Akira Hayashida

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Heating apparatus, substrate processing apparatus employing the sam...
- Patent number 9,184,069
- Issue date Nov 10, 2015
- Hitachi Kokusai Electric Inc.
- Akira Hayashida
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Heat treatment apparatus and method of manufacturing semiconductor...
- Patent number 8,734,148
- Issue date May 27, 2014
- Hitachi Kokusai Electric Inc.
- Keishin Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and film forming method
- Patent number 8,507,296
- Issue date Aug 13, 2013
- Hitachi Kokusai Electric Inc.
- Masaaki Ueno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 8,501,599
- Issue date Aug 6, 2013
- Hitachi Kokusai Electric Inc.
- Masaaki Ueno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heating apparatus, substrate processing apparatus employing the sam...
- Patent number 8,158,911
- Issue date Apr 17, 2012
- Hitachi Kokusai Electric Inc.
- Akira Hayashida
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate processing apparatus, coolant gas supply nozzle and semic...
- Patent number 8,148,271
- Issue date Apr 3, 2012
- Hitachi Kokusai Electric Inc.
- Masaaki Ueno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heating apparatus, substrate processing apparatus, and method of ma...
- Patent number 8,116,618
- Issue date Feb 14, 2012
- Hitachi Kokusai Electric Inc.
- Akira Hayashida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, heating apparatus for use in the sa...
- Patent number 7,863,204
- Issue date Jan 4, 2011
- Hitachi Kokusai Electric Inc.
- Toshimitsu Miyata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and semiconductor manufacturing apparatus
- Patent number 7,727,780
- Issue date Jun 1, 2010
- Hitachi Kokusai Electric Inc.
- Masashi Sugishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus having gas side flow via gas inlet
- Patent number 7,700,054
- Issue date Apr 20, 2010
- Hitachi Kokusai Electric Inc.
- Akira Hayashida
- F27 - FURNACES KILNS OVENS RETORTS

Patents Applicationslast 30 patents

Information Patent Application
HEAT TREATMENT APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20110207339
- Publication date Aug 25, 2011
- Hitachi Kokusai Electric Inc.
- Keishin YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus, Coolant Gas Supply Nozzle and Semic...
- Publication number 20090291566
- Publication date Nov 26, 2009
- Masaaki Ueno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing method and film forming method
- Publication number 20090197352
- Publication date Aug 6, 2009
- Hitachi Kokusai Electric Inc.
- Masaaki Ueno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20090095422
- Publication date Apr 16, 2009
- Hitachi Kokusai Electric Inc.
- Masashi SUGISHITA
- C30 - CRYSTAL GROWTH
Information Patent Application
Substrate processing apparatus, heating apparatus for use in the sa...
- Publication number 20090035948
- Publication date Feb 5, 2009
- Hitachi Kokusai Electric Inc.
- Toshimitsu Miyata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus and Substrate Processing Method
- Publication number 20090029486
- Publication date Jan 29, 2009
- Hitachi Kokusai Electric Inc.
- Masaaki Ueno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Heating apparatus, substrate processing apparatus employing the sam...
- Publication number 20090014428
- Publication date Jan 15, 2009
- Hitachi Kokusai Electric Inc.
- Akira Hayashida
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Heating apparatus, substrate processing apparatus employing the sam...
- Publication number 20090014435
- Publication date Jan 15, 2009
- Hitachi Kokusai Electric Inc.
- Akira Hayashida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heating apparatus, substrate processing apparatus, and method of ma...
- Publication number 20090016706
- Publication date Jan 15, 2009
- Hitachi Kokusai Electric Inc.
- Akira Hayashida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and semiconductor manufacturing apparatus
- Publication number 20080182345
- Publication date Jul 31, 2008
- Hitachi Kokusai Electric Inc.
- Masashi Sugishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus, method of manufacturing semiconduct...
- Publication number 20080153314
- Publication date Jun 26, 2008
- Hitachi Kokusai Electric Inc.
- Akira Hayashida
- H01 - BASIC ELECTRIC ELEMENTS

Akira Hayashida

Person

Patents Grantslast 30 patents

Heating apparatus, substrate processing apparatus employing the sam...

Heat treatment apparatus and method of manufacturing semiconductor...

Substrate processing method and film forming method

Substrate processing apparatus and substrate processing method

Heating apparatus, substrate processing apparatus employing the sam...

Substrate processing apparatus, coolant gas supply nozzle and semic...

Heating apparatus, substrate processing apparatus, and method of ma...

Substrate processing apparatus, heating apparatus for use in the sa...

Substrate processing method and semiconductor manufacturing apparatus

Substrate processing apparatus having gas side flow via gas inlet

Patents Applicationslast 30 patents

HEAT TREATMENT APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR...

Substrate Processing Apparatus, Coolant Gas Supply Nozzle and Semic...

Substrate processing method and film forming method

SEMICONDUCTOR MANUFACTURING APPARATUS AND SUBSTRATE PROCESSING METHOD

Substrate processing apparatus, heating apparatus for use in the sa...

Substrate Processing Apparatus and Substrate Processing Method

Heating apparatus, substrate processing apparatus employing the sam...

Heating apparatus, substrate processing apparatus employing the sam...

Heating apparatus, substrate processing apparatus, and method of ma...

Substrate processing method and semiconductor manufacturing apparatus

Substrate processing apparatus, method of manufacturing semiconduct...