIN FOR PHOTORESIST, RESIN COMPOSITION FOR PHOTORESIST,...

PHOTORESIST RESIN, PRODUCTION METHOD FOR PHOTORESIST RESIN, PHOTORE...

MONOMERS, PHOTORESIST RESINS, PHOTORESIST RESIN COMPOSITIONS, AND P...

POLYMER COMPOUND, RESIN COMPOSITION FOR PHOTORESISTS, AND METHOD FO...

METHOD FOR PRODUCING POLYMER COMPOUND, POLYMER COMPOUND, AND PHOTOR...

METHOD FOR PRODUCING RESIN SOLUTION FOR PHOTORESIST, PHOTORESIST CO...

MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETO...